Fin shaping using templates and integrated circuit structures resulting therefrom

1. An integrated circuit structure, comprising:

a semiconductor fin having a protruding fin portion above an isolation structure above a substrate, the protruding fin portion having a vertical portion and one or more lateral recess pairs in the vertical portion, and the vertical portion comprising a same semiconductor material continuous from a location above the one or more lateral recess pairs to a location below the one or more lateral recess pairs;

a gate stack over and conformal with the protruding fin portion of the semiconductor fin;

a first source or drain region at a first side of the gate stack; and

a second source or drain region at a second side of the gate stack opposite the first side of the gate stack.

2. The integrated circuit structure of claim 1 , wherein the semiconductor fin further comprises a sub-fin portion on the substrate and laterally between an opening in the isolation structure, the sub-fin portion continuous with the protruding portion of the semiconductor fin.

3. The integrated circuit structure of claim 2 , wherein the substrate is a monocrystalline silicon substrate, and the semiconductor fin is a silicon fin.

4. The integrated circuit structure of claim 2 , wherein the substrate is a monocrystalline silicon substrate, and the semiconductor fin is a silicon germanium or germanium fin.

5. The integrated circuit structure of claim 2 , wherein the substrate is a monocrystalline silicon substrate, and the semiconductor fin is a III-V material fin.

6. The integrated circuit structure of claim 1 , wherein the first and second source or drain regions are formed in regions of the semiconductor fin at the first and second sides of the gate stack, respectively.

7. The integrated circuit structure of claim 1 , wherein the first and second source or drain regions are embedded source or drain regions.

8. The integrated circuit structure of claim 1 , wherein the gate stack comprises a gate dielectric comprising a high-k dielectric material, and a gate electrode comprising a metal.

9. An integrated circuit structure, comprising:

a plurality of semiconductor fins, individual ones of the plurality of semiconductor fins having a protruding fin portion above an isolation structure above a substrate, the protruding fin portion having a vertical portion and one or more lateral recess pairs in the vertical portion, and the vertical portion comprising a same semiconductor material continuous from a location above the one or more lateral recess pairs to a location below the one or more lateral recess pairs, and individual ones of the plurality of semiconductor fins having a sub-fin portion on the substrate and laterally between an opening in the isolation structure, the sub-fin portion continuous with the protruding portion of the corresponding semiconductor fin.

10. The integrated circuit structure of claim 9 , further comprising:

a gate stack over and conformal with the protruding fin portion of each of the plurality of semiconductor fins;

a first source or drain region at a first side of the gate stack; and

a second source or drain region at a second side of the gate stack opposite the first side of the gate stack.

11. The integrated circuit structure of claim 10 , wherein the first and second source or drain regions are formed in regions of the plurality of semiconductor fin at the first and second sides of the gate stack, respectively.

12. The integrated circuit structure of claim 10 , wherein the first and second source or drain regions are embedded source or drain regions.

13. The integrated circuit structure of claim 10 , wherein the gate stack comprises a gate dielectric comprising a high-k dielectric material, and a gate electrode comprising a metal.

14. The integrated circuit structure of claim 9 , wherein the substrate is a monocrystalline silicon substrate, and the plurality of semiconductor fins is a plurality of silicon fins.

15. The integrated circuit structure of claim 9 , wherein the substrate is a monocrystalline silicon substrate, and the plurality of semiconductor fins is a plurality of silicon germanium or germanium fins.

16. The integrated circuit structure of claim 9 , wherein the substrate is a monocrystalline silicon substrate, and the plurality of semiconductor fins is a plurality of III-V material fins.

17. An integrated circuit structure, comprising:

a plurality of semiconductor fins, individual ones of the plurality of semiconductor fins having a protruding fin portion above an isolation structure above a substrate, the protruding fin portion having a vertical portion and one or more lateral recess pairs in the vertical portion, and the vertical portion comprising a same semiconductor material continuous from a location above the one or more lateral recess pairs to a location below the one or more lateral recess pairs; and

a dielectric wall substituting one of the plurality of semiconductor fins.

18. The integrated circuit structure of claim 17 , wherein the individual ones of the plurality of semiconductor fins further comprise a sub-fin portion on the substrate and laterally between an opening in the isolation structure, the sub-fin portion continuous with the protruding portion of the corresponding semiconductor fin.

19. The integrated circuit structure of claim 18 , wherein the substrate is a monocrystalline silicon substrate, and the plurality of semiconductor fins is a plurality of silicon fins.

20. The integrated circuit structure of claim 18 , wherein the substrate is a monocrystalline silicon substrate, and the plurality of semiconductor fins is a plurality of silicon germanium or germanium fins.

21. The integrated circuit structure of claim 18 , wherein the substrate is a monocrystalline silicon substrate, and the plurality of semiconductor fins is a plurality of III-V material fins.

22. The integrated circuit structure of claim 17 , wherein the dielectric wall has a top surface above a top surface of the plurality of semiconductor fins.