Film formation method and film formation device
A film formation method includes: providing a substrate including a first region in which a first material is exposed and a second region in which a second material different from the first material is exposed; forming an intermediate film selectively in the second region from the first region and the second region by supplying a processing gas to the substrate; forming a self-assembled monolayer in the first region and the second region after forming the intermediate film; removing the intermediate film and the self-assembled monolayer from the second region by heating the substrate to sublimate the intermediate film; and forming, after sublimation of the intermediate film, a target film selectively in the second region from the first region and the second region in a state in which the self-assembled monolayer is left in the first region.
1. A film formation method comprising:
providing a substrate including a first region in which a first material, which is a conductive material including a metal, or an oxide formed through a surface oxidation of the conductive material, is exposed and a second region in which a second material, which is an insulating material including silicon and is different from the first material is exposed;
forming a silicon oxide film exposed in the second region by surface-oxidizing the second region;
after the forming the silicon oxide film, forming an intermediate film, which is an ammonium fluorosilicate film, selectively in the second region from the first region and the second region by supplying a processing gas to the substrate;
forming a self-assembled monolayer in the first region and the second region after forming the intermediate film;
removing the intermediate film and the self-assembled monolayer from the second region by heating the substrate to sublimate the intermediate film; and
forming, after sublimation of the intermediate film, a target film selectively in the second region from the first region and the second region in a state in which the self-assembled monolayer is left in the first region, wherein the processing gas used to form the intermediate film includes a hydrogen fluoride gas and an ammonia gas.
2. The film formation method of claim 1 , wherein the target film is an insulating material including silicon, and
the forming the intermediate film, the forming the self-assembled monolayer, sublimating the intermediate film, and the forming the target film are repeatedly performed.
3. A film formation method comprising:
providing a substrate including a first region in which a first material, which is a metal oxide formed through a surface oxidation of a conductive material including a metal, is exposed and a second region in which a second material, which is an insulating material including silicon and is different from the first material, is exposed;
removing the metal oxide formed through the surface oxidation such that the metal is exposed in the first region;
after the removing the metal oxide, forming an intermediate film, which is an ammonium fluorosilicate film, selectively in the second region from the first region and the second region by supplying a processing gas to the substrate;
forming a self-assembled monolayer in the first region and the second region after the forming the intermediate film;
removing the intermediate film and the self-assembled monolayer from the second region by heating the substrate to sublimate the intermediate film; and
forming, after sublimation of the intermediate film, a target film selectively in the second region from the first region and the second region in a state in which the self-assembled monolayer is left in the first region, wherein the processing gas used to form the intermediate film includes a hydrogen fluoride gas and an ammonia gas.
4. The film formation method of claim 3 , further comprising:
forming a silicon oxide film exposed in the second region by surface-oxidizing the second region before the forming the intermediate film, wherein the removing the metal oxide is performed after the forming the silicon oxide film and before the forming the intermediate film.
5. The film formation method of claim 3 , wherein the target film is an insulating material including silicon, and
the forming the intermediate film, the forming the self-assembled monolayer, sublimating the intermediate film, and the forming the target film are repeatedly performed.