Solid vaporization/supply system of metal halide for thin film deposition
Provided is a solid vaporization/supply system of metal halide for thin film deposition that reduces particle contamination. The system includes a vaporizable source material container for storing and vaporizing a metal halide and buffer tank coupled with the vaporizable source material container. The vaporizable source material container includes a container main body with a container wall; a lid body; fastening members; and joint members, wherein the container wall is configured to have a double-wall structure composed of an inner wall member and outer wall member, which allows a carrier gas to be led into the container main body via its space. The container wall is fabricated of 99 to 99.9999% copper, 99 to 99.9996% aluminum, or 99 to 99.9996% titanium, and wherein the container main body, the lid body, the fastening members, and the joint members are treated by fluorocarbon polymer coating and/or by electrolytic polishing.
1. A solid vaporization/supply system of metal halide for thin film deposition comprising a vaporizable source material container for storing and vaporizing a metal halide for thin film deposition to be used as a vaporizable source material, and comprising a buffer tank coupled with the vaporizable source material container,
the vaporizable source material container comprising:
a container main body including a container wall which has a double-wall structure composed of an inner wall and an outer wall;
a lid body detachably fixed to the container main body, and provided with a carrier gas inlet for introducing a carrier gas into the container main body and a mixed gas outlet for leading a mixed gas of the vaporized metal halide for thin film deposition with the carrier gas to the outside;
a bolt and nut for fixing the container main body with the lid body;
an internal inlet provided at a bottom surface portion of the inner wall constituting the container wall;
a joint arranged at the carrier gas inlet and the mixed gas outlet of the lid body; and
at least one plate-shaped shelf, being fabricated of a porous material, suspended from the container main body,
wherein the carrier gas introduced from the carrier gas inlet passes through a space between the inner wall and outer wall of the double-wall structure, enters the container main body only through the internal inlet at the bottom surface portion of the inner wall, and gets in contact with the metal halide for thin film deposition placed on the at least one plate-shaped shelf, and then a mixed gas of the vaporized metal halide for thin film deposition and the carrier gas is led to the outside through the mixed gas outlet,
wherein the at least one plate-shaped shelf has a shower head structure provided with a plurality of through holes formed therein,
wherein the container wall of the container main body is fabricated of copper with 99 to 99.9999% purity, aluminum with 99 to 99.9999% purity, or titanium with 99 to 99.9999% purity, and
wherein the container main body, the lid body, the bolt and nut, and the joint are each treated by fluorocarbon polymer coating and/or by electrolytic polishing on its surface.
2. The solid vaporization/supply system according to claim 1 ,
further comprising a valve arranged at a portion of a gas flow path coupling the vaporizable source material container with the buffer tank,
the valve being a vacuum valve having a CV value (in terms of water) of 0.2 or more.
3. The solid vaporization/supply system according to claim 1 ,
further comprising one or more members having a spherical, spheroidal, leaf-like or spiral shape or another irregular shape, being made of aluminum or copper and having a maximum length of 1 to 30 mm in one direction in the container main body.
4. The solid vaporization/supply system according to claim 1 , wherein the metal halide for thin film deposition to be used as the vaporizable source material is a compound represented by a general formula (1) described below:
MXn General formula (1):
in the general formula (1), M represents any element among Al, Hf, Zr, Ta, W, Ga, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Er, Tm, Yb and Co; X represents a halogen atom; n is the number of X atoms.
5. The solid vaporization/supply system according to claim 1 to be used for thin film deposition by a chemical vapor deposition method.
6. The solid vaporization/supply system according to claim 1 to be used for thin film deposition by an atomic layer deposition method.
7. The solid vaporization/supply system according to claim 1 further comprising a carrier gas source that supplies a carrier gas to the container main body of the vaporizable source material container.