Semiconductor memory device

1. A semiconductor memory device comprising:

a substrate;

a device isolation layer disposed in the substrate defining an active region extending in a first direction;

first conductive lines disposed in the active region and extending in a second direction crossing the first direction;

a second conductive line disposed on the active region between the first conductive lines and extending in a third direction crossing the first direction and the second direction;

an insulating pattern disposed on the second conductive line;

a bit line node contact disposed between the active region and the second conductive line;

a landing pad disposed on an edge portion of the active region;

a storage node contact between the landing pad and the edge portion of the active region;

a buried pattern disposed between the bit line node contact and the storage node contact;

a first spacer disposed between a sidewall of the second conductive line and the landing pad;

an air spacer disposed between the first spacer and the landing pad; and

a capping pattern protruding from a sidewall of the landing pad and disposed on the air spacer,

wherein the capping pattern is spaced apart from the first spacer, and

wherein the air spacer is in contact with a sidewall of the insulating pattern.

2. The semiconductor memory device of claim 1 , wherein the capping pattern covers at least a portion of an upper portion of the air spacer.

3. The semiconductor memory device of claim 1 , wherein the landing pad comprises a barrier pattern and a metal pattern stacked on the edge portion of the active region,

wherein the capping pattern includes the same material as the barrier pattern of the landing pad,

wherein the capping pattern includes a different material with a material of the metal pattern of the landing pad.

4. The semiconductor memory device of claim 1 , wherein the landing pad comprises a barrier pattern and a metal pattern stacked disposed on the active region,

wherein the capping pattern includes a different material with a material of the barrier pattern of the landing pad,

wherein the capping pattern includes the same material as the metal pattern of the landing pad.

5. The semiconductor memory device of claim 1 , further comprising a second spacer disposed between the landing pad and the air spacer below the capping pattern,

wherein the capping pattern is spaced apart from the second spacer.

6. The semiconductor memory device of claim 1 , further comprising a second spacer disposed between the landing pad and the air spacer below the capping pattern,

wherein the second spacer is covered by a portion of the sidewall of the landing pad.

7. The semiconductor memory device of claim 1 , further comprising a gap fill layer disposed on the capping pattern,

wherein the gap fill layer covers a portion of the sidewall of the landing pad above the capping pattern and a top surface of the capping pattern.

8. The semiconductor memory device of claim 7 , wherein the gap fill layer covers at least a portion of an upper portion of the air spacer.

9. The semiconductor memory device of claim 8 , wherein the gap fill layer is spaced apart from the first spacer.

10. The semiconductor memory device of claim 8 , wherein the gap fill layer is spaced apart from the insulating pattern.

11. The semiconductor memory device of claim 7 , wherein a level of a lowermost upper surface of the gap fill layer from an upper surface of the substrate is higher than a level of the top surface of the capping pattern from the upper surface of the substrate.

12. The semiconductor memory device of claim 1 , further comprising a data storage member disposed on the landing pad.

13. The semiconductor memory device of claim 1 , wherein the first spacer overlaps an upper portion of the air spacer in a vertical direction.

14. The semiconductor memory device of claim 1 , wherein a level of a top end of the first spacer is higher than a level of a bottom surface of the insulating pattern.

15. A semiconductor memory device comprising:

a substrate;

a device isolation layer disposed in the substrate defining an active region extending in a first direction;

first conductive lines disposed in the active region and extending in a second direction crossing the first direction;

a second conductive line disposed on the active region between the first conductive lines and extending in a third direction crossing the first direction and the second direction;

an insulating pattern disposed on the second conductive line;

a bit line node contact disposed between the active region and the second conductive line;

a landing pad disposed on an edge portion of the active region;

a storage node contact between the landing pad and the edge portion of the active region;

a buried pattern disposed between the bit line node contact and the storage node contact;

an air spacer disposed between a sidewall of the second conductive line and the landing pad; and

a capping pattern protruding from a sidewall of the landing pad,

wherein the capping pattern partially covers an upper portion of the air spacer, and

wherein the air spacer is in contact with a sidewall of the insulating pattern.

16. The semiconductor memory device of claim 15 , further comprising a gap fill layer on the capping pattern,

wherein the gap fill layer covers the upper portion of the air spacer exposed by the capping pattern, and is spaced apart from the insulating pattern.

17. The semiconductor memory device of claim 15 , wherein the landing pad comprises a barrier pattern and a metal pattern stacked on the edge portion of the active region,

wherein the capping pattern includes the same material as the barrier pattern,

wherein the capping pattern includes a different material with a material of the metal pattern.

18. The semiconductor memory device of claim 15 , wherein the landing pad comprises a barrier pattern and a metal pattern stacked on the edge portion of the active region,

wherein the capping pattern includes a different material with a material of the barrier pattern,

wherein the capping pattern includes the same material as the metal pattern.

19. A semiconductor memory device comprising:

a substrate;

a device isolation layer disposed in the substrate defining an active region extending in a first direction;

first conductive lines disposed in the active region and extending in a second direction crossing the first direction;

a second conductive line disposed on the active region between the first conductive lines and extending in a third direction crossing the first direction and the second direction;

an insulating pattern disposed on the second conductive line;

a bit line node contact disposed between the active region and the second conductive line;

a landing pad disposed on an edge portion of the active region;

a storage node contact between the landing pad and the edge portion of the active region;

a buried pattern disposed between the bit line node contact and the storage node contact;

an air spacer disposed between a sidewall of the second conductive line and the landing pad;

a capping pattern protruding from a sidewall of the landing pad; and

a gap fill layer on the capping pattern,

wherein the capping pattern covers a first upper portion of the air spacer,

wherein the gap fill layer covers a second upper portion of the air spacer, and

wherein the second upper portion of the air spacer is in contact with a sidewall of the insulating pattern.

20. The semiconductor memory device of claim 19 , wherein the capping pattern includes the same material as the material of the landing pad,

wherein the gap fill layer includes an insulating material.