Light transmissive electrode for light emitting devices
An opto-electronic device includes: (1) a first electrode; (2) at least one semiconductor layer disposed over the first electrode, the semiconductor layer including an emissive layer; and (3) a second electrode disposed over the semiconductor layer. The second electrode includes a fullerene-containing magnesium alloy which includes a non-zero amount of a fullerene of up to about 15 vol. % of the fullerene, and the second electrode has a thickness of about 50 nm or less.
1. An opto-electronic device comprising:
a substrate;
a first electrode disposed over the substrate;
at least one semiconductor layer disposed over the first electrode, the semiconductor layer including an emissive layer; and
a second electrode disposed over the semiconductor layer, the second electrode being light-transmissive and including a fullerene-containing magnesium alloy which includes a non-zero amount of a fullerene of up to 15 vol. % of the fullerene, the second electrode having a thickness of 50 nm or less.
2. The opto-electronic device of claim 1 , wherein the thickness of the second electrode is in a range from 5 nm to 50 nm, and the amount of the fullerene in the fullerene-containing magnesium alloy is in a range from 0.1 vol. % to 15 vol. %.
3. The opto-electronic device of claim 1 , wherein the thickness of the second electrode is in a range from 10 nm to 40 nm, and the amount of the fullerene in the fullerene-containing magnesium alloy is in a range from 1 vol. % to 10 vol. %.
4. The opto-electronic device of claim 1 , wherein a remainder of the fullerene-containing magnesium alloy consists essentially of magnesium.
5. The opto-electronic device of claim 1 , wherein the fullerene includes Cn, where n is an integer in a range from 60 to 84.
6. The opto-electronic device of claim 1 , wherein the fullerene includes C 60 , C 70 , C 72 , C 74 , C 76 , C 78 , C 80 , C 82 , C 84 , or a combination of two or more thereof.
7. The opto-electronic device of claim 1 , further comprising a fullerene-containing coating disposed between the semiconductor layer and the second electrode.
8. The opto-electronic device of claim 7 , wherein a thickness of the fullerene-containing coating is less than the thickness of the second electrode.
9. The opto-electronic device of claim 7 , wherein a thickness of the fullerene-containing coating is 5 nm or less.
10. The opto-electronic device of claim 1 , wherein the second electrode has a sheet resistance of 20 Ω/sq or less, and a light transmittance at a wavelength of 550 nm of 25% or greater.
11. The opto-electronic device of claim 1 , wherein the first electrode is an anode, and the second electrode is a cathode.
12. The opto-electronic device of claim 1 , wherein the semiconductor layer further includes one or more organic semiconductor layers selected from a group consisting of: a hole injection layer, a hole transport layer, an electron transport layer, an electron injection layer, a hole blocking layer, and an electron blocking layer.
13. The opto-electronic device of claim 1 , further comprising a thin film transistor electrically connected to the first electrode.
14. The opto-electronic device of claim 1 , further comprising an auxiliary electrode disposed over and electrically connected to the second electrode.
15. The opto-electronic device of claim 14 , wherein a thickness of the auxiliary electrode is greater than the thickness of the second electrode.
16. The opto-electronic device of claim 14 , wherein the auxiliary electrode includes magnesium.
17. The opto-electronic device of claim 1 , wherein the opto-electronic device is an organic light emitting diode (OLED) device.
18. The opto-electronic device of claim 17 , wherein the OLED device is a top-emission OLED device or a double-sided emission OLED device.
19. The opto-electronic device of claim 1 , wherein an average grain size of the second electrode is in a range from 20 nm to 60 nm.