Methods of manufacturing dynamic random access memory
A method of manufacturing a dynamic random access memory including the following steps is provided. A bit line is formed on a substrate. A sidewall structure is formed on a sidewall of the bit line. The sidewall structure includes a first insulation layer, a second insulation layer, and a shield conductor layer. The first insulation layer is disposed on the sidewall of the bit line. The second insulation layer is disposed on the first insulation layer. The shield conductor layer is disposed between the first insulation layer and the second insulation layer. An interconnection structure electrically connected to the shield conductor layer is formed.
1. A method of manufacturing a dynamic random access memory, comprising:
forming a bit line on a substrate;
forming a sidewall structure on a sidewall of the bit line, wherein the sidewall structure comprises:
a first insulation layer, disposed on the sidewall of the bit line;
a second insulation layer, disposed on the first insulation layer; and
a shield conductor layer, disposed between the first insulation layer and the second insulation layer; and
forming an interconnection structure electrically connected to the shield conductor layer, wherein
the interconnection structure includes a contact located on the shield conductor layer,
first top surfaces of portions of the shield conductor layer directly below the contact are lower than second top surfaces of other portions of the shield conductor layer not directly below the contact, and
the portions of the shield conductor layer directly below the contact are located on two sides of the bit line.
2. The method of manufacturing the dynamic random access memory according to claim 1 , wherein a method of forming the sidewall structure comprises:
conformally forming a first insulation material layer and a shield conductor material layer on the bit line in sequence;
performing an etch back process on the shield conductor material layer and the first insulation material layer to form the shield conductor layer and the first insulation layer respectively;
conformally forming a second insulation material layer covering the shield conductor layer and the first insulation layer on the bit line; and
removing a portion of the second insulation material layer to form the second insulation layer.
3. The method of manufacturing the dynamic random access memory according to claim 1 , wherein a method of forming the interconnection structure comprises performing a metal interconnection process at an end position of the bit line.
4. The method of manufacturing the dynamic random access memory according to claim 1 , further comprising forming isolation structures in the substrate to define active regions.
5. The method of manufacturing the dynamic random access memory according to claim 1 , further comprising forming a word line, wherein the word line and the bit line are intersected with and electrically insulated from each other.
6. The method of manufacturing the dynamic random access memory according to claim 5 , further comprising forming a first doped region and a second doped region in the substrate at one side and another side of the word line respectively, wherein the bit line is electrically connected to the first doped region.
7. The method of manufacturing the dynamic random access memory according to claim 6 , further comprising forming a capacitor structure electrically connected to the second doped region.