Process apparatus including a non-contact thermo-sensor
A process apparatus includes a heating module and a supporter disposed below the heating module. A process space is provided between the heating module and the supporter. The heating module includes a housing, at least one heating lamp disposed in the housing, at least one temperature sensor disposed in the housing, and a blocking plate disposed under the housing. The blocking plate spatially separates the at least one heating lamp from the process space, and the blocking plate includes at least one window spatially connecting the at least one temperature sensor to the process space.
1. A method of manufacturing a semiconductor device, the method comprising:
loading a workpiece onto a supporter disposed at a lower portion of a chamber;
irradiating a first light of a first range of wavelength onto the workpiece by using a plurality of heating lamps of a heating module disposed at an upper portion of the chamber to heat the workpiece; and
receiving a second light of a second range of wavelength irradiated from the workpiece by using at least one temperature sensor of the heating module;
measuring, by an additional temperature sensor, a temperature of one from among a blocking plate, the workpiece, and the supporter, wherein the additional temperature sensor is in contact with the one from among the blocking plate, the workpiece, and the supporter;
receiving first temperature information from the at least one temperature sensor and second temperature information from the additional temperature sensor to provide a heat command to the plurality of heating lamps; and
estimating a temperature of the workpiece by comparing the first temperature information with the second temperature information,
wherein the first light irradiated from each of the plurality of heating lamps onto the workpiece passes through the blocking plate, and
wherein the second light irradiated from the workpiece and received by the at least one temperature sensor is transferred to the at least one temperature sensor without passing through the blocking plate.
2. The method of claim 1 , wherein a temperature sensor of the at least one temperature sensor comprises a light path, a filter in the light path, and a thermo-sensor in the light path.
3. The method of claim 2 , wherein the filter is configured to block light having a wavelength of less than 5 μm.
4. The method of claim 2 , wherein the filter comprises germanium (Ge).
5. The method of claim 2 , wherein
the temperature sensor further comprises a blocking block spatially separating a process space from the filter, the process space provided between the heating module and the supporter, and
the blocking block comprises a material differing from a material of the blocking plate.
6. The method of claim 5 , wherein the blocking block transmits light having a wavelength of 5 μm or more.
7. The method of claim 5 , wherein the blocking block comprises zinc selenide (ZnSe).
8. The method of claim 1 , wherein the plurality of heating lamps and the at least one temperature sensor are disposed to be vertical to a top surface of the supporter.
9. The method of claim 1 , wherein the blocking plate comprises quartz.
10. The method of claim 1 , wherein the supporter comprises a supporting plate, and a heater and a cooler each embedded into the supporting plate.
11. The method of claim 1 , wherein a power of each of the plurality of heating lamps is independently adjusted.
12. The method of claim 1 , wherein,
in a top view, the heating module is divided into a plurality of areas, and
powers of the plurality of heating lamps respectively disposed in the divided plurality of areas are simultaneously adjusted in common.
13. The method of claim 12 , wherein the at least one temperature sensor is a plurality of temperature sensors, and the plurality of temperature sensors are selectively disposed in some of the plurality of areas.
14. The method of claim 1 , wherein
the heating module comprises a light path, a filter in the light path, and a thermo-sensor in the light path, and
the filter is configured to transmit light having a wavelength of 5 μm or more.
15. The method of claim 1 , wherein the measuring comprises measuring, by the additional temperature sensor, the temperature of the blocking plate, wherein the additional temperature sensor is in contact with the blocking plate.
16. The method of claim 1 , wherein the measuring comprises measuring, by the additional temperature sensor, the temperature of the workpiece, wherein the additional temperature sensor is in contact with the workpiece.
17. The method of claim 1 , wherein the measuring comprises measuring, by the additional temperature sensor, the temperature of the supporter, wherein the additional temperature sensor is in contact with the supporter.