IP Library Granted Patent US 11,227,786
Granted Patent B2
US 11,227,786 · App. 16/028,699 · Granted Jan 18, 2022

Method of manufacturing electrostatic chuck and electrostsatic chuck

Inventors: Satoshi Taga (Miyagi, JP); Yoshiyuki Kobayashi (Tokyo, JP); Kazuya Nagaseki (Miyagi, JP)
Assignee: TOKYO ELECTRON LIMITED
H01L21/6833C23C4/11C23C4/134H01J37/32724H01J2237/002
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Quick Facts
Patent No.
US 11,227,786
App. No.
16/028,699
Granted
Jan 18, 2022
Kind
B2
Abstract

Disclosed is a method of manufacturing an electrostatic chuck configured to attract a substrate by applying a voltage to a first electrode layer. The method includes forming the first electrode layer on a first resin layer on a base and thermally spraying ceramics or a ceramics-containing material on the first electrode layer. The thermally spraying the ceramic or the ceramics-containing material includes transporting powder of a thermal spray material, introduced into a nozzle from a feeder, by a plasma generation gas and spraying the powder from an opening in a tip end portion of the nozzle, dissociating the sprayed plasma generation gas by electric power of 500 W to 10 kW to generate plasma having a common axis with the nozzle, and forming the powder of the thermal spray material into a liquid phase by the generated plasma to form a film on the first electrode layer.

Claims (49)

1. A method of manufacturing an electrostatic chuck, the method comprising:

forming a first electrode layer on a first resin layer on a base wherein a voltage is applied to the first electrode layer to attract a substrate; and

thermally spraying ceramics or a ceramics-containing material on the first electrode layer,

wherein the thermally spraying the ceramic or the ceramics-containing material includes:

transporting powder of a thermal spray material, introduced into a nozzle from a feeder, by a plasma generation gas, and spraying the powder from an opening in a tip end portion of the nozzle;

dissociating the sprayed plasma generation gas by electric power of 500 W to 10 kW to generate plasma having a common axis with the nozzle; and

forming the powder of the thermal spray material into a liquid phase by the generated plasma to form a film on the first electrode layer,

wherein a diameter of the first resin layer is greater than a diameter of an upper surface of the base.

2. The method of claim 1 , wherein the thermal spray material is the ceramics or a composite material in which a metal is added to the ceramics.

3. The method of claim 2 , wherein the thermal spray material is any one of Al 2 O 3 , a composite material obtained by adding a metal additive to Al 2 O 3 , Y 2 O 3 , and a composite material obtained by adding a metal additive to Y 2 O 3 .

4. The method of claim 3 , wherein the metal additive is titanium, aluminum, or silicon carbide (SiC).

5. The method of claim 1 , wherein the powder of the thermal spray material has a particle diameter ranging from 1 μm to 20 μm.

6. The method of claim 1 , further comprising:

forming a second resin layer on the first electrode after the forming the first electrode layer on the first resin layer and before the thermally spraying the ceramics or the ceramics-containing material on the first electrode layer.

7. The method of claim 6 , wherein the ceramics or the ceramics-containing material is thermally sprayed so as to cover the first resin layer and the second resin layer.

8. The method of claim 7 , further comprising:

forming a second electrode layer for a focus ring on the first resin layer; and

forming the second resin layer on the first electrode layer and the second electrode layer,

wherein the ceramics or the ceramics-containing material is thermally sprayed onto the second resin layer.

9. The method of claim 8 , wherein the first resin layer and the second resin layer are formed on an upper surface of the base and are not formed on a side surface of the base.

10. The method of claim 6 , wherein a combination of the first resin layer and the second resin layer is a combination of any of the same or different types of polyimide, silicone, epoxy, and acryl.

11. The method of claim 1 , wherein the first resin layer is any one of polyimide, silicone, epoxy, and acryl.

12. The method of claim 1 , wherein the ceramics or the ceramics-containing material is thermally sprayed so as to further cover an upper surface of the first resin layer.

13. The method of claim 12 , further comprising:

forming a second electrode layer for a focus ring on the first resin layer,

wherein the ceramics or the ceramics-containing material is thermally sprayed onto the first electrode layer and the second electrode layer.

14. The method of claim 13 , wherein the first resin layer is formed on an upper surface of the base and is not formed on a side surface of the base.

15. The method of claim 12 , wherein:

the ceramics or the ceramics-containing material is thermally sprayed so as to further cover a side surface of the first resin layer,

a layer formed by the ceramics or the ceramics-containing material includes a first portion covering the upper surface of the first resin layer and a second portion covering the side surface of the first resin layer, and

the first and second portions are integrally formed without a seam.

16. An electrostatic chuck comprising:

a first resin layer formed on a base;

a first electrode layer laminated on the first resin layer wherein a voltage is applied to the first electrode layer to attract a substrate; and

ceramics or a ceramics-containing material laminated on the first electrode layer,

wherein the ceramics or the ceramics-containing material is a layer having a thickness of less than 1 mm and thermally sprayed using powder of a thermal spray material having a particle size ranging from 1 μm to 20 μm, and

wherein a diameter of the first resin layer is greater than a diameter of an upper surface of the base.

17. A method of manufacturing an electrostatic chuck, the method comprising:

forming a first electrode layer on a first resin layer formed on a base wherein a voltage is applied to the first electrode layer to attract a substrate;

forming a second resin layer on the first electrode layer; and

thermally spraying ceramics or a ceramics-containing material on the second resin layer,

wherein the thermally spraying the ceramic or the ceramics-containing material includes:

transporting powder of a thermal spray material, introduced into a nozzle from a feeder, by a plasma generation gas, and spraying the powder from an opening in a tip end portion of the nozzle;

dissociating the sprayed plasma generation gas by electric power of 500 W to 10 kW to generate plasma having a common axis with the nozzle; and

forming the powder of the thermal spray material into a liquid phase by the generated plasma to form a film on the second resin layer,

wherein a diameter of the first resin layer is greater than a diameter of an upper surface of the base.

18. The method of claim 17 , wherein the first resin layer is any one of polyimide, silicone, epoxy, and acryl.

19. The method of claim 17 , wherein a combination of the first resin layer and the second resin layer is a combination of any of the same or different types of polyimide, silicone, epoxy, and acryl.

20. The method of claim 17 , wherein the ceramics or the ceramics-containing material is thermally sprayed so as to further cover an upper surface of the second resin layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 10, 2018
From: TAGA, SATOSHI; KOBAYASHI, YOSHIYUKI; NAGASEKI, KAZUYA
To: TOKYO ELECTRON LIMITED
Reel/Frame 047126/0355 →
Priority Claims (1)
JP JP2017-133410 · Jul 7, 2017 · national
Continuity (1)
Related Publication 20190013230A1 · Jan 10, 2019