Semiconductor device and manufacturing method thereof
A semiconductor device includes first and second epitaxial structures, first and second top metal alloy layers, and first and second bottom metal alloy layers. The first and second epitaxial structures have different cross sections. The first and second top metal alloy layers are respectively in contact with the first and second epitaxial structures. The first and second bottom metal alloy layers are respectively in contact with the first and second epitaxial structures and respectively under the first and second top metal alloy layers. The first top metal alloy layer and the first bottom metal alloy layer are made of different materials.
1. A semiconductor device comprising:
a source/drain epitaxial structure above a substrate;
a gate structure above the substrate and adjacent to the source/drain epitaxial structure;
a top metal alloy layer lining an upper part of the source/drain epitaxial structure;
a bottom metal alloy layer lining a lower part of the source/drain epitaxial structure, wherein the top metal alloy layer includes a semiconductor element, a first metal element and a second metal element, the bottom metal alloy layer includes the semiconductor element, the first metal element and is free of the second metal element; and
a contact in contact with the top metal alloy layer.
2. The semiconductor device of claim 1 , wherein the first metal element is Ni, Co, Pt, W, or Ru.
3. The semiconductor device of claim 1 , wherein the second metal element is Ti, Er, Y, Yb, Eu, Tb, Lu, Th, Sc, Hf, Zr, or Ta.
4. The semiconductor device of claim 1 , further comprising spacer residues at a bottom of the source/drain epitaxial structure.
5. The semiconductor device of claim 4 , wherein the bottom metal alloy layer is in contact with the spacer residues.
6. The semiconductor device of claim 1 , wherein the contact comprises:
a barrier layer in contact with the top metal alloy layer; and
a filling material above the barrier layer.
7. The semiconductor device of claim 1 , further comprising a contact etch stop layer (CESL) conformal to the top and bottom metal alloy layers.
8. The semiconductor device of claim 7 , wherein the CESL is spaced apart from the source/drain epitaxial structure.
9. A semiconductor device comprising:
an isolation structure within a substrate;
a fin structure extending from a substrate and protruding above the isolation structure;
a gate structure crossing a first portion of the fin structure;
a source/drain epitaxial structure wrapping around a second portion of the fin structure;
a top metal alloy layer in contact with a top portion of the source/drain epitaxial structure; and
a bottom metal alloy layer in contact with a bottom portion of the source/drain epitaxial structure, wherein the bottom metal alloy layer has a metal element having a work function lower than a work function of a metal element of the top metal alloy layer.
10. The semiconductor device of claim 9 , wherein a first contact area between the top metal alloy layer and the source/drain epitaxial structure is smaller than a second contact area between the bottom metal alloy layer and the source/drain epitaxial structure.
11. The semiconductor device of claim 9 , wherein a first contact area between the top metal alloy layer and the source/drain epitaxial structure is greater than a second contact area between the bottom metal alloy layer and the source/drain epitaxial structure.
12. The semiconductor device of claim 9 , wherein the top metal alloy layer has a thickness in a range of about 2 nm to about 7 nm.
13. The semiconductor device of claim 9 , wherein the bottom metal alloy layer has a thickness in a range of about 2 nm to about 6 nm.
14. The semiconductor device of claim 9 , wherein the top and bottom metal alloy layers both comprise Si.
15. A method for manufacturing a semiconductor device comprising:
forming a fin structure over a substrate;
forming a dummy gate structure over a first portion of the fin structure;
forming a source/drain epitaxial structure over a second portion of the fin structure;
forming a contact etch stop layer (CESL) conformal to a top surface and a sidewall of the source/drain epitaxial structure;
after forming the CESL, replacing the dummy gate structure with a metal gate structure;
after replacing the dummy gate structure with the metal gate structure, partially removing the CESL to expose the top surface of the source/drain epitaxial structure while the sidewall of the source/drain epitaxial structure is covered by the CESL;
forming a top metal alloy layer on the top surface of the source/drain epitaxial structure;
after forming the top metal alloy layer, removing the remaining CESL to expose the sidewall of the source/drain epitaxial structure; and
forming a bottom metal alloy layer on the exposed sidewall of the source/drain epitaxial structure.
16. The method of claim 15 , further comprising forming a contact over the top metal alloy layer.
17. The method of claim 16 , wherein forming the contact comprises:
forming a barrier layer lining a top surface of the top metal alloy layer; and
forming a filling material above the barrier layer.
18. The method of claim 15 , wherein a work function of the top metal alloy layer is greater than a work function of the bottom metal alloy layer.
19. The method of claim 15 , wherein forming the bottom metal alloy layer comprises:
forming a metal layer covering the top metal alloy layer and the sidewall of the source/drain epitaxial structure; and
annealing the metal layer to form the bottom metal alloy layer on the sidewall of the source/drain epitaxial structure.
20. The method of claim 19 , wherein the metal layer comprises Ti, Er, Y, Yb, Eu, Tb, Lu, Th, Sc, Hf, Zr, Ta, or combinations thereof.