Liquid treatment apparatus and method of adjusting temperature of treatment liquid
A liquid treatment apparatus includes: a substrate holder for holding a substrate; a discharge nozzle for discharging a treatment liquid onto the substrate; a liquid supply pipe for supplying the treatment liquid from a treatment liquid storage source to the discharge nozzle; a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe; a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and an atmosphere gas supply part for supplying an atmosphere gas into the processing container. The gas pipe is provided so that an extension portion between an upstream end inside the processing container and an encompassing portion is folded back inside the processing container in a plan view.
1. A liquid treatment apparatus comprising:
a substrate holder configured to hold a substrate;
a discharge nozzle configured to discharge a treatment liquid onto the substrate held by the substrate holder;
a liquid supply pipe configured to supply the treatment liquid from a treatment liquid storage source to the discharge nozzle;
a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe;
a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and
an atmosphere gas supply part configured to supply an atmosphere gas into the processing container,
wherein an extension portion of the gas pipe is folded back inside the processing container in a plan view, the extension portion being a portion between an upstream end inside the processing container and an encompassing portion that encompasses the liquid supply pipe,
wherein the processing container has a joint that connects an introduction pipe and the gas pipe, the introduction pipe being configured to introduce the inert gas from an inert gas storage source into the processing container, and
wherein the joint is made of a metallic material having higher thermal conductivity than that of the gas pipe.
2. The liquid treatment apparatus of claim 1 , further comprising: a moving mechanism configured to move the discharge nozzle in a predetermined direction in the plan view.
3. The liquid treatment apparatus of claim 2 , wherein the extension portion of the gas pipe is folded back in a movement direction of the discharge nozzle by the moving mechanism.
4. The liquid treatment apparatus of claim 3 , wherein the extension portion of the gas pipe is folded back in a direction orthogonal to the movement direction of the discharge nozzle by the moving mechanism.
5. The liquid treatment apparatus of claim 4 , wherein the extension portion of the gas pipe extends around an interior of the processing container.
6. The liquid treatment apparatus of claim 5 , further comprising: a fixture configured to fix the gas pipe inside the processing container,
wherein the fixture is made of a metallic material having higher thermal conductivity than that of the gas pipe.
7. The liquid treatment apparatus of claim 6 , wherein an outer circumference of the gas pipe is formed in a bellows shape.
8. The liquid treatment apparatus of claim 7 , wherein the gas pipe has an outer diameter larger than that of the introduction pipe configured to introduce the inert gas from the inert gas storage source into the processing container.
9. The liquid treatment apparatus of claim 1 , further comprising: a fixture configured to fix the gas pipe inside the processing container,
wherein the fixture is made of a metallic material having higher thermal conductivity than that of the gas pipe.
10. The liquid treatment apparatus of claim 1 , wherein an outer circumference of the gas pipe is formed in a bellows shape.
11. The liquid treatment apparatus of claim 1 , wherein the gas pipe has an outer diameter larger than that of the introduction pipe configured to introduce the inert gas from the inert gas storage source into the processing container.
12. A method of adjusting a temperature of a treatment liquid in a liquid treatment apparatus, wherein the liquid treatment apparatus includes:
a substrate holder configured to hold a substrate;
a discharge nozzle configured to discharge the treatment liquid onto the substrate held by the substrate holder;
a liquid supply pipe configured to supply the treatment liquid from a treatment liquid storage source to the discharge nozzle;
a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe;
a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and
an atmosphere gas supply part configured to supply an atmosphere gas into the processing container,
wherein an extension portion of the gas pipe is folded back inside the processing container in a plan view, the extension portion being a portion between an upstream end inside the processing container and an encompassing portion that encompasses the liquid supply pipe,
wherein the processing container has a joint that connects an introduction pipe and the gas pipe, the introduction pipe being configured to introduce the inert gas from an inert gas storage source into the processing container, and
wherein the joint is made of a metallic material having higher thermal conductivity than that of the gas pipe,
the method comprising:
adjusting a temperature of the inert gas flowing through the gas pipe with the atmosphere gas from the atmosphere gas supply part; and
adjusting the temperature of the treatment liquid flowing through the liquid supply pipe with the inert gas having the adjusted temperature.