IP Library › Granted Patent US 11,404,299
Granted Patent B2
US 11,404,299 · App. 16/554,433 · Granted Aug 2, 2022

Substrate transfer mechanism, substrate processing apparatus, and substrate processing method

Inventor: Shinji Wakabayashi (Nirasaki, JP)
Assignee: TOKYO ELECTRON LIMITED
H01L21/67754H01L21/67196H01L21/67201H01L21/67742H01L21/67745H01L21/68707
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Quick Facts
Patent No.
US 11,404,299
App. No.
16/554,433
Granted
Aug 2, 2022
Kind
B2
Abstract

In a substrate transfer mechanism, a moving body moves horizontally, and a support body is provided at the moving body to rotate about a vertical shaft. A first rotary shaft and a second rotary shaft are disposed vertically. A first arm forms a first substrate support region for supporting a first substrate, the first arm having a base portion connected to the first rotary shaft and a tip portion rotating at an outer side of the support body. A second arm forms a second substrate support region for supporting a second substrate, the second arm having a base portion connected to the second rotary shaft and a tip portion rotating the outer side of the support body. Further, an elevating mechanism is configured to raise and lower the second rotary shaft depending on a direction of the second arm with respect to the support body.

Claims (42)

1. A substrate transfer mechanism comprising:

a moving body moving horizontally;

a support body provided at the moving body to rotate about a vertical shaft;

a first rotary shaft and a second rotary shaft disposed vertically while being spaced apart from each other in a horizontal direction of the support body;

a first arm forming a first substrate support region for supporting a first substrate, the first arm having a base portion connected to the first rotary shaft and a tip portion rotating at an outer side of the support body;

a second arm forming a second substrate support region for supporting a second substrate different from the first substrate, the second arm having a base portion connected to the second rotary shaft and a tip portion rotating the outer side of the support body; and

an elevating mechanism configured to raise and lower the second rotary shaft depending on a direction of the second arm with respect to the support body to avoid interference between the first arm and the second arm,

wherein a relationship between the direction of the second arm with respect to the support body and a variation in a height position of the second arm is predetermined so that the height position of the second arm is determined based on the direction of the second arm with respect to the support body.

2. The substrate transfer mechanism of claim 1 , wherein when a direction of the first arm is identical to the direction of the second arm, a height of the first substrate support region is identical to a height of the second substrate support region.

3. The substrate transfer mechanism of claim 2 , wherein the first substrate support region supports a plurality of substrates along a longitudinal direction of the first arm and the second substrate support region supports a plurality of substrates along a longitudinal direction of the second arm.

4. The substrate transfer mechanism of claim 3 , wherein the moving body moves in a state, when viewed from above, where longitudinal directions of the first arm and the second arm are inclined with respect to a straight line connecting the first rotary shaft and the second rotary shaft and the first arm and the second arm cross with each other.

5. The substrate transfer mechanism of claim 2 , wherein the moving body moves in a state, when viewed from above, where longitudinal directions of the first arm and the second arm are inclined with respect to a straight line connecting the first rotary shaft and the second rotary shaft and the first arm and the second arm cross with each other.

6. The substrate transfer mechanism of claim 1 , wherein the first substrate support region supports a plurality of substrates along a longitudinal direction of the first arm and the second substrate support region supports a plurality of substrates along a longitudinal direction of the second arm.

7. The substrate transfer mechanism of claim 6 , wherein the moving body moves in a state, when viewed from above, where longitudinal directions of the first arm and the second arm are inclined with respect to a straight line connecting the first rotary shaft and the second rotary shaft and the first arm and the second arm cross with each other.

8. The substrate transfer mechanism of claim 1 , wherein the moving body and the support body form an articulated arm.

9. The substrate transfer mechanism of claim 8 , wherein the moving body moves in a state, when viewed from above, where longitudinal directions of the first arm and the second arm are inclined with respect to a straight line connecting the first rotary shaft and the second rotary shaft and the first arm and the second arm cross with each other.

10. The substrate transfer mechanism of claim 1 , wherein the moving body moves in a state, when viewed from above, where longitudinal directions of the first arm and the second arm are inclined with respect to a straight line connecting the first rotary shaft and the second rotary shaft and the first arm and the second arm cross with each other.

11. The substrate transfer mechanism of claim 1 , wherein said direction of the second arm with respect to the support body is a longitudinal direction of the second arm with respect to a longitudinal direction of the support body.

12. A substrate processing apparatus comprising:

a transfer chamber of a vacuum atmosphere;

a processing module connected to the transfer chamber and configured to process a substrate in a vacuum atmosphere;

a load-lock module connected to the transfer chamber;

a substrate transfer mechanism provided in the transfer chamber to transfer the substrate between the load-lock module and the processing module, the substrate transfer mechanism comprising:

a moving body moving horizontally,

a support body provided at the moving body to rotate about a vertical shaft,

a first rotary shaft and a second rotary shaft disposed vertically while being spaced apart from each other in a horizontal direction of the support body,

a first arm forming a first substrate support region for supporting a first substrate, the first arm having a base portion connected to the first rotary shaft and a tip portion rotating at an outer side of the support body,

a second arm forming a second substrate support region for supporting a second substrate different from the first substrate, the second arm having a base portion connected to the second rotary shaft and a tip portion rotating the outer side of the support body, and

an elevating mechanism configured to raise and lower the second rotary shaft depending on a direction of the second arm with respect to the support body to avoid interference between the first arm and the second arm, wherein a relationship between the direction of the second arm with respect to the support body and a variation in a height position of the second arm is predetermined so that the height position of the second arm is determined based on the direction of the second arm with respect to the support body; and

a loader module on which a transfer container storing the substrate is mounted and through which the substrate is transferred between the transfer container and the load-lock module.

13. The substrate processing apparatus of claim 12 , further comprising:

a controller configured to output a control signal for controlling the first arm and the second arm to enter the load-lock module sequentially and the first arm and the second arm to enter the processing module at the same time.

14. The substrate processing apparatus of claim 12 , further comprising a controller configured to output a control signal for allowing the first arm to enter the processing module to receive the first substrate stored in the processing module, for retracting the first arm supporting the first substrate from the processing module, and for allowing a second arm supporting the second substrate to enter the processing module to transfer the second substrate to the processing module.

15. A substrate transfer method comprising:

horizontally moving a moving body;

rotating a support body provided at the moving body about a vertical shaft;

rotating a first rotary shaft and a second rotary shaft disposed vertically while being spaced apart from each other in a horizontal direction of the support body;

rotating a tip portion of a first arm at an outer side of the support body, the first arm forming a first substrate support region for supporting a first substrate and having a base portion connected to the first rotary shaft and the tip portion;

rotating a tip portion of a second arm at the outer side of the support body, the second arm forming a second substrate support region for supporting a second substrate different from the first substrate and having a base portion connected to the second rotary shaft and the tip portion; and

raising and lowering the second rotary shaft depending on a direction of the second arm with respect to the support body to avoid interference between the first arm and the second arm,

wherein a relationship between the direction of the second arm with respect to the support body and a variation in a height position of the second arm is predetermined so that the height position of the second arm is determined based on the direction of the second arm with respect to the support body.

16. The substrate transfer method of claim 15 , wherein said direction of the second arm with respect to the support body is a longitudinal direction of the second arm with respect to a longitudinal direction of the support body.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 28, 2019
From: WAKABAYASHI, SHINJI
To: TOKYO ELECTRON LIMITED
Reel/Frame 050205/0439 →
Priority Claims (1)
JP JP2018-164629 · Sep 3, 2018 · national
Continuity (1)
Related Publication 20200075377A1 · Mar 5, 2020