Memory device, memory cell and method for programming memory cell
A memory device includes a word line, a bit line intersecting the word line, and a memory cell at an intersection of the word line and the bit line. The memory cell includes a first electrode connected to the word line; a second electrode connected to the bit line; and a selective element layer between the first electrode and the second electrode. The selective element layer includes one of Ge—Se—Te, Ge—Se—Te—As, and Ge—Se—Te—As—Si, and a composition ratio of arsenic (As) component of each of the Ge—Se—Te—As and the Ge—Se—Te—As—Si being greater than 0.01 and less than 0.17.
1. A memory device, comprising:
a word line;
a bit line intersecting the word line; and
a memory cell between the word line and the bit line, the memory cell including a first electrode connected to the word line, a second electrode connected to the bit line, and a first memory element layer between the first electrode and the second electrode, the first memory element layer including:
Ge x Se y Te z in which 0.18<x<0.36, 0.4<y<0.65, and 0.02<z<0.2,
Ge—Se—Te—As in which a composition ratio of arsenic (As) is greater than 0.01 and less than 0.17, or
Ge—Se—Te—As—Si in which a composition ratio of arsenic (As) is greater than 0.01 and less than 0.17,
wherein Ge indicates Germanium, Se indicates Selenium, Te indicates Tellurium, As indicates Arsenic, and Si indicates Silicon, and
wherein the memory device is configured to alter a threshold voltage of the memory cell based on a duration of a falling edge period of a write operation pulse.
2. The memory device as claimed in claim 1 , wherein the memory cell further includes:
a third electrode between the first electrode and the second electrode; and
a second memory element layer between the first electrode and the third electrode, the first memory element layer being between the second electrode and the third electrode.
3. The memory device as claimed in claim 1 , wherein the memory cell further includes:
a third electrode between the first electrode and the second electrode; and
a second memory element layer between the second electrode and the third electrode, the first memory element layer being between the first electrode and the third electrode.
4. The memory device as claimed in claim 1 , wherein:
the memory cell further includes a third electrode between the first electrode and the second electrode, and
the first memory element layer includes a first selective element layer between the first electrode and the third electrode, and a second selective element layer between the second electrode and the third electrode.
5. The memory device as claimed in claim 1 , wherein a size and a number of crystalline structures formed in the first memory element layer change based on the falling edge period of the write operation pulse.
6. The memory device as claimed in claim 1 , wherein the threshold voltage of the memory cell decreases as the falling edge period of the write operation pulse increases.
7. The memory device as claimed in claim 6 , wherein the memory device is configured to apply another write operation pulse to the memory cell after a first read operation is performed and before a second, subsequent read operation is performed.
8. The memory device of any one as claimed in claim 1 , wherein the memory cell is a multi-level cell.
9. A memory cell, comprising:
a first electrode;
a second electrode; and
a first memory element layer between the first electrode and the second electrode, the first memory element layer including a material represented by one of Formulas 1 to 3 below:
Ge x Se y Te z [Formula 1]
wherein, in Formula 1, 0.18<x<0.36, 0.4<y<0.65, and 0.02<z<0.2;
Ge x Se y Te z As p [Formula 2]
wherein, in Formula 2, 0.18<x<0.36, 0.4<y<0.65, 0.02<z<0.18, and 0.01<p<0.17; and
Ge x Se y Te z As p Si q [Formula 3]
wherein, in Formula 3, 0.14<x<0.32, 0.38<y<0.54, 0.02<z<0.18, 0.01<p<0.17, and 0.02<q<0.18,
wherein a threshold voltage of the memory cell alters based on a duration of a falling edge period of a write operation pulse.
10. The memory cell as claimed in claim 9 , wherein the memory cell further includes:
a third electrode between the first electrode and the second electrode; and
a storage element layer between the first electrode and the third electrode, the first memory element layer being between the second electrode and the third electrode.
11. The memory cell as claimed in claim 9 , wherein:
the memory cell further includes a third electrode between the first electrode and the second electrode, and
the first memory element layer includes a first chalcogenide layer between the first electrode and the third electrode, and a second chalcogenide layer between the second electrode and the third electrode.
12. The memory cell as claimed in claim 9 , wherein the threshold voltage of the memory cell decreases as the falling edge period of the write operation pulse increases.
13. A memory device, comprising:
a first word line extending in a first direction;
a second word line spaced apart from the first word line in a third direction, perpendicular to the first direction, and extending in the first direction;
a bit line between the first word line and the second word line and extending in a second direction, perpendicular to the first direction and the third direction;
a first memory cell between the first word line and the bit line; and
a second memory cell between the second word line and the bit line,
wherein each of the first and second memory cells includes a first electrode, a second electrode and at least one memory element layer between the first electrode and the second electrode, the memory element layer including a chalcogenide material and being used as both a selective element layer and a storage element layer.
14. The memory device as claimed in claim 13 , wherein the chalcogenide material includes an arsenic (As) component having a composition ratio greater than 0.01 and less than 0.17.
15. The memory device as claimed in claim 13 , wherein the chalcogenide material excludes an arsenic (As) component.
16. The memory device as claimed in claim 13 , wherein a size and a number of crystalline structures formed in the memory element layer change based on a falling edge period of a write operation pulse.
17. The memory device as claimed in claim 13 , wherein the chalcogenide material alters a threshold voltage of the first and second memory cells based on a falling edge period of a write operation pulse.
18. The memory device as claimed in claim 13 , wherein:
each of the first and the second memory cells further includes a third electrode between the first electrode and the second electrode, and
the memory element layer includes a first memory element layer between the first electrode and the third electrode, and a second memory element layer between the second electrode and the third electrode.
19. The memory device as claimed in claim 18 , wherein:
the first memory element layer is used as a selective layer, and
the second memory element layer is used as a storage element layer.