IP Library Granted Patent US 11,322,539
Granted Patent B2
US 11,322,539 · App. 16/891,995 · Granted May 3, 2022

Semiconductor device and manufacturing method, and electronic appliance

Inventors: Jun Ogi (Kanagawa, JP); Junichiro Fujimagari (Kanagawa, JP); Susumu Inoue (Kanagawa, JP); Atsushi Fujiwara (Kumamoto, JP)
Assignee: SONY CORPORATION
H01L27/14636H01L24/16H01L24/48H01L27/1469H01L27/14627H01L27/14632H01L27/14634H01L27/14645H01L27/14685H01L27/14687H01L2224/16145H01L2224/48463H01L2924/146H01L2924/18161
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Quick Facts
Patent No.
US 11,322,539
App. No.
16/891,995
Granted
May 3, 2022
Kind
B2
Abstract

There is provided a semiconductor device including: a plurality of bumps on a first semiconductor substrate; and a lens material in a region other than the plurality of bumps on the first semiconductor substrate, wherein a distance between a side of a bump closest to the lens material and a side of the lens material closest to the bump is greater than twice a diameter of the bump closest to the lens material, and wherein the distance between the side of the bump closest to the lens material and the side of the lens material closest to the bump is greater a minimum pitch of the bumps.

Claims (22)

1. A semiconductor device, comprising:

a first semiconductor substrate having a rectangular shape;

a second semiconductor substrate having a rectangular shape, wherein an area of the second semiconductor substrate is less than an area of the first semiconductor substrate and at least a region of a first edge of the second semiconductor substrate is flush with at least a region of a first edge of the first semiconductor substrate; and

a third semiconductor substrate having a rectangular shape, wherein an area of the third semiconductor substrate is less than an area of the first semiconductor substrate and at least a region of a first edge of the third semiconductor substrate is flush with at least a region of a second edge of the first semiconductor substrate, wherein the first semiconductor substrate includes a plurality of arrays of pixels, wherein a first one of the plurality of arrays of pixels is adjacent to at least a portion of the second semiconductor substrate, and wherein a second one of the plurality of arrays of pixels is adjacent to at least a portion of the third semiconductor substrate.

2. The semiconductor device according to claim 1 , wherein the second semiconductor substrate includes a processing circuit.

3. The semiconductor device according to claim 2 , wherein the first semiconductor substrate further includes a peripheral circuit.

4. The semiconductor device according to claim 1 , wherein the first semiconductor substrate is connected to the second and third semiconductor substrates by bumps.

5. The semiconductor device according to claim 4 , wherein the first semiconductor substrate further includes a plurality of electrodes.

6. The semiconductor device according to claim 5 , wherein the second semiconductor substrate includes a first test element group pattern that is connected to at least a first one of the bumps, and wherein the third semiconductor substrate includes a second test element group pattern that is connected to at least a second one of the bumps.

7. The semiconductor device according to claim 5 , wherein the plurality of electrodes are formed in an area outside of an area of the second semiconductor substrate and outside of an area of the third semiconductor substrate.

8. The semiconductor device according to claim 1 ,

wherein the second and third semiconductor substrates each include at least one logic circuit,

wherein the semiconductor device is a stacked semiconductor device,

wherein each of the first edge of the first semiconductor substrate and the first edge of the second semiconductor substrate correspond to a scribe line forming a first edge of the stacked semiconductor device, and

wherein each of the second edge of the first semiconductor substrate and the first edge of the third semiconductor substrate correspond to a scribe line forming a second edge of the stacked semiconductor device.

9. The semiconductor device according to claim 8 , further comprising:

a fourth semiconductor substrate having a rectangular shape, wherein an area of the fourth semiconductor substrate is less than an area of the first semiconductor substrate and at least a region of a first edge of the fourth semiconductor substrate is flush with at least a region of the first edge of the first semiconductor substrate; and

a fifth semiconductor substrate having a rectangular shape, wherein an area of the fifth semiconductor substrate is less than an area of the first semiconductor substrate and at least a region of a first edge of the fifth semiconductor substrate is flush with at least a region of the second edge of the first semiconductor substrate.

10. The semiconductor device according to claim 9 , further comprising:

a sixth semiconductor substrate having a rectangular shape, wherein an area of the sixth semiconductor substrate is less than an area of the first semiconductor substrate and at least a region of a first edge of the sixth semiconductor substrate is flush with at least a region of the first edge of the first semiconductor substrate; and

a seventh semiconductor substrate having a rectangular shape, wherein an area of the seventh semiconductor substrate is less than an area of the first semiconductor substrate and at least a region of a first edge of the seventh semiconductor substrate is flush with at least a region of the second edge of the first semiconductor substrate.

11. The semiconductor device according to claim 8 , wherein alignment marks are formed on the first semiconductor substrate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 4, 2020
From: OGI, JUN; FUJIMAGARI, JUNICHIRO; INOUE, SUSUMU; FUJIWARA, ATSUSHI
To: SONY CORPORATION
Reel/Frame 052846/0498 →
Priority Claims (1)
JP 2015-043553 · Mar 5, 2015 · national
Continuity (3)
Continuation 16242764 · Jan 8, 2019
Continuation 15546138
Related Publication 20200295071A1 · Sep 17, 2020