Semiconductor device package having a core substrate and an embedded component in the core substrate

1. A semiconductor device package, comprising:

an electronic component having a first surface, a second surface opposite the first surface, and a lateral surface extended between the first surface and the second surface;

a first passivation layer having an inner surface surrounding the electronic component;

a conductive layer disposed on the inner surface of the first passivation layer and having a relatively rough surface, wherein the relatively rough surface of the conductive layer has an arithmetical mean roughness (Ra) ranging from about 0.3 micrometer (μm) to about 1.0 μm.

2. The semiconductor device package of claim 1 , wherein the conductive layer has a first portion extending into the first passivation layer.

3. The semiconductor device package of claim 1 , wherein the inner surface of the first passivation layer has a step.

4. The semiconductor device package of claim 3 , wherein the step is in direct contact with the conductive layer.

5. The semiconductor device package of claim 3 , wherein the conductive layer has a slanted surface.

6. The semiconductor device package of claim 5 , wherein the slanted surface is disposed over the step.

7. The semiconductor device package of claim 3 , wherein the conductive layer has a curved surface.

8. The semiconductor device package of claim 1 , wherein the relatively rough surface of the conductive layer has a ten-point mean roughness (Rz) ranging from about 3.0 μm to about 10.0 μm.

9. The semiconductor device package of claim 1 , further comprising:

a second passivation layer between the electronic component and the conductive layer.

10. The semiconductor device package of claim 9 , wherein the second passivation layer is in direct contact with the conductive layer.

11. The semiconductor device package of claim 1 , wherein the first passivation layer includes a core substrate defining a space, and the electronic component is received in the space.

12. The semiconductor device package of claim 11 , further comprises:

a second passivation layer disposed in the space defined by the core substrate.

13. A semiconductor device package, comprising:

an electronic component having a first surface, a second surface opposite the first surface, and a lateral surface extended between the first surface and the second surface; and

a first passivation layer having a first surface, a second surface opposite the first surface, and an inner surface surrounding the electronic component, wherein the inner surface includes a first portion and a second portion on the first portion; and

a conductive layer disposed on the inner surface of the first passivation layer, wherein the conductive layer has an arithmetical mean roughness (Ra) ranging from about 0.3 μm to about 1.0 μm;

wherein the first portion of the inner surface of the first passivation layer has a first width and the second portion of the inner surface of the first passivation layer has a second width, and the second width is greater than the first width.

14. The semiconductor device package of claim 13 , wherein the inner surface has a step.

15. The semiconductor device package of claim 14 , wherein the step is in direct contact with the conductive layer.

16. The semiconductor device package of claim 15 , wherein the conductive layer has a slanted surface.

17. The semiconductor device package of claim 14 , wherein the step is adjacent to the first surface of the first passivation layer, and wherein the first surface of the first passivation layer and the first surface of the electronic component are at different elevations.

18. The semiconductor device package of claim 13 , wherein the conductive layer has an extension into the first passivation layer.

19. The semiconductor device package of claim 13 , further comprising:

a second passivation layer between the electronic component and the conductive layer.