Apparatus for and method of in-situ particle removal in a lithography apparatus
Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.
1. An apparatus for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system comprising:
a cleaning substrate positioned opposite to the clamping face, wherein the clamping structure is configured to secure the cleaning substrate; and
a temperature control unit in thermal communication with one of the cleaning substrate and the clamping structure, and configured to induce a temperature differential between the cleaning substrate and the clamping structure so as to attract the particulate contaminants on the clamping face to the cleaning substrate,
wherein the temperature control unit is in thermal communication with the cleaning substrate and further comprises a second temperature control unit in thermal communication with the clamping structure.
2. The apparatus of claim 1 , wherein the cleaning substrate is a cleaning reticle.
3. The apparatus of claim 2 , wherein the temperature control unit is in thermal communication with the cleaning reticle.
4. The apparatus of claim 1 , wherein the temperature control unit is in thermal communication with the clamping structure.
5. The apparatus of claim 2 , wherein the temperature control unit is configured to couple radio frequency energy into the clamping structure.
6. The apparatus of claim 2 , further comprising a source of coolant selectably coupled to the clamping structure and wherein the clamping structure is arranged to be selectably warmed by radiation, and wherein the temperature control unit comprises a valve to control coupling between the source of coolant and the clamping structure.
7. The apparatus of claim 6 , wherein the radiation is EUV radiation.
8. The apparatus of claim 2 , wherein the temperature control unit comprises a radiation absorbing coating on a surface of the cleaning reticle facing away from the clamping structure and wherein the surface of the cleaning reticle is arranged to be selectably irradiated by radiation.
9. The apparatus of claim 8 , wherein the radiation is EUV radiation.
10. The apparatus of claim 2 , further comprising a gas system configured to selectably causing a flow of gas across a surface of the cleaning reticle facing away from the clamping structure and wherein the temperature control unit is configured to control the gas system to alter a flow rate of the gas.
11. The apparatus of claim 10 , wherein the temperature control unit comprises a module for controlling the gas system to substantially stop the flow of gas.
12. The apparatus of claim 2 , further comprising a gas system configured to selectably causing a flow of gas across a surface of the cleaning reticle facing the clamping structure and wherein the temperature control unit comprises a module configured to heat the gas.
13. The apparatus of claim 2 , further comprising a reticle stage for supporting the cleaning reticle, at least one motor configured to drive the reticle stage, and a source of coolant selectably coupled to the reticle stage, and wherein the temperature control unit comprises a module configured to operate the at least one motor to generate heat and a valve for controlling coupling between the source of coolant and the reticle stage.
14. The apparatus of claim 2 , wherein the temperature control unit comprises at least one resistive heater within the clamping structure.
15. The apparatus of claim 14 , wherein the clamping structure comprises a clamping surface comprising a plurality of raised surface features, and wherein the temperature control unit comprises at least one resistive heater in at least some of the plurality of raised surface features.
16. The apparatus of claim 2 , wherein the temperature control unit comprises at least one resistive heater within the cleaning reticle.
17. The apparatus of claim 16 , wherein the cleaning reticle comprises a battery electrically coupled to the resistive heater.
18. The apparatus of claim 2 , wherein the temperature control unit comprises at least one electrical cooling element within the cleaning reticle.
19. The apparatus of claim 18 , wherein the cleaning reticle comprises a battery electrically coupled to the electrical cooling element.