Wafer processing apparatus and wafer processing method
A wafer processing apparatus includes a reaction tube extending in a vertical direction, a door plate configured to load a boat into the reaction tube and positioned under the reaction tube to seal the reaction tube, the boat supporting a plurality of wafers thereon, a gas injector extending in the vertical direction along the boat within the reaction tube and including a plurality of ejection holes formed therein, a rotary mechanism configured to rotate the gas injector about its center axis to adjust an angle of the ejection hole toward the wafer, and a lift mechanism configured to move the gas injector upward and downward to adjust a height of the ejection hole on the wafer.
1. A wafer processing apparatus, comprising:
a reaction tube extending in a vertical direction;
a door plate configured to load a boat into the reaction tube and positioned under the reaction tube to seal the reaction tube, the boat supporting a plurality of wafers thereon;
a gas injector extending in the vertical direction along the boat within the reaction tube, and including a plurality of ejection holes formed therein;
a coupling shaft combined with a lower portion of the gas injector to support the gas injector:
a rotary motor configured to rotate the gas injector about its center axis to adjust an angle of the ejection holes with respect to the wafers; and
an actuator configured to move the gas injector upward and downward to adjust a height of the ejection holes relative to the wafers,
wherein the coupling shaft is inserted into and penetrates through a through hole formed in the door plate,
wherein the rotary motor rotates the coupling shaft, and
wherein the actuator elevates and lowers the coupling shaft.
2. The wafer processing apparatus of claim 1 , wherein the ejection holes are spaced apart from each other along an extending direction of the gas injector to be in one-to-one correspondence with the wafers.
3. The wafer processing apparatus of claim 1 , wherein the gas injector is movable upward and downward within a predetermined stroke range.
4. The wafer processing apparatus of claim 3 , wherein an amount of the predetermined stroke range of the gas injector is in a range of about 1 mm to about 15 mm.
5. The wafer processing apparatus of claim 1 , wherein the gas injector is rotatable within a predetermined angle range about its center axis.
6. The wafer processing apparatus of claim 5 , wherein the predetermined angle range of the gas injector ranges from 3 degrees to 90 degrees.
7. The wafer processing apparatus of claim 1 ,
wherein the coupling shaft is spaced apart from an inner wall of the through hole.
8. The wafer processing apparatus of claim 1 , further comprising:
a gas introduction tube including an end portion extending into an inner space of the gas injector through a slit formed in the coupling shaft within the reaction tube.
9. A wafer processing apparatus, comprising:
a reaction tube extending in a vertical direction;
a door plate positioned under the reaction tube to seal the reaction tube;
a gas introduction tube introducing a process gas from a gas supply source into the reaction tube;
a gas injector extending from the gas introduction tube in the vertical direction along a boat within the reaction tube, and including a plurality of ejection holes formed therein;
a coupling shaft combined with a lower portion of the gas injector to support the gas injector;
a rotary motor configured to rotate the gas injector about its center axis within a predetermined angle range; and
an actuator configured to move the gas injector upward and downward within a predetermined stroke range,
wherein the coupling shaft is inserted into and penetrates through a through hole formed in the door plate,
wherein the rotary motor rotates the coupling shaft, and
wherein the actuator elevates and lowers the coupling shaft.
10. The wafer processing apparatus of claim 9 ,
wherein the coupling shaft is spaced apart from an inner wall of the through hole.
11. The wafer processing apparatus of claim 9 , wherein an end portion of the gas introduction tube extends into an inner space of the gas injector through a slit formed in the coupling shaft within the reaction tube.
12. The wafer processing apparatus of claim 11 , wherein the slit extends in a circumferential direction to have a predetermined central angle at the center of the coupling shaft and extends in an extending direction of the coupling shaft to have a predetermined height.
13. The wafer processing apparatus of claim 9 , further comprising:
a magnetic fluid seal installed under the door plate to support the coupling shaft rotatable in a hermetically sealed state; and
a bellows attached between a lower support block including the magnetic fluid seal and a lower surface of the door plate.
14. The wafer processing apparatus of claim 9 , wherein the ejection holes are spaced apart from each other along an extending direction of the gas injector to be in one-to-one correspondence with wafers loaded onto the boat.
15. The wafer processing apparatus of claim 9 ,
wherein the predetermined angle range of the gas injector ranges from 3 degrees to 90 degrees, and
wherein an amount of the predetermined stroke range of the gas injector is in a range of about 1 mm to about 15 mm.