Integrated circuit structures and methods of forming an opening in a material
In some embodiments, a method of forming an opening in a material comprises forming RIM over target material. Radiation is impinged onto the RIM through a masking tool over a continuous area of the RIM under which a target-material opening will be formed. The masking tool during the impinging allows more radiation there-through onto a mid-portion of the continuous area of the RIM in a vertical cross-section than onto laterally-opposing portions of the continuous area of the RIM that are laterally-outward of the mid-portion of the RIM in the vertical cross-section. After the impinging, the RIM is developed to form a RIM opening that has at least one pair of laterally-opposing ledges laterally-outward of the mid-portion of the RIM in the vertical cross-section elevationally between a top and a bottom of the RIM opening. The developed RIM is used as masking material while etching the target material through the RIM opening to form the target-material opening to have at least one pair of laterally-opposing ledges laterally-outward of a mid-portion in the target-material opening in the vertical cross-section elevationally between a top and a bottom of the target-material opening. Other aspects and constructions independent of manufacture are disclosed.
1. A method comprising:
forming radiation-imageable material (RIM) over target material;
impinging radiation onto the RIM through a masking tool over a continuous area of the RIM under which a target-material opening will be formed, the masking tool during the impinging allowing more radiation there-through onto a mid-portion of the continuous area of the RIM in a vertical cross-section than onto laterally-opposing portions of the continuous area of the RIM that are laterally-outward of the mid-portion of the RIM in the vertical cross-section;
after the impinging, developing the RIM to form a RIM opening that has at least one pair of laterally-opposing ledges in the RIM laterally-outward of the mid-portion of the RIM in the vertical cross-section elevationally between a top and a bottom of the RIM opening;
using the developed RIM as masking material while etching the target material through the RIM opening to form the target-material opening to have at least one pair of laterally-opposing ledges in the target material laterally-outward of a mid-portion in the target-material opening in the vertical cross-section elevationally between a top and a bottom of the target-material opening; and
the masking tool has a mid-portion of a continuous area of the masking tool in a horizontal cross-section and has laterally-opposing portions of the continuous area of the masking tool that are laterally-outward of the mid-portion of the masking tool, the laterally-opposing portions of the continuous area of the masking tool having spaced elongated linear strips of radiation-blocking material and having an elongated radiation-transmissive region between immediately-adjacent ones of the spaced elongated linear strips in the horizontal cross-section.
2. The method of claim 1 wherein the spaced elongated linear strips and the radiation-transmissive regions are elongated straight linear in the horizontal cross-section.
3. A method comprising:
forming radiation-imageable material (RIM) over target material;
impinging radiation onto the RIM through a masking tool over a continuous area of the RIM under which a target-material opening will be formed, the masking tool during the impinging allowing more radiation there-through onto a mid-portion of the continuous area of the RIM in a vertical cross-section than onto laterally-opposing portions of the continuous area of the RIM that are laterally-outward of the mid-portion of the RIM in the vertical cross-section;
after the impinging, developing the RIM to form a RIM opening that has two pairs of laterally-opposing ledges in the RIM laterally-outward of the mid-portion of the RIM in the vertical cross-section elevationally between a top and a bottom of the RIM opening;
using the developed RIM as masking material while etching the target material through the RIM opening to form the target-material opening to have two pairs of laterally-opposing ledges in the target material laterally-outward of a mid-portion in the target-material opening in the vertical cross-section elevationally between a top and a bottom of the target-material opening;
the masking tool has a mid-portion of a continuous area of the masking tool in a horizontal cross-section and has two sets of laterally-opposing portions of the continuous area of the masking tool that are laterally-outward of the mid-portion of the masking tool, a laterally-outer of the laterally-opposing portions of the continuous area of the two sets being laterally-outward of a laterally-inner of the laterally-opposing portions of the continuous area of the two sets, each of the laterally-opposing portions of the continuous area of the two sets of the masking tool having spaced elongated linear strips of radiation-blocking material and having a radiation-transmissive region between immediately-adjacent ones of the spaced elongated linear strips in the horizontal cross-section; and
the radiation-transmissive regions being greater in number in the laterally-inner laterally-opposing portions of the two sets.
4. The method of claim 3 wherein the spaced elongated linear strips in each of the two sets have the same and constant width relative one another intra-set.
5. A method comprising:
forming radiation-imageable material (RIM) over target material;
impinging radiation onto the RIM through a masking tool over a continuous area of the RIM under which a target-material opening will be formed, the masking tool during the impinging allowing more radiation there-through onto a mid-portion of the continuous area of the RIM in a vertical cross-section than onto laterally-opposing portions of the continuous area of the RIM that are laterally-outward of the mid-portion of the RIM in the vertical cross-section;
after the impinging, developing the RIM to form a RIM opening that has two pairs of laterally-opposing ledges in the RIM laterally-outward of the mid-portion of the RIM in the vertical cross-section elevationally between a top and a bottom of the RIM opening;
using the developed RIM as masking material while etching the target material through the RIM opening to form the target-material opening to have two pairs of laterally-opposing ledges in the target material laterally-outward of a mid-portion in the target-material opening in the vertical cross-section elevationally between a top and a bottom of the target-material opening;
the masking tool has a mid-portion of a continuous area of the masking tool in a horizontal cross-section and has two sets of laterally-opposing portions of the continuous area of the masking tool that are laterally-outward of the mid-portion of the masking tool, a laterally-outer of the laterally-opposing portions of the continuous area of the two sets being laterally-outward of a laterally-inner of the laterally-opposing portions of the continuous area of the two sets, each of the laterally-opposing portions of the continuous area of the two sets of the masking tool having spaced elongated linear strips of radiation-blocking material and having a radiation-transmissive region between immediately-adjacent ones of the spaced elongated linear strips in the horizontal cross-section; and
the radiation-transmissive regions being the same in number in the laterally-inner laterally-opposing portions of the two sets.
6. The method of claim 5 wherein,
the spaced elongated linear strips in each of the two sets have the same and constant width relative one another intra-set; and
the spaced elongated linear strips in each of the two sets have different width relative one another inter-set.