Semiconductor structure and method for manufacturing a plurality thereof

1. A semiconductor structure, comprising:

a first hybrid bonding structure, having a first surface and a second surface;

a memory structure in contact with the first surface; and

a control circuit structure, configured to control the memory structure, and in contact with the second surface,

wherein the second surface is closer to a back-end-of-line (BEOL) of the control circuit structure and further from a front-end-of-line (FEOL) of the control circuit structure.

2. A semiconductor structure, comprising:

a first hybrid bonding structure, having a first surface and a second surface;

a memory structure in contact with the first surface; and

a control circuit structure, configured to control the memory structure, and in contact with the second surface,

wherein the second surface is closer to a FEOL of the control circuit structure and further from a BEOL of the control circuit structure.

3. A semiconductor structure, comprising:

a first hybrid bonding structure, having a first surface and a second surface;

a memory structure in contact with the first surface; and

a control circuit structure, configured to control the memory structure, and in contact with the second surface,

wherein the memory structure comprises a plurality of memory dies vertically stacked, and at least two of the memory dies are hybrid bonded by a second hybrid bonding structure.

4. The semiconductor structure of claim 3 , wherein a thickness of a top memory die of the memory dies is greater than a thickness of at least one memory die disposed between the top memory die and the control circuit structure.

5. The semiconductor structure of claim 3 , wherein the memory structure further comprises a first through via, wherein an end of the first through via in contact with the first surface of the first hybrid bonding structure is aligned with a top metal of a metallization structure of the memory structure.

6. A semiconductor structure, comprising:

a first hybrid bonding structure, having a first surface and a second surface;

a memory structure in contact with the first surface; and

a control circuit structure, configured to control the memory structure, and in contact with the second surface,

wherein the memory structure and the control circuit structure are vertically bonded by the first hybrid bonding structure, the memory structure having a first lateral surface, the first hybrid bonding structure having a second lateral surface, and the control circuit structure having a third lateral surface, and the first lateral surface, the second lateral surface, and the third lateral surface substantially forming a continuous line from a cross sectional perspective.

7. The semiconductor structure of claim 6 , wherein the memory structure further comprises a first through via and the control circuit structure further comprises a second through via, and the first hybrid bonding structure comprises:

a first hybrid bonding portion, having a plurality of first conductive vias and a first bond pad, wherein the first through via is coupled to a plurality of first ends of the first conductive vias, and the first bond pad is in contact with a plurality of second ends of the first conductive vias; and

a second hybrid bonding portion, having a plurality of second conductive vias and a second bond pad, wherein the second bond pad is in contact with the first bond pad, the second through via being coupled to a plurality of first ends of the second conductive vias, and the second bond pad is in contact with a plurality of second ends of the second conductive vias.

8. The semiconductor structure of claim 7 , wherein the first hybrid bonding portion further comprises a third bond pad, and the second hybrid bonding portion further comprises a fourth bond pad in contact with the third bond pad,

wherein the third bond pad and the fourth bond pad are electrically disconnected from the memory structure and the control circuit structure.

9. The semiconductor structure of claim 7 , wherein the second through via is a half-through via contacting a back-end-of-line metal line at one end of the second through via.

10. A system in package (SiP) structure, comprising:

a first semiconductor structure having a first critical dimension;

a second semiconductor structure stacked with the first semiconductor structure, having a second critical dimension and in contact with the first semiconductor structure through a hybrid bonding interface;

a substrate, electrically connected to the first semiconductor structure and the second semiconductor structure through a first conductive bump connection, wherein the first critical dimension is different from the second critical dimension;

a third semiconductor structure electrically connected to the first semiconductor structure and the second semiconductor structure through a second conductive bump connection, wherein the third semiconductor structure has a third critical dimension smaller than the first critical dimension; and

an interposer supporting the first, the second, and the third semiconductor structure and connected to the substrate.

11. The SiP structure of claim 10 , further comprising a first bond pad at the hybrid bonding interface in contact with a second bond pad at the hybrid bonding interface, wherein the first bond pad is electrically connected to a first through silicon via (TSV) of the first semiconductor structure, and the second bond pad is electrically connected to a second TSV of the second semiconductor structure.

12. A system in package (SiP) structure, comprising:

a first semiconductor structure having a first critical dimension;

a second semiconductor structure stacked with the first semiconductor structure, having a second critical dimension and in contact with the first semiconductor structure through a hybrid bonding interface; and

a substrate, electrically connected to the first semiconductor structure and the second semiconductor structure through a first conductive bump connection,

wherein the first critical dimension is smaller than the second critical dimension.

13. The SiP structure of claim 12 , wherein the first semiconductor structure and the second semiconductor structure are a memory structure and a control circuit structure, respectively, and the first conductive bump connection is in contact with the second semiconductor structure.

14. A semiconductor structure, comprising:

a control circuit structure;

a memory structure having a plurality of memory dies vertically stacked over the control circuit structure;

a first hybrid bonding structure sandwiched by the control circuit structure and the memory structure; and

a plurality of second hybrid bonding structures, each of the second hybrid bonding structures is sandwiched by two of the adjacent memory dies.

15. The semiconductor structure of claim 14 , wherein a plurality of lateral surfaces of the plurality of memory dies and a plurality of lateral surfaces of the plurality of second hybrid bonding structures substantially forming a continuous line from a cross sectional perspective.

16. The semiconductor structure of claim 14 , wherein each of the memory dies comprises a through via penetrating the memory die.

17. The semiconductor structure of claim 14 , wherein each of the second hybrid bonding structures is in contact with a BEOL structure of the memory die disposed thereon.

18. A semiconductor structure, comprising:

a control circuit structure;

a memory structure having a plurality of memory dies vertically stacked over the control circuit structure; and

a first hybrid bonding structure sandwiched by the control circuit structure and the memory structure,

wherein a back-end-of-line (BEOL) structure of the control circuit structure and a BEOL structure of the memory die are both facing the first hybrid bonding structure.

19. A semiconductor structure, comprising:

a control circuit structure;

a memory structure having a plurality of memory dies vertically stacked over the control circuit structure; and

a first hybrid bonding structure sandwiched by the control circuit structure and the memory structure,

wherein a back-end-of-line (BEOL) structure of the control circuit structure faces away from the first hybrid bonding structure, and a BEOL structure of the memory die faces toward the first hybrid bonding structure.

20. A semiconductor structure, comprising:

a control circuit structure;

a memory structure having a plurality of memory dies vertically stacked over the control circuit structure; and

a first hybrid bonding structure sandwiched by the control circuit structure and the memory structure,

wherein each of the memory dies comprises a half-through via which is coupled to a BEOL structure of the memory die at one end of the half-through via.