IP Library › Granted Patent US 11,682,644
Granted Patent B2
US 11,682,644 · App. 17/361,950 · Granted Jun 20, 2023

Semiconductor device with a heterogeneous solder joint and method for fabricating the same

Inventors: Swee Kah Lee (Melaka, MY); Sook Woon Chan (Melaka, MY); Fong Mei Lum (Melaka, MY); Joachim Mahler (Regensburg, DE); Muhammad Muhammat Sanusi (Sungai Petani, MY)
Assignee: Infineon Technologies AG
H01L24/13H01L24/11H01L24/81H01L2224/11822H01L2224/1357H01L2224/1362H01L2224/13082H01L2224/13111H01L2224/13611H01L2224/13613H01L2224/13618H01L2224/13638H01L2224/13639H01L2224/13647H01L2224/13655H01L2224/13657H01L2224/13664H01L2224/81801
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Quick Facts
Patent No.
US 11,682,644
App. No.
17/361,950
Granted
Jun 20, 2023
Kind
B2
Abstract

A method for fabricating a semiconductor device with a heterogeneous solder joint includes: providing a semiconductor die; providing a coupled element; and soldering the semiconductor die to the coupled element with a first solder joint. The first solder joint includes: a solder material including a first metal composition; and a coating including a second metal composition, different from the first metal composition, the coating at least partially covering the solder material. The second metal composition has a greater stiffness and/or a higher melting point than the first metal composition.

Claims (38)

1. A method for fabricating a semiconductor device with a heterogeneous solder joint, the method comprising:

providing a semiconductor die;

providing a coupled element; and

soldering the semiconductor die to the coupled element with a final first solder joint, the final first solder joint comprising:

a solder material comprising a first metal composition; and

a coating comprising a second metal composition, different from the first metal composition, the coating at least partially covering the solder material,

wherein the second metal composition has a greater stiffness and/or a higher melting point than the first metal composition.

2. The method of claim 1 , wherein the solder material is covered with a coating precursor prior to soldering the semiconductor die to the coupled element, and wherein soldering the semiconductor die to the coupled element further comprises converting the coating precursor into the coating.

3. The method of claim 2 , further comprising:

depositing the solder material on the semiconductor die or on the coupled element; and

afterwards covering the deposited solder material with the coating precursor.

4. The method of claim 3 , wherein soldering the semiconductor die to the coupled element comprises heating the deposited solder material to melt the deposited solder material, and wherein the act of heating the deposited solder material forms the coating of the second metal composition from the coating precursor.

5. The method of claim 4 , wherein the act of heating the deposited solder material forms the coating by reducing a metal present in the coating precursor to form the second metal composition.

6. The method of claim 2 , wherein the coating precursor is a solder flux containing a metal dopant.

7. The method of claim 2 , wherein the solder material is dipped into a bath with ionic liquid to form the coating precursor.

8. The method of claim 7 , wherein an inorganic metal salt is dissolved in the ionic liquid, and wherein a metal constituent of the inorganic metal salt is used to form the coating.

9. The method of claim 8 , wherein the inorganic metal salt comprises one or more of copper ammonium carbonate, cobalt ammonium carbonate, nickel ammonium carbonate, antimony acetate, bismuth acetate, and zinc acetate.

10. The method of claim 7 , wherein the ionic liquid comprises an alkylimidazolium carboxylate or an alkylammonium carboxylate.

11. The method of claim 7 , wherein the ionic liquid comprises chloride or fluoride anions.

12. The method of claim 2 , wherein the coating precursor is formed at a temperature that is lower than a liquidus temperature of the solder material.

13. The method of claim 1 , wherein the coating is formed around the solder material such that the coating prevents spilling of the solder material out of the solder joint.

14. The method of claim 1 wherein soldering the semiconductor die to the coupled element comprises using a forming gas.

15. A method for fabricating a semiconductor device with a heterogeneous solder joint, the method comprising:

providing a semiconductor die;

providing a coupled element; and

soldering the semiconductor die to the coupled element with a final first solder joint, the final first solder joint comprising:

a solder material comprising a first metal composition; and

a coating comprising a second metal composition, different from the first metal composition, the coating completely covering at least one lateral side of the solder material,

wherein the second metal composition has a greater stiffness and/or a higher melting point than the first metal composition.

16. A method for fabricating a semiconductor device with a heterogeneous solder joint, the method comprising:

providing a semiconductor die;

providing a coupled element; and

soldering the semiconductor die to the coupled element with a final first solder joint, the final first solder joint comprising:

a solder material comprising a first metal composition; and

a coating comprising a second metal composition, different from the first metal composition, the coating at least partially covering the solder material,

wherein the second metal composition has a greater stiffness and/or a higher melting point than the first metal composition,

wherein the solder material is covered with a coating precursor prior to soldering the semiconductor die to the coupled element,

wherein soldering the semiconductor die to the coupled element further comprises converting the coating precursor into the coating.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE THE LAST NAME OF THE 3RD INVENTOR PREVIOUSLY RECORDED AT REEL: 057059 FRAME: 0025. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Sep 15, 2021
From: LUM, FONG MEI; MAHLER, JOACHIM; MUHAMMAT SANUSI, MUHAMMAD; CHAN, SOOK WOON; LEE, SWEE KAH
To: INFINEON TECHNOLOGIES AG
Reel/Frame 057538/0205 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 2, 2021
From: LUM, FONG MEI; MAHLER, JOACHIM; SANUSI, MUHAMMAD MUHAMMAT; CHAN, SOOK WOON; LEE, SWEE KAH
To: INFINEON TECHNOLOGIES AG
Reel/Frame 057059/0025 →
Priority Claims (1)
DE 10202117678.3 · Jul 3, 2020 · national
Continuity (1)
Related Publication 20220005778A1 · Jan 6, 2022