IP Library › Granted Patent US 11,233,035
Granted Patent B2
US 11,233,035 · App. 16/886,722 · Granted Jan 25, 2022

Package structure and method of manufacturing the same

Inventors: Ming-Fa Chen (Taichung, TW); Sung-Feng Yeh (Taipei, TW); Tzuan-Horng Liu (Taoyuan, TW); Chao-Wen Shih (Hsinchu County, TW)
Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
H01L25/0657H01L21/56H01L23/3107H01L23/3675H01L25/50
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Quick Facts
Patent No.
US 11,233,035
App. No.
16/886,722
Granted
Jan 25, 2022
Kind
B2
Abstract

A package structure includes a first die, a die stack structure, a support structure and an insulation structure. The die stack structure is bonded to the first die. The support structure is disposed on the die stack structure. A width of the support structure is larger than a width of the die stack structure and less than a width of the first die. The insulation structure at least laterally wraps around the die stack structure and the support structure.

Claims (44)

1. A package structure, comprising:

a first die;

a die stack structure bonded to the first die;

a support structure, disposed on the die stack structure, wherein a width of the support structure is larger than a width of the die stack structure and less than a width of the first die; and

an insulation structure, at least laterally wrapping around the die stack structure and the support structure.

2. The package structure of claim 1 , wherein a fusion bonding interface is between the support structure and the die stack structure.

3. The package structure of claim 2 , wherein the fusion bonding interface is further existed between the support structure and a dielectric layer of the insulation structure.

4. The package structure of claim 1 , wherein a top surface of the insulation structure is coplanar with a top surface of the support structure.

5. The package structure of claim 1 , wherein the insulation structure comprises a first insulation structure and a second insulation structure on the first insulation structure, and the first insulation structure and the second insulation structure comprise different materials.

6. The package structure of claim 5 , wherein a coefficient of thermal expansion (CTE) of the first insulation structure is less than a CTE of the second insulation structure and closer to a CTE of substrates of the die stack structure.

7. The package structure of claim 1 , further comprising an isolation layer disposed between two adjacent dies of the die stack structure, wherein the isolation layer further extends to be underlying the insulation structure or extends into the insulation structure.

8. The package structure of claim 1 , further comprising a lid disposed over the die stack structure, wherein the support structure is located between the lid and the die stack structure and is configured to buffer stress and dissipate heat.

9. The package structure of claim 1 , wherein a topmost die of the die stack structure comprises a rounding corner, and a gap is vertically between a bottom surface of the support structure and the rounding corner of the topmost die.

10. A package structure, comprising:

a first die;

at least one second die bonded to the first die, wherein the first die laterally extends beyond a sidewall of the at least one second die; and

a dummy die structure, bonded to the at least one second die,

wherein a sidewall of the first die, the sidewall of the at least one second die and a sidewall of the dummy die structure are laterally offset from each other.

11. The package structure of claim 10 , further comprising an encapsulant, at least laterally encapsulating the dummy die structure.

12. The package structure of claim 11 , further comprising a dielectric structure between the encapsulant and the first die and laterally covering the at least one second die.

13. The package structure of claim 10 , further comprising a plurality of dielectric layers laterally wrapping around the at least one second die and the dummy die structure.

14. The package structure of claim 10 , wherein a substrate of the dummy die structure has a Young's modulus less than or equal to a Young's modulus of a substrate of the at least one second die, and a thermal conductivity of the substrate of the dummy die structure is larger than or equal to a thermal conductivity of the substrate of the at least one second die.

15. The package structure of claim 10 , wherein the dummy die structure comprises a plurality of dummy die partitions laterally spaced from each other.

16. A method of forming a package structure, comprising:

providing a first die;

bonding a die stack structure to the first die, wherein the die stack structure comprises at least one second die;

bonding a support structure to the die stack structure by a fusion bonding process, wherein a width of the support structure is larger than a width of the die stack structure and less than a width of the first die; and

forming an insulation structure to laterally wrap around the support structure and the die stack structure, wherein at least a portion of the insulation structure is formed after bonding the support structure to the die stack structure.

17. The method of claim 16 , wherein the insulation structure comprises an encapsulant, and forming the encapsulant comprises:

forming an encapsulant material layer to encapsulate sidewalls of the die stack structure, and sidewalls and a top surface of the support structure after bonding the support structure to the die stack structure; and

performing a planarization process on the encapsulant material layer, so as to form an encapsulant laterally encapsulating the die stack structure and the support structure.

18. The method of claim 17 , wherein the insulation structure further comprises a dielectric layer underlying the encapsulant, wherein before forming the encapsulant material layer, forming the dielectric layer laterally wrapping around the die stack structure comprises:

bonding a second die to the first die;

forming a dielectric material layer on the first die and laterally aside the second die; and

performing a planarization process on the dielectric material layer to form a dielectric layer laterally aside the second die; and

bonding a plurality of other second dies on the second die, the second die and the plurality of other second dies constituting the die stack structure.

19. The method of claim 16 , wherein the insulation structure comprises a plurality of dielectric layers, and forming the die stack structure, the support structure and the insulation structure comprises:

bonding a second die to the first die;

forming a first dielectric layer on the first die and laterally aside the second die;

bonding another second die to the second die;

forming a second dielectric layer on the first dielectric layer and laterally aside the another second die;

bonding the support structure to the another second die and the second dielectric layer through a fusion bonding process; and

forming a third dielectric layer on the second dielectric layer and laterally aside the support structure.

20. The method of claim 16 , wherein the at least one second die comprises a plurality of second dies, the first die and the plurality of second dies are stacked on one another in a face-to-back configuration, face-to-face configuration or back-to-back configuration.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 1, 2020
From: CHEN, MING-FA; YEH, SUNG-FENG; LIU, TZUAN-HORNG; SHIH, CHAO-WEN
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 052796/0408 →
Continuity (1)
Related Publication 20210375827A1 · Dec 2, 2021
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