Etch chemistry for metallic materials
An etch chemistry solution for treating metallic surfaces in which the etch chemistry solution includes an oxidizing agent and gluconic acid. The etch chemistry solution may also include an oxidizing agent and a short-chained polyethylene polymer glycol or a short-chained polyethylene copolymer glycol. The metallic surfaces are usually used in circuits such as flexible circuits.
1. An etch chemistry solution for treating metallic surfaces, the etch chemistry solution consisting of:
an oxidizing agent comprising one or more of a peroxide, a persulfate compound, and combinations thereof;
one or more of a short-chained polyethylene polymer glycol and a short-chained polyethylene copolymer glycol, wherein the short-chained polyethylene polymer glycol is xylonic acid, threonic acid, or D-glucose peracetate;
a non-oxidizing/reducing acid comprising one or more of sulfuric acid, acetic acid, formic acid, lactic acid, phosphoric acid or combinations thereof;
a metal activator comprising one or more of copper, cobalt, zinc, nickel, iron, manganese or alloys thereof; and
optionally a surfactant.
2. The etch chemistry solution of claim 1 , wherein the short-chained polyethylene copolymer glycol comprises a polyethylene/polypropylene copolymer glycol.
3. An etch chemistry solution for treating metallic surfaces, the etch chemistry solution comprising:
an oxidizing agent; and
a short-chained polyethylene polymer glycol, wherein the short-chained polyethylene polymer glycol is xylonic acid, threonic acid, or D-glucose peracetate.
4. The etch chemistry solution of claim 3 , wherein the oxidizing agent comprises one or more of a peroxide, a persulfate compound, and combinations thereof.
5. The etch chemistry solution of claim 3 , further comprising a short-chained polyethylene copolymer glycol comprising a polyethylene/polypropylene copolymer glycol.
6. The etch chemistry solution of claim 3 , further comprising a metal activator comprising one or more of copper, cobalt, zinc, nickel, iron, manganese or alloys thereof.
7. The etch chemistry solution of claim 3 , further comprising a surfactant.