Articles with a low-elastic modulus layer and retained strength
One or more aspects of the disclosure pertain to an article including a film disposed on a glass substrate, which may be strengthened, where the interface between the film and the glass substrate is modified, such that the article has an improved average flexural strength, and the film retains key functional properties for its application. Some key functional properties of the film include optical, electrical and/or mechanical properties. The bridging of a crack from one of the film or the glass substrate into the other of the film or the glass substrate can be suppressed by inserting a nanoporous crack mitigating layer between the glass substrate and the film.
1. An article comprising:
a glass substrate having opposing major surfaces, wherein the glass substrate has a first average strain-to-failure that is greater than about 0.5%;
a crack mitigating layer disposed on a first major surface of the glass substrate; and
a film disposed on the crack mitigating layer,
wherein the crack mitigating layer causes a crack originating in one of the film and the glass substrate and entering into the crack mitigating layer to remain within the crack mitigating layer,
wherein the film comprises a single layer or a plurality of layers forming a first thickness, and wherein the crack mitigating layer comprises a second thickness that is less than or equal to about 3 times the first thickness, and wherein the first thickness and the second thickness are each about 5 micrometers or less; and
wherein the crack mitigating layer has a thickness in the range from about 35 nm to about 80 nm and the film has a thickness of less than about 5 μm.
2. The article of claim 1 , wherein the article including the glass substrate, the crack mitigating layer, and the film has a total reflectance less than about 6% in a wavelength range from 450-650 nm.
3. The article of claim 1 , wherein the crack mitigating layer exhibits a fracture toughness of about 1 MPa·m 1/2 or less.
4. The article of claim 1 , wherein the glass substrate and the crack mitigating layer form a first interface and the film and crack mitigating layer form a second interface, and wherein the crack mitigating layer causes the crack originating in one of the film and the glass substrate to propagate within the crack mitigating layer in a direction substantially parallel to one or both the first interface and the second interface.
5. The article of claim 1 , wherein the glass substrate and the crack mitigating layer form a first interface and the film and crack mitigating layer form a second interface, and wherein the crack mitigating layer causes the crack originating in one of the film and the glass substrate to propagate substantially along either the first interface or the second interface.
6. The article of claim 1 , wherein the film comprises one or more layers selected from transparent conductive oxide layers, IR reflecting layers, UV reflecting layers, conducting layers, semiconducting layers, electronics layers, thin film transistor layers, EMI shielding layers, anti-reflection layers, anti-glare layers, dirt-resistant layers, self-cleaning layers, scratch-resistant layers, barrier layers, passivation layers, hermetic layers, diffusion-blocking layers, fingerprint-resistant layers and combinations thereof.
7. An article comprising:
a glass substrate having opposing major surfaces and a first average strain-to-failure;
a film disposed on a first major surface having a second average strain-to-failure that is lower than the first average strain-to-failure; and
a crack mitigating layer disposed between the glass substrate and the film, the crack mitigating layer comprising a nanoporous material having a porosity in the range from about 10% by volume to about 50% by volume and an elastic modulus in the range from about 1 GPa to about 50 GPa.
8. The article of claim 7 , wherein the crack mitigating layer has an average pore size of less than about 50 nm and an optical transmission haze of less than about 10%.
9. The article of claim 7 , wherein the crack mitigating layer has a refractive index in a range from about 1.3 to about 1.7.
10. The article of claim 7 , wherein the crack mitigating layer exhibits an elastic modulus in the range from about 5 GPa to about 40 GPa.
11. The article of claim 7 , wherein the crack mitigating layer has a thickness in the range from about 35 nm to about 80 nm and the film has a thickness of less than about 5 μm.
12. The article of claim 7 , wherein the crack mitigating layer has a thickness in the range from about 10 nm to about 250 nm.
13. An article comprising:
a glass substrate having opposing major surfaces and having a first average strain-to-failure;
a crack mitigating layer disposed on a first major surface of the glass substrate forming a first interface; and
a film disposed on the crack mitigating layer forming a second interface, the film having a second average strain-to-failure that is lower than the first average strain-to-failure, and
wherein a load required for a crack originating in the film to bridge across the first interface is greater than a load required for the crack to bridge across the second interface,
further wherein the film comprises a single layer or a plurality of layers forming a first thickness, and wherein the crack mitigating layer comprises a second thickness that is less than or equal to about 3 times the first thickness, and wherein the first thickness and the second thickness are each about 5 micrometers or less; and
wherein the crack mitigating layer has a thickness in the range from about 35 nm to about 80 nm and the film has a thickness of less than about 5 μm.
14. The article of claim 13 , wherein the crack mitigating layer comprises a polymeric material selected from one or more of polyimide, fluorinated polyimide, polyetherimide, or polyethersulfone.
15. The article of claim 13 , wherein the film comprises one or more of Al 2 O 3 , AlN, AlO x N y , Si 3 N 4 , SiO x N y , SiAl x O y N z , TiO 2 , Nb 2 O 5 , Ta 2 O 5 , ZrO 2 , SiC x N y , SiC x O y N z , SiC, indium-tin-oxide, tin oxide, fluorinated tin oxide, aluminum zinc oxide, and zinc oxide.