Layer forming method and apparatus
There is provided a method and apparatus to deposit a molybdenum comprising layer on a substrate by supplying a precursor comprising molybdenum(VI) dichloride dioxide and a first reactant comprising boron and hydrogen to the substrate in a reaction chamber to react and form the molybdenum layer. The first reactant comprising boron and hydrogen may be diborane.
1. A method of depositing a molybdenum comprising layer on a substrate in a reaction chamber, the method comprising:
forming a seed layer comprising the steps of:
supplying a precursor comprising molybdenum (VI) dichloride dioxide (MoO 2 Cl 2 ) to the substrate in the reaction chamber; and,
supplying a first reactant to the substrate in the reaction chamber to let a portion of the precursor and the first reactant react to form the seed layer, wherein the first reactant comprises boron and hydrogen and hydrogen (H 2 ); and
forming a bulk layer comprising the steps of:
supplying the precursor comprising molybdenum (VI) dichloride dioxide (MoO 2 Cl 2 ) to the substrate in the reaction chamber; and,
supplying a second reactant comprising hydrogen (H 2 ) to the substrate in the reaction chamber, wherein a portion of the precursor and the reactant react to form the bulk molybdenum layer.
2. The method according to claim 1 wherein the seed layer is formed using atomic layer deposition.
3. The method according to claim 2 , wherein the bulk molybdenum layer is formed using chemical vapor deposition.
4. The method according to claim 1 , wherein a surface of the substrate comprises aluminum oxide and/or titanium nitride.
5. The method according to claim 1 , wherein the precursor is supplied with pulses into the reaction chamber and the pulses are between 0.1 and 10 seconds.
6. The method according to claim 1 , wherein the flow of the precursor into the reaction chamber is between 50 and 1000 sccm.
7. The method according to claim 1 , wherein the flow of the first reactant into the reaction chamber is between 50 and 50000 sccm.
8. The method according to claim 1 , wherein the pressure in the reaction chamber is between 0.1 and 100 Torr.
9. The method according to claim 1 , wherein the process temperature is between 300 and 800° C.
10. The method according to claim 1 , wherein depositing the molybdenum layer comprises repeating an atomic layer deposition (ALD) cycle comprising sequentially supplying the precursor and the first reactant to the substrate.
11. The method according to claim 10 , wherein in between supplying the first precursor and the first reactant the substrate is purged between 0.5 and 50 seconds.
12. The method according to claim 11 , wherein supplying the first reactant into the reaction chamber takes between 0.5 and 50 seconds.
13. The method according to claim 1 , wherein the first reactant comprising boron and hydrogen is selected from the group-consisting of boranes of formula BnH (n+x) , wherein n is an integer from 1 to 10 and x is an even integer.
14. The method according to claim 13 , wherein the first reactant comprising boron and hydrogen is selected from the group consisting of nido-boranes of formula BnH (n+4) .
15. The method according to claim 13 , wherein the first reactant comprising boron and hydrogen is selected from the group consisting of arachno-boranes of the formula BnH (n+6) .
16. The method according to claim 13 , wherein the first reactant comprising boron and hydrogen is selected from the group consisting of hypho-boranes of the formula BnH (n+8) .
17. The method of claim 1 , wherein the substrate comprises a gap, and wherein a surface of the gap comprises different materials.
18. The method according to claim 1 , wherein the first reactant comprising boron and hydrogen is selected from the group consisting and conjuncto-boranes B n H m , wherein n is an integer from 1 to 10 and m is an integer from 1 to 10 that is different from n.
19. The method according to claim 1 , wherein before the precursor is provided to the reaction chamber the first reactant comprising boron and hydrogen is provided in the reaction chamber to prepare the surface of the substrate.
20. The method according to claim 1 , wherein the substrate comprises one or more gaps created during manufacturing of a feature on the substrate and the one or more gaps are at least partially filled by the method of depositing a molybdenum comprising layer on a substrate in a reaction chamber.