Metrology sensor, illumination system and method of generating measurement illumination with a configurable illumination spot diameter

1. An illumination system comprising:

a spatial filter system configured to perform selective spatial filtering of a beam of incoherent radiation; and

at least one optical guide configured to guide the spatially filtered beam of the incoherent radiation to a metrology sensor system,

the at least one optical guide being such that the incoherent radiation guided has a substantially similar output angle as input angle,

wherein the metrology sensor system is operable to generate measurement illumination from the incoherent radiation, an illumination spot diameter of the measurement illumination being dependent upon the selective spatial filtering by the spatial filter system, and

wherein the spatial filter system comprises at least one aperture having a selectable size to implement the selective spatial filtering.

2. The illumination system of claim 1 , wherein the at least one aperture is substantially circular having a selectable diameter.

3. The illumination system of claim 2 , wherein the spatial filter system comprises a plurality of apertures having different sizes, the selective spatial filtering being implemented by a selection of one of the apertures to filter the beam of incoherent radiation.

4. The illumination system of claim 1 , wherein the spatial filter system comprises a single aperture having a configurable size to implement the selective spatial filtering.

5. The illumination system of claim 1 , further comprising:

a focusing optical element configured to focus the spatially filtered beam of the incoherent radiation onto an input of the at least one optical guide as an input cone having a first half-cone angle, such that a resulting output cone of the guided incoherent radiation has the first half-cone angle.

6. The illumination system of claim 1 , comprising a parallelizing optical element to define a parallel beam of the incoherent radiation, such that the spatial filter system spatially filters the parallel beam of the incoherent radiation to implement the selective spatial filtering.

7. The illumination system of claim 1 , comprising an illumination source for generating the incoherent radiation.

8. The illumination system of claim 1 , wherein the at least one optical guide comprises a multimode fiber.

9. A metrology sensor system comprising:

a module housing containing metrology sensor system optics; and

an illumination system comprising:

a spatial filter system configured to perform selective spatial filtering of a beam of incoherent radiation; and

at least one optical guide configured to guide the spatially filtered beam of the incoherent radiation to the metrology sensor system,

the at least one optical guide being such that the incoherent radiation guided has a substantially similar output angle as input angle for spatially filtering and delivering the incoherent radiation to the module housing,

wherein at least the spatial filter system of the illumination system is positioned outside of the module housing, and

wherein the metrology sensor system is operable to generate measurement illumination from the incoherent radiation, an illumination spot diameter of the measurement illumination being dependent upon the selective spatial filtering by the spatial filter system.

10. A metrology sensor system comprising:

a module housing comprising metrology sensor system optics including an objective lens; and

an illumination system comprising:

a spatial filter system configured to perform selective spatial filtering of a beam of incoherent radiation; and

at least one optical guide configured to guide the spatially filtered beam of the incoherent radiation to the metrology sensor system,

the at least one optical guide being such that the incoherent radiation guided has a substantially similar output angle as input angle for spatially filtering and delivering the incoherent radiation to the module housing,

wherein at least the spatial filter system of the illumination system is located outside of the module housing, and

wherein the metrology sensor system is operable to generate measurement illumination from the incoherent radiation, an illumination numerical aperture of the objective lens being dependent upon the selective spatial filtering by the spatial filter system.

11. The metrology sensor system of claim 9 , wherein the metrology sensor system is implemented as an alignment sensor system configured to measure alignment within a lithographic apparatus.

12. The metrology sensor system of claim 10 , wherein the metrology sensor system is implemented as a process monitoring sensor system configured to measure one or more process parameters of structures formed using a lithographic apparatus.

13. A lithographic apparatus comprising:

a metrology sensor system comprising:

a module housing comprising metrology sensor system optics including an objective lens; and

an illumination system configured to deliver incoherent radiation to the metrology sensor system, the illumination system comprising:

a spatial filter system configured to perform selective spatial filtering of a beam of the incoherent radiation; and

at least one optical guide for guiding the spatially filtered beam of the incoherent radiation to the metrology sensor system,

the at least one optical guide being such that the radiation guided has a substantially similar output angle as input angle and is configured to perform the spatial filtering and to deliver the incoherent radiation to the module housing,

wherein at least the spatial filter system of the illumination system is positioned outside of the module housing, and

wherein the metrology sensor system is operable to generate measurement illumination from the incoherent radiation, an illumination numerical aperture of the objective lens being dependent upon the selective spatial filtering by the spatial filter system.

14. A method comprising:

generating a beam of incoherent radiation;

selectively spatially filtering the beam of incoherent radiation;

guiding the spatially filtered beam of the incoherent radiation to within a module housing of a metrology sensor system using an optical guide being configured such that the incoherent radiation guided has a substantially similar output angle as input angle; and

generating measurement illumination from the spatially filtered beam of the incoherent radiation, an illumination spot diameter of the measurement illumination being dependent upon the selective spatial filtering performed outside of the module housing,

wherein the spatial filtering is performed using at least one aperture having a selectable size.

15. The method of claim 14 , further comprising selecting an aperture from a plurality of apertures of different sizes to select and/or change the illumination spot diameter.

16. The method claim 14 , further comprising configuring a size of a single aperture having a configurable size to select and/or change the illumination spot diameter.

17. The method of claim 14 , further comprising focusing the spatially filtered beam of the incoherent radiation onto an input of the at least one optical guide as an input cone having a first half-cone angle, such that a resulting output cone of the guided incoherent radiation has the first half-cone angle.

18. The method of claim 14 , further comprising defining a parallel beam of the incoherent radiation, such that the spatial filtering is of the parallel beam of incoherent radiation.