Binary metal liner layers
Described are microelectronic devices comprising a dielectric layer formed on a substrate, a feature comprising a gap defined in the dielectric layer, a barrier layer on the dielectric layer, a two metal liner film on the barrier layer and a gap fill metal on the two metal liner. Embodiments provide a method of forming a microelectronic device comprising the two metal liner film on the barrier layer.
1. A microelectronic device comprising:
a dielectric layer on a substrate, the dielectric layer comprising at least one feature defining a gap;
a barrier layer selected from the group consisting of TaN, doped TaN, MnN and doped MnN on the dielectric layer;
a two metal liner film on the barrier layer comprising alternating layers of a first liner film comprised of a first metal M1 on the barrier layer and a second liner film comprised of a second metal M2 on the first liner film, the first liner film and the second liner film separately formed from, the first liner film having a thickness in a range of from 1 Angstroms to 10 Angstroms and the second liner film on the first liner film, the second liner film having a thickness in a range of from 1 Angstroms to 10 Angstroms wherein the first metal M1 and the second metal M2 are selected from the group consisting of M1 is ruthenium (Ru) and M2 is cobalt (Co); M1 is cobalt (Co) and M2 is manganese (Mn); M1 is Co and M2 is tantalum (Ta); M1 is Co and M2 is tungsten (W); M1 is cobalt (Co) and M2 is molybdenum (Mo); M1 is ruthenium (Ru) and M2 is manganese (Mn); M1 is ruthenium (Ru) and M2 is tungsten (W); M1 is ruthenium (Ru) and M2 is molybdenum (Mo); M1 is tantalum (Ta) and M2 is manganese (Mn); and M1 is tantalum (Ta) and M2 is tungsten (W); and
a gap fill metal on the two metal liner film, wherein the two metal liner film provides interfacial adhesion between the barrier layer and the gap fill metal.
2. The microelectronic device of claim 1 , wherein the two metal liner film has a thickness in a range of from 5 Angstroms to 20 Angstroms.
3. The microelectronic device of claim 1 , wherein the two metal liner film has a thickness in a range of from 5 Angstroms to 15 Angstroms.
4. The microelectronic device of claim 1 , wherein the first liner film has a thickness in a range of from 1 Angstroms to 5 Angstroms.
5. The microelectronic device of claim 1 , wherein the first metal M1 comprises ruthenium and second metal M2 comprises cobalt.
6. A method for forming a microelectronic device, the method comprising:
forming a dielectric layer on a substrate, the dielectric layer comprising at least one feature defining a gap;
forming a barrier layer selected from the group consisting of TaN, doped TaN, MnN and doped MnN on the dielectric layer;
forming a two metal liner film on the barrier layer comprising separately forming alternating layers of a first liner film comprised of a first metal M1 on the barrier layer and a second liner film comprised of a second metal M2 on the first liner film the first liner film having a thickness in a range of from 1 Angstroms to 10 Angstroms and comprised of a first metal M1 and a second liner film on the first liner film, the second liner film having a thickness in a range of from 1 Angstroms to 10 Angstroms and comprised of a second metal M2, wherein the first metal M1 and the second metal M2 are selected from the group consisting of M1 is ruthenium (Ru) and M2 is cobalt (Co); M1 is cobalt (Co) and M2 is manganese (Mn); M1 is Co and M2 is tantalum (Ta); M1 is Co and M2 is tungsten (W); M1 is cobalt (Co) and M2 is molybdenum (Mo); M1 is ruthenium (Ru) and M2 is manganese (Mn); M1 is ruthenium (Ru) and M2 is tungsten (W); M1 is ruthenium (Ru) and M2 is molybdenum (Mo); M1 is tantalum (Ta) and M2 is manganese (Mn); and M1 is tantalum (Ta) and M2 is tungsten (W); and
forming a gap fill metal on the two metal liner film, wherein the two metal liner film provides interfacial adhesion between the barrier layer and the gap fill metal.
7. The method of claim 6 , wherein the two metal liner film has a thickness in a range of from 5 Angstroms to 20 Angstroms.
8. The method of claim 6 , wherein the two metal liner film has a thickness in a range of from 5 Angstroms to 15 Angstroms.
9. The method of claim 6 , wherein the first liner film has a thickness in a range of from 1 Angstroms to 5 Angstroms.
10. The method of claim 6 , wherein the first metal M1 comprises ruthenium and second metal M2 comprises cobalt.
11. A microelectronic device comprising:
a dielectric layer on a substrate, the dielectric layer comprising at least one feature defining a gap;
a barrier layer selected from the group consisting of TaN, doped TaN, MnN and doped MnN on the dielectric layer;
a single layer liner film having a thickness in a range of from 10 Angstroms to 20 Angstroms and comprising an alloy of two metals on the barrier layer, the two metals consisting of a first metal M1 and a second metal M2 selected from the group consisting of M1 is ruthenium (Ru) and M2 is cobalt (Co); M1 is ruthenium (Ru) and M2 is tungsten (W); and M1 is ruthenium (Ru) and M2 is molybdenum (Mo); and
a gap fill metal on the single layer liner film, wherein the single layer liner film provides interfacial adhesion between the barrier layer and the gap fill metal.
12. The microelectronic device of claim 11 , wherein the single layer liner film has a thickness in a range of from 10 Angstroms to 19 Angstroms.
13. The microelectronic device of claim 11 , wherein the single layer liner film has a thickness in a range of from 10 Angstroms to 15 Angstroms.
14. A method for forming a microelectronic device, the method comprising:
forming a dielectric layer on a substrate, the dielectric layer comprising at least one feature defining a gap;
forming a barrier layer selected from the group consisting of TaN, doped TaN, MnN and doped MnN on the dielectric layer;
forming a single layer liner film having a thickness in a range of from 10 Angstroms to 20 Angstroms and comprising an alloy of two metals on the barrier layer, the two metals consisting of a first metal M1 and a second metal M2 selected from the group consisting of M1 is ruthenium (Ru) and M2 is cobalt (Co); M1 is ruthenium (Ru) and M2 is tungsten (W); and M1 is ruthenium (Ru) and M2 is molybdenum (Mo); and
forming a gap fill metal on the single layer liner film, wherein the single layer liner film provides interfacial adhesion between the barrier layer and the gap fill metal.
15. The method of claim 14 , wherein the single layer liner film has a thickness in a range of from 10 Angstroms to 19 Angstroms.
16. The method of claim 14 , wherein the single layer liner film has a thickness in a range of from 10 Angstroms to 15 Angstroms.