Single-layer circuit board, multi-layer circuit board, and manufacturing methods therefor
A single-layer circuit board, multi-layer circuit board, and manufacturing methods therefor. The method for manufacturing the single-layer circuit board comprises the following steps: drilling a hole on a substrate, the hole comprising a blind hole and/or a through hole; on a surface of the substrate, forming a photoresist layer having a circuit negative image; forming a conductive seed layer on the surface of the substrate and a hole wall of the hole; removing the photoresist layer, and forming a circuit pattern on the surface of the substrate, wherein forming a conductive seed layer comprises implanting a conductive material below the surface of the substrate and below the hole wall of the hole via ion implantation, and forming an ion implantation layer as at least part of the conductive seed layer.
1. A multi-layer circuit board, successively constituted by metal foil, middle sticking layer, single-layer circuit board, middle sticking layer, single-layer circuit board, middle sticking layer, metal foil, wherein said multi-layer circuit board is provided with a hole, wherein a hole wall of said hole is formed with conductive seed layer, wherein partial region of said metal foil is removed to form a circuit pattern layer, wherein said conductive seed layer comprises a ion implantation layer implanted below the hole wall of said hole, and wherein said conductive seed layer further comprises a plasma deposition layer adhered above said ion implantation layer.
2. The multi-layer circuit board of claim 1 , wherein said ion implantation layer is located below one or more of the hole wall of said hole or a partial outer surface of said surface sticking layer, and wherein said ion implantation layer forms steady doping structure with said substrate.
3. The multi-layer circuit board of claim 2 , wherein said ion implantation layer is located below one or more of the hole wall of said hole or a partial outer surface of said surface sticking layer for a depth of 1-500 nm.
4. The multi-layer circuit board of claim 1 , wherein the plasma deposition layer has a thickness of 1-10000 nm.