Signal isolator having at least one isolation island
Methods and apparatus for a signal isolator having reduced parasitics. An example embodiment, a signal isolator and include a first metal region electrically connected to a first die portion, a second die portion isolated from the first die portion, and a second metal region electrically connected to the second die portion. A third metal region can be electrically isolated from the first and second metal regions and a third die portion can be electrically isolated from the first, second and third metal regions. In embodiments, the first metal region, the second metal region, and the third metal region provide a first isolated signal path from the first die portion to the second die portion.
1. A method for providing a signal isolator, comprising:
electrically connecting a first die portion to a first metal region;
isolating a second die portion from the first die portion;
electrically connection a second metal region to the second die portion;
electrically isolating a third metal region from the first and second metal regions;
electrically isolating a third die portion from the first, second and third metal regions,
wherein the first metal region, the second metal region, and the third metal region provide a first isolated signal path from the first die portion to the second die portion; and
wherein the first metal region, the second metal region and the third die portion provide a second isolated signal path from the first die portion to the second die portion in parallel with the first isolated signal path.
2. The method according to claim 1 , wherein the first die portion, the second die portion and the third die portion are formed in a first layer, wherein the third die portion is electrically isolated from the first and second die portions.
3. The method according to claim 2 , wherein the first layer comprises an epitaxial layer.
4. The method according to claim 1 , wherein the third die portion is separated from the first die portion and the second die portion by respective isolating trenches.
5. The method according to claim 1 , further including employing a layer of poly-silicon deposited on a top of the third die portion.
6. The method according to claim 1 , wherein the first and second metal regions are formed in a first metal layer.
7. The method according to claim 6 , wherein a third metal region is formed in a second metal layer.
8. The method according to claim 1 , wherein the first isolated signal path comprises a first capacitor capacitively coupled with a second capacitor, wherein the first capacitor comprises the first metal region and the third metal region, and the second capacitor comprises the third metal region and the second metal region.
9. The method according to claim 8 , wherein second isolated signal path includes a third capacitor capacitively coupled to a fourth capacitor, wherein the third capacitor comprises the first metal region and the third die portion, and the fourth capacitor comprises the third die portion and the second metal region.
10. The method according to claim 1 , wherein the third metal region overlaps with the first and second metal regions.
11. The method according to claim 1 , wherein the first isolated signal path comprises a differential signal pair.
12. A method, comprising:
electrically connecting a first metal region to a first die portion of a signal isolator;
isolating a second die portion from the first die portion;
electrically connecting a second metal region to the second die portion;
electrically isolating a third metal region from the first and second metal regions;
electrically isolating a third die portion from the first, second and third metal regions; and
electrically isolating a fourth die portion from the first, second and third metal regions, wherein the fourth die portion is isolated from the third die portion,
wherein the first metal region, the second metal region, and the third metal region provide an isolated signal path from the first die portion to the second die portion,
wherein the first die portion, the second die portion, the third die portion, and the fourth die portion are formed in a first layer, wherein the third die portion is electrically isolated from the fourth die portion, and
wherein the first layer comprises an epitaxial layer.
13. The method according to claim 12 , wherein the third die portion is separated from the fourth die portion by respective isolating trenches.
14. The method according to claim 12 , wherein the first and second metal regions are formed in a first metal layer.
15. The method according to claim 14 , wherein a third metal region is formed in a second metal layer.
16. The method according to claim 12 , wherein the isolated signal path comprises a first capacitor capacitively coupled with a second capacitor, wherein the first capacitor comprises the first metal region and the third metal region, and the second capacitor comprises the third metal region and the second metal region.
17. The method according to claim 12 , wherein the third metal region overlaps with the first and second metal regions.
18. The method according to claim 12 , wherein the isolated signal path comprises a differential signal pair.
19. A method, comprising:
electrically connecting a first metal region to a first die portion of a signal isolator;
isolating a second die portion from the first die portion;
electrically connecting a second metal region to the second die portion;
electrically isolating a third metal region from the first and second metal regions;
electrically isolating a third die portion from the first, second and third metal regions,
wherein the first metal region, the second metal region, and the third metal region provide a first isolated signal path from the first die portion to the second die portion, wherein the first isolated signal path does not include the third die portion; and
wherein the first metal region, the second metal region and the third die portion provide a second isolated signal path from the first die portion to the second die portion in parallel with the first isolated signal path.
20. A method, comprising:
electrically connecting a first metal region to a first die portion of a signal isolator;
isolating a second die portion from the first die portion;
electrically connecting a second metal region to the second die portion;
electrically isolating a third metal region from the first and second metal regions;
electrically isolating a third die portion from the first, second and third metal regions,
wherein the first metal region, the second metal region, and the third metal region provide a first isolated signal path from the first die portion to the second die portion; and
wherein the first metal region, the second metal region and the third die portion provide a second isolated signal path from the first die portion to the second die portion in parallel with the first isolated signal path, wherein the first, second, and third metal regions are on the same side of the third die portion.