Scanning overlay metrology using overlay targets having multiple spatial frequencies
An overlay metrology system may include an illumination source and illumination optics to illuminate an overlay target on a sample with illumination from the illumination source as the sample is in motion with respect to the illumination from the illumination source in accordance with a measurement recipe. The overlay target may include one or more cells, where a single cell is suitable for measurement along a particular direction. Such a cell may include two or more gratings with different pitches. Further, the system may include two or more photodetectors, each configured to capture three diffraction lobes from the two or more grating structures. The system may further include a controller to determine an overlay measurement associated with each cell of the overlay target.
1. An overlay metrology system comprising:
an illumination source;
an illumination sub-system including one or more illumination optics to illuminate an overlay target on a sample with illumination from the illumination source as the sample is in motion with respect to the illumination from the illumination source in accordance with a measurement recipe, wherein the overlay target includes one or more cells in accordance with the measurement recipe, wherein at least some of the one or more cells comprise:
a double grating including a first series of features distributed along a measurement direction with a first pitch and a second pitch in an overlapping region; and
a single grating including a second series of features distributed along the measurement direction with the first pitch;
a collection sub-system including one or more collection optics to direct positive and negative first-order diffraction of the illumination by both the double grating and the single gratings associated with the first and second pitches to one or more detectors located in a pupil plane in accordance with the measurement recipe, wherein the one or more detectors generate time-varying interference signals associated with the positive and negative first-order diffraction of the illumination by both the double grating and the single gratings; and
a controller communicatively coupled to the one or more detectors, the controller including one or more processors to execute program instructions causing the one or more processors to determine an overlay measurement between the double grating and the single grating based on the time-varying interference signals.
2. The overlay metrology system of claim 1 , wherein the double grating and the single grating overlap on the sample.
3. The overlay metrology system of claim 1 , wherein the double grating and the single grating are located in adjacent non-overlapping regions of the sample.
4. The overlay metrology system of claim 1 , wherein the double grating and the single grating are located in different layers of the sample.
5. The overlay metrology system of claim 1 , wherein the double grating and the single grating are located in a common layer of the sample.
6. The overlay metrology system of claim 1 , wherein the positive first-order diffraction associated with the first and second pitches overlap in a first overlap region at the pupil plane, wherein the negative first-order diffraction associated with the first and second pitches overlap in a second overlap region at the pupil plane, wherein determine the overlay measurement between the first and second layers of the sample based on the positive and negative first-order diffraction of the illumination by the double grating and the single grating associated with the first and second pitches comprises:
determine an overlay measurement between the first and second layers of the sample based on time-varying interference signals generated by the one or more detectors at the first and second overlap regions.
7. The overlay metrology system of claim 1 , wherein the double grating is fabricated in a single exposure step.
8. An overlay target comprising:
one or more cells on a sample, wherein at least some of the one or more cells comprise:
a double grating including a first series of features distributed along a measurement direction with a first pitch and a second pitch in an overlapping region; and
a single grating on a second layer of the sample including a second series of features distributed along the measurement direction with the first pitch, wherein the first and second pitches are selected such that positive first-order diffraction from the first and second pitches overlap in a first overlap angular region and negative first-order diffraction from the first and second pitches overlap in a second overlap angular region for at least one operational wavelength, wherein time-varying interference signals in the first and second overlap regions generated as the overlay target is scanned relative to an illumination beam are indicative of overlay between the double grating and the single grating.
9. The overlay target of claim 8 , wherein the double grating is fabricated in a single exposure step.
10. The overlay target of claim 8 , wherein the first layer is fabricated prior to the second layer.
11. The overlay target of claim 8 , wherein the first layer is fabricated subsequent to the second layer.
12. The overlay target of claim 8 , wherein the double grating and the single grating are located in different layers of the sample.
13. The overlay target of claim 8 , wherein the double grating and the single grating are located in a common layer of the sample.
14. An overlay metrology system comprising:
an illumination source;
an illumination sub-system including one or more illumination optics to illuminate an overlay target on a sample with illumination from the illumination source as the sample is in motion with respect to the illumination from the illumination source in accordance with a measurement recipe, wherein the overlay target includes one or more cells in accordance with the measurement recipe, wherein at least some of the one or more cells comprise:
a first grating on a first layer of the sample including a first series of features distributed along a measurement direction with a first pitch; and
a second grating on a second layer of the sample including a second series of features distributed along the measurement direction with a second pitch different than the first pitch; and
a collection sub-system including one or more collection optics to direct measurement diffraction orders to one or more detectors at a pupil plane in accordance with the measurement recipe, wherein the measurement diffraction orders comprise:
positive and negative first-order diffraction of the illumination by the first grating;
positive and negative first-order diffraction and second-order diffraction of the illumination by the second grating; and
a controller communicatively coupled to the one or more detectors, the controller including one or more processors to execute program instructions causing the one or more processors to determine an overlay measurement between the first and second layers of the sample based on the measurement diffraction orders.
15. The overlay metrology system of claim 14 , wherein the positive first-order diffraction from the first grating overlaps with the positive first and second order diffraction from the second grating in a first set of overlap regions, wherein the negative first-order diffraction from the first grating overlaps with the negative first and second order diffraction from the second grating in a second set of overlap regions, wherein determine the overlay measurement between the first and second layers of the sample based on the measurement diffraction orders comprises:
determine the overlay measurement between the first and second layers of the sample based on time-varying interference signals generated by the one or more detectors at the first and second sets of overlap regions as the sample is in motion in accordance with the measurement recipe.
16. The overlay metrology system of claim 14 , wherein the double grating and the single grating overlap on the sample.
17. The overlay metrology system of claim 14 , wherein the double grating and the single grating are located in adjacent non-overlapping regions of the sample.
18. The overlay metrology system of claim 14 , wherein the first layer is fabricated prior to the second layer.
19. The overlay metrology system of claim 14 , wherein the first layer is fabricated subsequent to the second layer.
20. An overlay target comprising:
one or more cells on a sample, wherein at least some of the one or more cells comprise:
a first grating on a first layer of the sample including a first series of features distributed along a measurement direction with a first pitch; and
a second grating on a second layer of the sample including a second series of features distributed along the measurement direction with a second pitch different than the first pitch, wherein the first and second pitches are selected such that positive first-order diffraction from the first grating overlaps with positive first and second order diffraction from the second grating in a first set of overlap regions, wherein the negative first-order diffraction from the first grating overlaps with negative first and second order diffraction from the second grating in a second set of overlap regions, wherein time-varying interference signals in the first and second sets of overlap regions are indicative of overlay between the first and second layers of the sample.
21. The overlay target of claim 20 , wherein the first layer is fabricated prior to the second layer.
22. The overlay target of claim 20 , wherein the first layer is fabricated subsequent to the second layer.