Semiconductor device
A semiconductor device in which a memory region at each level of a memory device can be changed is provided. The semiconductor device includes a memory device including a first and a second memory circuit and a control circuit. The first memory circuit includes a first capacitor and a first transistor which has a function of holding charges held in the first capacitor. The second memory circuit includes a second transistor, a second capacitor which is electrically connected to a gate of the second transistor, and a third transistor which has a function of holding charges held in the second capacitor. The first and the third transistors each have a semiconductor layer including an oxide semiconductor, a gate, and a back gate. The voltage applied to the back gate of the first or the third transistor is adjusted, whereby the memory region of each of the first and the second memory circuit is changed.
1. A semiconductor device comprising:
a memory device and a control circuit,
wherein the memory device comprises a first memory circuit operating in a first memory level and a second memory circuit operating in a second memory level,
wherein the first memory level is a level with a higher access speed than the second memory level,
wherein the first memory circuit comprises a first capacitor and a first transistor configured to hold charges held in the first capacitor,
wherein the second memory circuit comprises a second transistor, a second capacitor electrically connected to a gate of the second transistor, and a third transistor configured to hold charges held in the second capacitor,
wherein the first transistor and the third transistor each comprise a semiconductor layer including an oxide semiconductor, a first gate, and a second gate, and
wherein the control circuit is configured to input a first voltage to the second gate of the first transistor in part of the first memory circuit so that the part of the first memory circuit operates in the second memory level, and
wherein the control circuit is configured to input a second voltage to the second gate of the third transistor in part of the second memory circuit so that the part of the second memory circuit operates in the first memory level.
2. The semiconductor device according to claim 1 ,
wherein the control circuit comprises a temperature sensing circuit,
wherein the temperature sensing circuit is configured to output a correction voltage depending on a temperature around the memory device, and
wherein the control circuit is configured to change a voltage applied to the second gate of each of the first transistor and the third transistor depending on the correction voltage.
3. The semiconductor device according to claim 1 ,
wherein the oxide semiconductor comprises one or more materials selected from indium, an element M, and zinc, and
wherein the element M is one of aluminum, gallium, yttrium, and tin.
4. A semiconductor device comprising:
a memory device and a control circuit,
wherein the memory device comprises a first memory circuit operating in a first memory level and a second memory circuit operating in a second memory level,
wherein the first memory level is a level with a higher access speed than the second memory level,
wherein the first memory circuit comprises a first capacitor and a first transistor configured to hold charges held in the first capacitor,
wherein the second memory circuit comprises a second transistor, a second capacitor electrically connected to a gate of the second transistor, and a third transistor configured to hold charges held in the second capacitor,
wherein the first transistor and the third transistor each comprise a semiconductor layer including an oxide semiconductor, a first gate, and a second gate,
wherein the control circuit is configured to input a first voltage to the second gate of the first transistor in part of the first memory circuit so that the part of the first memory circuit is changed from the first memory level to the second memory level,
wherein the control circuit is configured to input a second voltage to the second gate of the third transistor in part of the second memory circuit so that the part of the second memory circuit is changed from the second memory level to the first memory level,
wherein the control circuit comprises a controller, a plurality of voltage generation circuits, and a switching circuit,
wherein the memory device is configured to output a signal of using status of a memory capacity of the memory device to the controller, and
wherein the controller is configured to control the switching circuit so that a voltage output from any one of the plurality of the voltage generation circuits is applied to the second gates of the first transistor and the third transistor in response to the signal.
5. The semiconductor device according to claim 4 ,
wherein the control circuit comprises a temperature sensing circuit,
wherein the temperature sensing circuit is configured to output a correction voltage depending on a temperature around the memory device, and
wherein the control circuit is configured to change a voltage applied to the second gate of each of the first transistor and the third transistor depending on the correction voltage.
6. The semiconductor device according to claim 4 ,
wherein the oxide semiconductor comprises one or more materials selected from indium, an element M, and zinc, and
wherein the element M is one of aluminum, gallium, yttrium, and tin.
7. The semiconductor device according to claim 4 ,
wherein the first memory circuit comprises a region overlapping with the second memory circuit.
8. The semiconductor device according to claim 7 ,
wherein the control circuit comprises a temperature sensing circuit,
wherein the temperature sensing circuit is configured to output a correction voltage depending on a temperature around the memory device, and
wherein the control circuit is configured to change a voltage applied to the second gate of each of the first transistor and the third transistor depending on the correction voltage.
9. The semiconductor device according to claim 7 ,
wherein the oxide semiconductor comprises one or more materials selected from indium, an element M, and zinc, and
wherein the element M is one of aluminum, gallium, yttrium, and tin.
10. The semiconductor device according to claim 1 ,
wherein the first memory circuit comprises a region overlapping with the second memory circuit.
11. A semiconductor device comprising:
a memory device and a control circuit,
wherein the memory device comprises a first memory circuit operating in a first memory level and a second memory circuit operating in a second memory level,
wherein the first memory level is a level with a higher access speed than the second memory level,
wherein the first memory circuit comprises a plurality of first memory cells each comprising a first capacitor and a first transistor configured to hold charges held in the first capacitor,
wherein the second memory circuit comprises a plurality of second memory cells each comprising a second transistor, a second capacitor electrically connected to a gate of the second transistor, and a third transistor configured to hold charges held in the second capacitor,
wherein the first transistor and the third transistor each comprise a semiconductor layer including an oxide semiconductor, a first gate, and a second gate,
wherein part of the first memory circuit is able to operate in the second memory level when a first voltage is input to the second gate of the first transistor of at least one first memory cell in the part of the first memory circuit, and
wherein part of the second memory circuit is able to operate in the first memory level when a second voltage is input to the second gate of the third transistor of at least one second memory cell in the part of the second memory circuit.
12. The semiconductor device according to claim 11 ,
wherein the control circuit comprises a temperature sensing circuit,
wherein the temperature sensing circuit is configured to output a correction voltage depending on a temperature around the memory device, and
wherein the control circuit is configured to change voltages applied to the second gates of the first transistors in the plurality of plurality of first memory cells and the second gates of the third transistors in the plurality of plurality of second memory cells depending on the correction voltage.
13. The semiconductor device according to claim 11 ,
wherein the oxide semiconductor comprises one or more materials selected from indium, an element M, and zinc, and
wherein the element M is one of aluminum, gallium, yttrium, and tin.
14. The semiconductor device according to claim 11 ,
wherein the first memory circuit comprises a region overlapping with the second memory circuit.