Semiconductor device and method of manufacture
An interposer substrate is manufactured with a scribe line between adjacent regions. In an embodiment a separate exposure reticle is utilized to pattern the scribe line. The exposure reticle to pattern the scribe line will create an exposure region which overlaps and overhangs the exposure regions utilized to form adjacent regions.
1. A semiconductor device comprising:
a contact pad over a first dielectric layer over an interposer substrate; and
a passivation layer over a first portion of the first dielectric layer, wherein a sidewall of the passivation layer is aligned with a first sidewall of the first dielectric layer and wherein the first dielectric layer has a second sidewall facing the first sidewall, the second sidewall being misaligned from the passivation layer, wherein the first portion of the first dielectric layer is in physical contact with the passivation layer where the sidewall of the passivation layer is aligned with the first sidewall of the first dielectric layer, wherein each portion of the dielectric layer is located outside of a region between the first sidewall of the first dielectric layer and the second sidewall of the dielectric layer.
2. The semiconductor device of claim 1 , further comprising a second dielectric layer between the first dielectric layer and the interposer substrate, the second dielectric layer having a third sidewall aligned with the first sidewall and a fourth sidewall aligned with the second sidewall.
3. The semiconductor device of claim 2 , further comprising a third dielectric layer between the second dielectric layer and the interposer substrate, the third dielectric layer having a fifth sidewall aligned with the first sidewall and a sixth sidewall aligned with the second sidewall.
4. The semiconductor device of claim 1 , further comprising a semiconductor die electrically connected to contact pad through the passivation layer.
5. The semiconductor device of claim 1 , further comprising an encapsulant in physical contact with the first sidewall and the second sidewall.
6. The semiconductor device of claim 5 , wherein the encapsulant is in physical contact with at least one conductive element located over the first dielectric layer, the at least one conductive element having a sidewall facing the passivation layer.
7. The semiconductor device of claim 1 , further comprising through substrate vias extending through the interposer substrate.
8. A semiconductor device comprising:
a first dielectric layer over an interposer substrate, the first dielectric layer having a first sidewall and a second sidewall facing the first sidewall;
a second dielectric layer having a third sidewall aligned with the first sidewall and a fourth sidewall aligned with the second sidewall, wherein the third sidewall and the first sidewall form a first continuous planar sidewall and the fourth sidewall and second sidewall form a second continuous planar sidewall; and
a passivation layer with a fifth sidewall aligned with the second sidewall and the fourth sidewall, wherein the first sidewall is misaligned from the passivation layer.
9. The semiconductor device of claim 8 , further comprising a third dielectric layer with a sixth sidewall aligned with the first sidewall and a seventh sidewall aligned with the second sidewall, a surface of the third dielectric layer extending between the sixth sidewall and the seventh sidewall.
10. The semiconductor device of claim 8 , further comprising through interposer vias extending through the interposer substrate.
11. The semiconductor device of claim 8 , wherein the first sidewall is separated from the second sidewall by a distance of about 1.5 μm.
12. The semiconductor device of claim 8 , further comprising an encapsulant in physical contact with each of the first sidewall, the second sidewall, the third sidewall and the fourth sidewall.
13. The semiconductor device of claim 8 , further comprising at least three semiconductor dies electrically connected to the interposer substrate through the passivation layer.
14. The semiconductor device of claim 8 , a photoresist material with a sixth sidewall aligned with the fifth sidewall, the photoresist material not located over the first dielectric layer adjacent to the first sidewall.
15. A semiconductor device comprising:
an interposer substrate;
a redistribution layer over the interposer substrate;
a first dielectric layer over the redistribution layer;
a second dielectric layer over the first dielectric layer;
contact pads located over the second dielectric layer; and
a passivation layer over the contact pads, wherein the first dielectric layer has a first sidewall aligned with and in contact with a second sidewall of the second dielectric layer, and wherein the first dielectric layer has a third sidewall aligned with and in contact with a fourth sidewall of the second dielectric layer, wherein a distance between the first sidewall to the second sidewall is larger than an exposure limit of an exposure mask.
16. The semiconductor device of claim 15 , wherein the first dielectric layer comprises silicon oxide and the second dielectric layer comprises silicon nitride.
17. The semiconductor device of claim 15 , wherein the interposer substrate comprises a die attach region and wherein the first sidewall and the second sidewall are outside of the die attach region in a top down view.
18. The semiconductor device of claim 17 , wherein at least three semiconductor devices are attached to the interposer substrate within the die attach region.
19. The semiconductor device of claim 17 , further comprising a dummy pattern in a scribe region adjacent to the die attach region, wherein the dummy pattern has a first thickness and a first one of the contact pads has the first thickness.
20. The semiconductor device of claim 15 , further comprising through substrate vias extending through the interposer substrate.