Electrostatic chuck and substrate processing apparatus including the same

1. An electrostatic chuck comprising:

a chuck plate configured to mount a substrate;

an insulation pillar provided outside the chuck plate, the insulation pillar having a pin hole formed therein;

a first movable ring provided on the insulation pillar, surrounding a side of the chuck plate;

a second movable ring configured to cover at least a part of an upper portion of the first movable ring; and

a driving pin configured to move in the pin hole of the insulation pillar in a vertical direction, the driving pin overlapped by at least a part of the first movable ring and at least a part of the second movable ring in the vertical direction,

wherein the driving pin is configured to drive the first movable ring and the second movable ring in the vertical direction or to drive the second movable ring in the vertical direction, and

wherein, in a state in which the driving pin drives the first movable ring and the second movable ring in the vertical direction, a surface of the first movable ring contacting the driving pin and a surface of the second movable ring contacting the driving pin are at a same level.

2. The electrostatic chuck of claim 1 , wherein

the chuck plate comprises:

a first portion in which the substrate is mounted; and

a second portion extending from a lower portion of the first portion to outside the first portion,

wherein the first movable ring comprises:

a support unit mounted on the insulation pillar;

a protection unit extending from inside the support unit in a horizontal direction and surrounding a side of the first portion of the chuck plate and an upper surface of the second portion of the chuck plate; and

a first contact unit extending from outside the support unit in the horizontal direction and having a first driving groove in which the driving pin may be positioned.

3. The electrostatic chuck of claim 2 , wherein the first driving groove of the first contact unit overlaps at least a part of the driving pin in the vertical direction, and

wherein, when the driving pin moves with a depth greater than that of the first driving groove in the vertical direction, the driving pin drives the first movable ring and the second movable ring in the vertical direction.

4. The electrostatic chuck of claim 1 , wherein

the chuck plate comprises:

a first portion in which the substrate is mounted; and

a second portion extending from a lower portion of the first portion to outside the first portion,

wherein the first movable ring comprises:

a support unit mounted on the insulation pillar and having a through hole through which the driving pin passes;

a protection unit extending from inside the support unit in a horizontal direction and surrounding a side of the first portion of the chuck plate and an upper surface of the second portion of the chuck plate; and

a first contact unit extending from outside the support unit in the vertical direction and having a first driving groove connected to the through hole in the vertical direction so that the driving pin is positioned within the first driving groove, and

wherein the second movable ring is provided on the support unit of the first movable ring so as to overlap at least a part of the through hole in the vertical direction.

5. The electrostatic chuck of claim 4 , wherein the second movable ring comprises:

a second contact unit positioned on the support unit of the first movable ring so as to overlap at least a part of the driving pin in the vertical direction; and

a cover extending from the second contact unit in the horizontal direction and covering the part of the upper portion of the first movable ring,

wherein, when the driving pin moves with a depth less than a depth of the first driving groove in the vertical direction, the driving pin drives the second movable ring in the vertical direction without driving the first movable ring in the vertical direction, and

wherein, when the driving pin moves with a depth greater than the depth of the first driving groove in the vertical direction, the driving pin drives the first movable ring and the second movable ring in the vertical direction.

6. The electrostatic chuck of claim 1 , further comprising:

a guide holder configured to guide movement of the driving pin in the vertical direction; and

a power source configured to transmit power to the driving pin.

7. The electrostatic chuck of claim 1 , further comprising a fixed ring provided on the insulation pillar so as to surround the first movable ring and the second movable ring,

wherein the fixed ring does not overlap the driving pin in the vertical direction.

8. A substrate processing apparatus comprising:

a process chamber configured to regulate an internal space for processing a substrate;

a gas supply connected to the process chamber and configured to supply a treatment gas for processing the substrate in the internal space; and

an electrostatic chuck configured to support the substrate in the internal space,

wherein the electrostatic chuck comprises:

a chuck plate configured to mount the substrate;

an insulation pillar provided outside the chuck plate, the insulation pillar having a pin hole formed therein;

a first movable ring provided on the insulation pillar, surrounding a side of the chuck plate;

a second movable ring covering at least a part of an upper portion of the first movable ring; and

a driving pin configured to move in the pin hole of the insulation pillar in a vertical direction, the driving pin overlapped by at least a part of the first movable ring and at least a part of the second movable ring in the vertical direction, and configured to drive the first movable ring and the second movable ring in the vertical direction or to drive the second movable ring in the vertical direction, and

wherein, in a state in which the driving pin drives the first movable ring and the second movable ring in the vertical direction, a surface of the first movable ring contacting the driving pin and a surface of the second movable ring contacting the driving pin are at a same level.

9. The substrate processing apparatus of claim 8 , wherein

the first movable ring comprises:

a support unit mounted on the insulation pillar;

a protection unit extending from inside of the support unit in a horizontal direction and surrounding the side of the chuck plate; and

a first contact unit extending from outside the support unit in the horizontal direction and having a first driving groove in which the driving pin is positioned, and

wherein the second movable ring comprises:

a second contact unit provided on the insulation pillar, surrounding the first movable ring, and having a second driving groove in which the driving pin is positioned; and

a cover extending from the second contact unit in the horizontal direction and covering at least the part of the upper portion of the first movable ring.

10. The substrate processing apparatus of claim 9 , wherein the driving pin is overlapped by at least a part of the first contact unit and at least a part of the second contact unit in the vertical direction, and

wherein a depth of the first driving groove is greater than a depth of the second driving groove.

11. The substrate processing apparatus of claim 8 , further comprising:

a guide holder configured to guide movement of the driving pin in the vertical direction;

a power source configured to transmit power to the driving pin; and

a fixed ring provided on the insulation pillar so as to surround the first movable ring and the second movable ring,

wherein the fixed ring does not overlap the driving pin in the vertical direction.