System on integrated chips and methods of forming same
An embodiment method for forming a semiconductor package includes attaching a first die to a first carrier, depositing a first isolation material around the first die, and after depositing the first isolation material, bonding a second die to the first die. Bonding the second die to the first die includes forming a dielectric-to-dielectric bond. The method further includes removing the first carrier and forming fan-out redistribution layers (RDLs) on an opposing side of the first die as the second die. The fan-out RDLs are electrically connected to the first die and the second die.
1. A package comprising:
a first semiconductor die, the first semiconductor die comprising a first insulating layer;
a first isolation material surrounding the first semiconductor die;
a second semiconductor die over and directly bonded to the first semiconductor die, the second semiconductor die comprising a second insulating layer directly contacting the first insulating layer and the first isolation material; and
redistribution layers over the second semiconductor die, the redistribution layers are electrically connected to the first semiconductor die and the second semiconductor die.
2. The package of claim 1 further comprising a third semiconductor die surrounded by the first isolation material, the third semiconductor die comprising a third insulating layer directly contacting the second insulating layer.
3. The package of claim 1 further comprising a second isolation material surrounding the second semiconductor die, wherein the second isolation material directly contacts the first isolation material.
4. The package of claim 1 , wherein a third insulating layer of the redistribution layers contacts a semiconductor substrate of the second semiconductor die, and wherein top surfaces of the second isolation material and the semiconductor substrate are level.
5. The package of claim 1 further comprises a dummy die free of devices, the dummy die being disposed in the first isolation material.
6. The package of claim 1 , wherein the first isolation material directly contacts the second insulating layer.
7. The package of claim 1 , wherein the redistribution layers are electrically connected to the first semiconductor die by a conductive via, the conductive via extends along a sidewall of the second semiconductor die.
8. The package of claim 7 , wherein the conductive via extends through the first insulating layer of the first semiconductor die.
9. The package of claim 7 , wherein the conductive via extends to a contact pad at a top surface of the first semiconductor die.
10. The package of claim 1 , wherein the first semiconductor die further comprises first contact pads in the first insulating layer, wherein the second semiconductor die further comprises second contact pads in the second insulating layer, and wherein the second contact pads directly contact the first contact pads.
11. A package comprising:
a first semiconductor die;
a first isolation material surrounding the first semiconductor die
a second semiconductor die directly bonded to the first semiconductor die with a dielectric-to-dielectric bond;
a second isolation material surrounding the second semiconductor die;
a redistribution structure over the first semiconductor die and the second semiconductor die; and
a conductive via electrically connecting the redistribution structure to the first semiconductor die, wherein the conductive via is separated from the second semiconductor die by the second isolation material.
12. The package of claim 11 , wherein the second semiconductor die is further directly bonded to the first semiconductor die with a metal-to-metal bond.
13. The package of claim 11 further comprising a third semiconductor die laterally separated from the first semiconductor die by the first isolation material, wherein the third semiconductor die is directly bonded to the second semiconductor die with a dielectric-to-dielectric bond.
14. The package of claim 13 further comprising a second conductive via electrically connecting the redistribution structure to the third semiconductor die, the second conductive via extends through the second isolation material.
15. The package of claim 11 further comprising a dummy die surrounded by the first isolation material.
16. The package of claim 15 , wherein the first isolation material separates the dummy die from the second semiconductor die.
17. The package of claim 15 , wherein the dummy die is bonded to the second semiconductor die by a dielectric-to-dielectric bond.
18. A method of forming semiconductor package comprising:
directly bonding a first semiconductor die to a second semiconductor die, without solder;
surrounding the first semiconductor die with an isolation material;
patterning an opening in the isolation material, wherein the opening exposes a conductive feature of the second semiconductor die;
forming a first conductive via in the opening; and
forming a redistribution structure over the first semiconductor die and the second semiconductor die, wherein the first conductive via electrically connects the redistribution structure to the conductive feature in second semiconductor die.
19. The method of claim 18 further comprising prior to directly bonding the first semiconductor die to the second semiconductor die, surrounding the second semiconductor die with a second isolation material.
20. The method of claim 18 , wherein patterning the opening further comprises etching a dielectric layer of the second semiconductor die to expose the conductive feature.