Semiconductor memory device with chip-to-chip bonding structure
A semiconductor memory device includes: a plurality of page buffers disposed on a substrate; and a plurality of pads exposed to one surface of a dielectric layer covering the page buffers, and coupled to the respective page buffers. The substrate comprises a plurality of high voltage regions and a plurality of low voltage regions which are alternately disposed in a second direction crossing a first direction. Each of the plurality of page buffers comprises a sensing unit and a bit line select transistor coupled between the sensing unit and the one of the plurality of pads. The bit line select transistors of the plurality of page buffers are disposed in the plurality of high voltage regions, and the plurality of pads are distributed and disposed in a plurality of pad regions which correspond to the high voltage regions and are spaced apart from each other in the second direction.
1. A semiconductor memory device comprising:
a plurality of page buffers disposed on a substrate; and
a plurality of pads exposed to one surface of a dielectric layer covering the page buffers, and coupled to the respective page buffers,
wherein the substrate comprises a plurality of high voltage regions and a plurality of low voltage regions which are alternately disposed in a second direction crossing a first direction,
each of the plurality of page buffers comprises a sensing unit and a bit line select transistor coupled between the sensing unit and one of the plurality of pads, and
the bit line select transistors of the plurality of page buffers are disposed in the plurality of high voltage regions, and the plurality of pads are distributed and disposed in a plurality of pad regions which correspond to the plurality of high voltage regions and are spaced apart from each other in the second direction.
2. The semiconductor memory device of claim 1 , wherein each of the plurality of pad regions overlaps a corresponding high voltage region, and a width of each of the plurality of pad regions in the second direction is equal to a width of the corresponding high voltage region in the second direction.
3. The semiconductor memory device of claim 1 , wherein each of the plurality of pad regions overlaps a corresponding high voltage region and portions of a pair of low voltage regions adjacent to the high voltage region, and
a width of each of the plurality of pad regions in the second direction is larger than a width of the corresponding high voltage region in the second direction.
4. The semiconductor memory device of claim 3 , wherein some of the plurality of pads overlap the high voltage region and a low voltage region adjacent to the high voltage region.
5. The semiconductor memory device of claim 3 , wherein some of the plurality of pads overlap the low voltage region and do not overlap the high voltage region.
6. The semiconductor memory device of claim 1 , wherein a pitch of the plurality of pads in the first direction is larger than a pitch of the bit line select transistors in the first direction.
7. The semiconductor memory device of claim 1 , wherein each of the plurality of pads overlaps two or more bit line select transistors disposed adjacent to each other in the first direction.
8. The semiconductor memory device of claim 1 , wherein a number of the plurality of pads disposed in the first direction is smaller than a number of the bit line select transistors disposed in the first direction.
9. A semiconductor memory device comprising:
a peripheral wafer comprising a plurality of page buffers and a plurality of first pads coupled to the respective page buffers, and having one surface with the first pads disposed thereon; and
a cell wafer comprising: a plurality of second pads disposed at one surface and bonded to the one surface of the peripheral wafer and coupled to the respective first pads; a plurality of bit lines coupled to the plurality of second pads, extended in a second direction crossing a first direction, and arranged in the first direction; and a memory cell array coupled to the plurality of bit lines,
wherein each of the plurality of page buffers comprises a sensing unit configured to sense a signal of the bit line and a bit line select transistor coupled between the sensing unit and the first pad,
the peripheral wafer comprises a plurality of high voltage regions and a plurality of low voltage regions which are alternately disposed in the second direction,
the bit line select transistors of the plurality of page buffers are disposed in the plurality of high voltage regions, and
the plurality of first pads is disposed in a plurality of pad regions which correspond to the plurality of high voltage regions and are spaced apart from each other in the second direction.
10. The semiconductor memory device of claim 9 , wherein each of the plurality of pad regions overlaps a corresponding high voltage region, and a width of each of the plurality of pad regions in the second direction is equal to a width of the corresponding high voltage region in the second direction.
11. The semiconductor memory device of claim 9 , wherein each of the plurality of pad regions overlaps a corresponding high voltage region and portions of a pair of low voltage regions adjacent to the high voltage region, and
a width of each of the plurality of pad regions in the second direction is larger than a width of the corresponding high voltage region in the second direction.
12. The semiconductor memory device of claim 11 , wherein some of the plurality of first pads overlap the high voltage region and a low voltage region adjacent to the high voltage region.
13. The semiconductor memory device of claim 11 , wherein some of the plurality of first pads overlap the low voltage region and do not overlap the high voltage region.
14. The semiconductor memory device of claim 9 , wherein a pitch of the plurality of first pads in the first direction is larger than a pitch of the bit line select transistors in the first direction.
15. The semiconductor memory device of claim 9 , wherein each of the plurality of first pads overlaps two or more bit line select transistors disposed adjacent to each other in the first direction.
16. The semiconductor memory device of claim 9 , wherein a number of the plurality of first pads disposed in the first direction is smaller than a number of the bit line select transistors disposed in the first direction.
17. The semiconductor memory device of 9 , wherein the memory cell array comprises:
a plurality of vertical channels coupled to the plurality of bit lines; and
a plurality of electrode layers and a plurality of interlayer dielectric layers, which are alternately stacked along the plurality of vertical channels.
18. The semiconductor memory device of claim 9 , wherein a pitch of the plurality of second pads in the first direction is equal to a pitch of the plurality of first pads in the first direction.
19. The semiconductor memory device of claim 9 , wherein a number of the plurality of second pads disposed in the first direction is equal to a number of the plurality of first pads disposed in the first direction.