Nozzle head and apparatus
A nozzle head and an apparatus for subjecting a surface of a substrate to successive surface reactions of at least two precursors according to the principles of atomic layer deposition, the nozzle head includes a nozzle head body, a nozzle head output face and gas channels for transporting gas. The nozzle head further includes a first through hole through at least two of the two or more nozzles and a first tube having a tube wall and being fitted into the first through hole, said first tube including gas conduits provided in the tube wall for providing a fluid communication between the first tube and the gas channels in connection with the two or more nozzles.
1. A nozzle head for subjecting a surface of a substrate to successive surface reactions of at least two precursors according to the principles of atomic layer deposition, the nozzle head comprising:
a nozzle head body;
a nozzle head output face;
two or more nozzles supported to the nozzle head body, each of said two or more nozzles comprising a first side and a second side and a nozzle output surface, said two or more nozzles are arranged adjacent to each other such that the second side of one nozzle is towards the first side of an adjacent nozzle; and
gas channels for transporting gas, said gas channels are provided in the two or more nozzles or between adjacent nozzles such that each gas channel comprises an opening in the nozzle head output face; wherein the nozzle head further comprises:
a first through hole through at least two of the two or more nozzles, said first through hole is provided such that each of the at least two of the two or more nozzles comprise a first nozzle through hole extending between the first side and the second side of the nozzle and forming the first through hole through the at least two of the two or more nozzles such that the first nozzle through hole of each of the at least two of the two or more nozzles are aligned coaxially;
a first tube having a first tube opening and a second tube opening provided at ends of the first tube and a tube wall extending between the ends, the first tube being fitted into the first through hole, said first tube comprising gas conduits in a form of holes provided in the tube wall for providing a fluid communication between the first tube and the gas channels between adjacent nozzles; and
gaskets positioned between the first through hole and the first tube for preventing gas that flows through the first tube to flow from the gas conduits and into the first through hole.
2. A nozzle head according to claim 1 , wherein said gas conduits in the first tube are provided in a fluid communication with the gas channels provided between the adjacent nozzles.
3. A nozzle head according to claim 1 , wherein said gas conduits in the first tube are provided in a fluid communication with the gas channels provided in the two or more nozzles, said gas channels forming the openings in the nozzle output surface.
4. A nozzle head according to claim 2 , wherein one gas conduit of the first tube is provided in a fluid communication with one gas channel.
5. A nozzle head according to claim 1 , wherein size of the gas conduits in the first tube is such that the total area of the gas conduits is smaller than the cross-sectional area of the first tube.
6. An apparatus for processing a surface of a substrate, the apparatus comprising:
a nozzle head for subjecting the surface of the substrate to successive surface reactions of at least two precursors according to the principles of atomic layer deposition, the nozzle head comprising a nozzle head body,
a nozzle head output face, two or more nozzles supported to the nozzle head body, and gas channels for supplying gas toward the surface of the substrate or for discharging gas from the surface of the substrate; and
a gas source connected to the nozzle head for supplying gas to the nozzle head;
wherein the gas source is connected to a first tube for supplying gas into said first tube through a connection conduit connected to the gas source and forming a connection with a first end of the first tube such that the gas is supplied to the first tube from the first end of the first tube, said first tube is fitted into a first through hole arranged to go through at least two of the two or more nozzles, said first tube comprising gas conduits provided in a tube wall of the first tube for providing a fluid communication from the first tube to the gas channels between adjacent nozzles, wherein the nozzle head further includes gaskets positioned between the first through hole and the first tube for preventing gas that flows through the first tube to flow from the gas conduits and into the first through hole.
7. Apparatus according to claim 6 , wherein the first tube comprises a first tube opening and a second tube opening, and said gas source is connected to both the first tube opening and the second tube opening for providing gas from both ends of the first tube via the first tube to the gas channels.