Semiconductor structure with through substrate vias and manufacturing method thereof
A semiconductor structure and a manufacturing method thereof are provided. The semiconductor structure includes a semiconductor substrate, an interconnection structure, through substrate vias, conductive pillars and dummy conductive pillars. The interconnection structure is disposed at a front side of the semiconductor substrate, and comprises a stack of dielectric layers and interconnection elements spreading in the stack of dielectric layers. The through substrate vias separately penetrate through the semiconductor substrate and the stack of dielectric layers. The conductive pillars are disposed at a front side of the interconnection structure facing away from the semiconductor substrate, and respectively in electrical connection with one of the through substrate vias. The dummy conductive pillars are disposed aside the conductive pillars at the front side of the interconnection structure.
1. A semiconductor structure, comprising:
a semiconductor substrate;
an interconnection structure, disposed at a front side of the semiconductor substrate, and comprising a stack of dielectric layers and interconnection elements spreading in the stack of dielectric layers;
through substrate vias, separately penetrating through the semiconductor substrate and the stack of dielectric layers, and extending to a back side of the semiconductor structure, so as to be engaged with another semiconductor structure;
conductive pillars, disposed at a front side of the interconnection structure facing away from the semiconductor substrate, and respectively in electrical connection with one of the through substrate vias; and
dummy conductive pillars, disposed aside the conductive pillars at the front side of the interconnection structure,
wherein the through substrate vias penetrate completely through all of the dielectric layers between the semiconductor substrate and the conductive pillars.
2. The semiconductor structure according to claim 1 , wherein the dummy conductive pillars are electrically isolated from the interconnection elements, the through substrate vias and the conductive pillars.
3. The semiconductor structure according to claim 1 , wherein the dummy conductive pillars are formed to a height substantially the same as a height of the conductive pillars.
4. The semiconductor structure according to claim 1 , further comprising:
an insulating layer, disposed at the front side of the interconnection structure, and laterally surrounding the conductive pillars and the dummy conductive pillars.
5. The semiconductor structure according to claim 1 , further comprising:
bonding pads, respectively covering a front surface of one of the conductive pillars facing away from the interconnection structure, and electrically connected to the conductive pillars, respectively.
6. The semiconductor structure according to claim 5 , wherein the dummy conductive pillars are laterally spaced apart and electrically isolated from the bonding pads.
7. The semiconductor structure according to claim 5 , further comprising:
a passivation layer, laterally surrounding the bonding pads, and covering front surfaces of the dummy conductive pillars facing away from the interconnection structure.
8. The semiconductor structure according to claim 1 , further comprising:
conductive pads, each disposed between and electrically connected to one of the through substrate vias and one of the conductive pillars;
dummy pads, dispose aside the conductive pads and electrically connected to the dummy conductive pillars; and
an additional passivation layer laterally surrounding the conductive pads and the dummy pads.
9. The semiconductor structure according to claim 8 , wherein the dummy pads are electrically isolated from the interconnection elements, the through substrate vias and the conductive pillars.
10. The semiconductor structure according to claim 8 , wherein the through substrate vias respectively extend to a back surface of one of the conductive pads facing toward the interconnection structure.
11. The semiconductor structure according to claim 1 , wherein a group of the conductive pillars are laterally surrounded by separate ones of the dummy conductive pillars.
12. The semiconductor structure according to claim 1 , wherein a group of the conductive pillars are laterally surrounded by one of the dummy conductive pillars.
13. The semiconductor structure according to claim 12 , wherein the one of the dummy conductive pillars is formed in a ring shape.
14. A semiconductor structure, comprising:
a semiconductor substrate;
an interconnection structure, disposed at a front side of the semiconductor substrate, and comprising a stack of dielectric layers and interconnection elements spreading in the stack of dielectric layers;
through substrate vias, separately extending through the semiconductor substrate to a back side of the interconnection structure facing toward the semiconductor substrate, and electrically connected to the interconnection elements in the interconnection structure, wherein another end of each of the through substrate vias extends to a back side of the semiconductor structure, so as to be engaged with another semiconductor structure;
conductive pillars, disposed at a front side of the interconnection structure facing away from the back side of the interconnection structure, and respectively in electrical connection with one of the through substrate vias;
dummy conductive pillars, disposed aside the conductive pillars at the front side of the interconnection structure;
bonding pads, respectively covering a front surface of one of the conductive pillars facing away from the interconnection structure, and electrically connected to the conductive pillars, respectively; and
a passively layer, laterally surrounding the bonding pads, and covering front surfaces of the dummy conductive pillars facing away from the interconnection structure.
15. The semiconductor structure according to claim 14 , wherein conductive pads between the conductive pillars and the interconnection structure are electrically connected to the through substrate vias through the interconnection elements in the interconnection structure.
16. The semiconductor structure according to claim 14 , wherein a portion of the interconnection elements spread between the through via structures and the conductive pillars, and are overlapped with the through via structures and the conductive pillars.
17. The semiconductor structure according to claim 14 , wherein portions of the through substrate via in contact with the interconnection structure are protruded from the front surface of the semiconductor substrate.
18. A semiconductor structure, comprising:
a semiconductor substrate;
an interconnection structure, disposed at a front side of the semiconductor substrate, and comprising a stack of dielectric layers and interconnection elements spreading in the stack of dielectric layers;
through substrate vias, separately extending through the semiconductor substrate, and electrically connected to the interconnection elements in the interconnection structure;
conductive pillars, disposed at a front side of the interconnection structure facing away from the semiconductor substrate, and respectively in electrical connection with one of the through substrate vias;
dummy conductive pillars, disposed aside the conductive pillars at the front side of the interconnection structure; and
an isolation layer, covering a back side of the semiconductor substrate, wherein a surface of the isolation layer defines a back side of the semiconductor structure, and portions of the through substrate vias protruding with respect to the back side of the semiconductor substrate are laterally surrounded by the isolation layer.
19. The semiconductor structure according to claim 18 , wherein the through substrate vias are vertically spaced apart from the interconnection structure.
20. The semiconductor structure according to claim 18 , wherein the through substrate vias are electrically connected to the interconnection elements through contact plugs, respectively.