Spin-orbit torque type magnetoresistance effect element, and method for producing spin-orbit torque type magnetoresistance effect element
A spin-orbit torque type magnetoresistance effect element including a magnetoresistance effect element having a first ferromagnetic metal layer with a fixed magnetization direction, a second ferromagnetic metal layer with a varying magnetization direction, and a non-magnetic layer sandwiched between the first ferromagnetic metal layer and the second ferromagnetic metal layer; and spin-orbit torque wiring that extends in a first direction intersecting with a stacking direction of the magnetoresistance effect element and that is joined to the second ferromagnetic metal layer; wherein the magnetization of the second ferromagnetic metal layer is oriented in the stacking direction of the magnetoresistance effect element; and the second ferromagnetic metal layer has shape anisotropy, such that a length along the first direction is greater than a length along a second direction orthogonal to the first direction and to the stacking direction.
1. A unit cell in an integrated circuit comprising a spin-orbit torque type magnetoresistance effect element and a control element,
wherein the spin-orbit torque type magnetoresistance effect element comprising:
a magnetoresistance effect element having a first ferromagnetic metal layer with a fixed magnetization direction, a second ferromagnetic metal layer with a varying magnetization direction, and a non-magnetic layer sandwiched between the first ferromagnetic metal layer and the second ferromagnetic metal layer; and
spin-orbit torque wiring that extends in a first direction intersecting with a stacking direction of the magnetoresistance effect element and that is joined to the second ferromagnetic metal layer;
wherein
the magnetization of the second ferromagnetic metal layer is oriented in the stacking direction of the magnetoresistance effect element; and
the second ferromagnetic metal layer has shape anisotropy, such that a length along the first direction is greater than a length along a second direction orthogonal to the first direction and to the stacking direction, and
wherein
the control element is a transistor comprising a source electrode, a drain electrode and a channel;
the control element is arranged in a third direction from the source electrode to the drain electrode; and
the third direction is in parallel in the second direction.
2. The unit cell according to claim 1 , wherein the magnetoresistance effect element has an elliptical region that is inscribed in a planar shape of the magnetoresistance effect element when viewed from the stacking direction, and an external region that is positioned outside the elliptical region in the first direction.
3. The unit cell according to claim 1 , wherein the magnetoresistance effect element is rectangular when viewed from the stacking direction.
4. The unit cell according to claim 1 , wherein a length of the magnetoresistance effect element in the first direction is not more than 60 nm.
5. The unit cell according to claim 1 , wherein
when end portions of the spin-orbit torque wiring in the second direction are defined as a first end portion and a second end portion; and
of the end portions of the magnetoresistance effect element in the second direction, the end portion on the side closer to the first end portion is defined as a third end portion and the end portion on the side closer to the second end portion is defined as a fourth end portion;
a distance between the first end portion and the third end portion and a distance between the second end portion and the fourth end portion are both greater than zero, and at least one of the distances is not more than a spin diffusion length of the spin-orbit torque wiring.
6. The unit cell according to claim 5 , wherein the distance between the first end portion and the third end portion is different from the distance between the second end portion and the fourth end portion.
7. A method for producing the unit cell according to claim 3 , the method comprising:
a step of forming a stacked body having the first ferromagnetic metal layer, and the non-magnetic layer and the second ferromagnetic metal layer;
a step of processing the stacked body in one direction;
a step of processing the stacked body, after having been processed in the one direction, in another direction intersecting with the one direction; and
a step of processing the control element.
8. A method for producing the unit cell according to claim 1 , the method comprising:
a step of forming a stacked body having the first ferromagnetic metal layer, and the non-magnetic layer and the second ferromagnetic metal layer;
a step of forming, on one surface of the stacked body, a mask having a rectangular region in which an ellipse can be inscribed when viewed from the stacking direction of the stacked body, and a projecting region that is positioned at a corner or a long side of the rectangular region and that projects from the rectangular region;
a step of processing the stacked body through the mask; and
a step of processing the control element.