Substrate cleaning device and substrate cleaning method
Providing a substrate cleaning device and a substrate cleaning method having high detergency. Provided is a substrate cleaning device including: a substrate rotating mechanism that rotates a substrate; and a first nozzle and a second nozzle that eject an ultrasonic cleaning solution toward a predetermined surface of the substrate that is rotated, wherein the first nozzle and the second nozzle are held in one casing.
1. A substrate cleaning device comprising:
a substrate rotating mechanism that rotates a substrate; and
a first nozzle and a second nozzle that eject an ultrasonic cleaning solution toward a predetermined surface of the substrate that is rotated, wherein
the first nozzle and the second nozzle are held in one casing, and
wherein the one casing is supported at a side of the substrate such that the first nozzle and/or the second nozzle ejects an ultrasonic cleaning solution on a bevel of the substrate that is rotated in a tangential direction of the substrate;
wherein the one casing is arranged at the side of the substrate such that
an ejection angle of the ultrasonic cleaning solution on the substrate from the first nozzle and the second nozzle is adjustable,
a first distance between the substrate and the first nozzle, and a second distance between the substrate and the second nozzle are adjustable.
2. The substrate cleaning device according to claim 1 , wherein an ultrasonic cleaning solution from the first nozzle and an ultrasonic cleaning solution from the second nozzle
reach the predetermined surface after being mixed with each other, or
are mixed with each other after reaching the predetermined surface.
3. The substrate cleaning device according to claim 1 , wherein the first nozzle and the second nozzle are attached to a tip end of an arm that turns about a turning shaft and eject an ultrasonic cleaning solution on a first surface of the substrate.
4. The substrate cleaning device according to claim 1 , wherein
the first nozzle ejects an ultrasonic cleaning solution on a first surface of the substrate that is rotated, and
the second nozzle ejects an ultrasonic cleaning solution on a second surface opposite to the first surface of the substrate that is rotated.
5. The substrate cleaning device according to claim 1 , wherein the first nozzle and/or the second nozzle ejects an ultrasonic cleaning solution on an edge portion of the substrate that is rotated.
6. The substrate cleaning device according to claim 5 , wherein the first nozzle and/or the second nozzle that ejects an ultrasonic cleaning solution on the edge portion ejects the ultrasonic cleaning solution such that the ultrasonic cleaning solution lands on the edge portion of the substrate that is rotated without hitting a bevel of the substrate and then moves toward a center from the edge portion.
7. The substrate cleaning device according to claim 5 , wherein the first nozzle and/or the second nozzle that ejects an ultrasonic cleaning solution on the edge portion ejects the ultrasonic cleaning solution such that the ultrasonic cleaning solution lands on a center side of the edge portion of the substrate that is rotated and then moves toward the edge portion.
8. The substrate cleaning device according to claim 1 , wherein the first nozzle and the second nozzle eject an ultrasonic cleaning solution to an edge portion of the substrate while swinging in a vicinity of the substrate rotating mechanism.