Integrated circuit structure and fabrication method thereof

1. An integrated circuit structure, comprising:

a substrate comprising thereon a logic core circuit region and an embedded memory area;

a copper interconnect structure disposed on the substrate, wherein the copper interconnect structure comprises an uppermost copper layer covered by a dielectric layer;

an aluminum pad layer disposed on the dielectric layer, wherein the aluminum pad layer comprises a first pad pattern within the logic core circuit region and a second pad pattern within the embedded memory area;

a passivation layer covering the first pad pattern within the logic core circuit region and the second pad pattern within the embedded memory area; and

an aluminum shield layer comprising concentric aluminum routing patterns disposed directly on the embedded memory area and between the uppermost copper layer and the aluminum pad layer, wherein the aluminum shield layer has a thickness that is thinner than that of the aluminum pad layer, wherein the first pad pattern and the second pad pattern respectively contact the uppermost copper layer and the aluminum shield layer at different horizontal levels.

2. The integrated circuit structure according to claim 1 , wherein the aluminum shield layer is electrically connected to the uppermost copper layer through a tungsten via.

3. The integrated circuit structure according to claim 2 , wherein the tungsten via has a width of about 0.3˜0.8 micrometers.

4. The integrated circuit structure according to claim 2 , wherein the dielectric layer comprises a lower dielectric layer and an upper dielectric layer, and wherein the tungsten via is disposed in the lower dielectric layer.

5. The integrated circuit structure according to claim 4 , wherein the upper dielectric layer covers the aluminum shield layer.

6. The integrated circuit structure according to claim 4 , wherein the aluminum shield layer has a width of about 0.5-2 micrometers.

7. The integrated circuit structure according to claim 4 , wherein the upper dielectric layer and the lower dielectric layer comprise the same dielectric material.

8. The integrated circuit structure according to claim 4 , wherein the upper dielectric layer and the lower dielectric layer comprise silicon oxide.

9. The integrated circuit structure according to claim 1 , wherein the aluminum pad layer is electrically connected to the metal layer through an aluminum via.

10. The integrated circuit structure according to claim 1 , wherein the passivation layer comprises a phosphorus silicate glass (PSG) layer and a silicon nitride layer.

11. A method for forming an integrated circuit structure, comprising:

providing a substrate comprising thereon a logic core circuit region and an embedded memory area;

forming a copper interconnect structure on the substrate, wherein the copper interconnect structure comprises an uppermost copper layer covered by a dielectric layer;

forming an aluminum shield layer comprising concentric aluminum routing patterns on the uppermost copper layer in the embedded memory area; and

forming an aluminum pad layer on the dielectric layer, wherein the aluminum shield layer has a thickness that is thinner than that of the aluminum pad layer, wherein the aluminum pad layer comprises a first pad pattern within the logic core circuit region and a second pad pattern within the embedded memory area; and

forming a passivation layer covering the first pad pattern within the logic core circuit region and the second pad pattern within the embedded memory area.

12. The method according to claim 11 , wherein the aluminum shield layer is electrically connected to the uppermost copper layer through a tungsten via.

13. The method according to claim 12 , wherein the tungsten via has a width of about 0.3˜0.8 micrometers.

14. The method according to claim 12 , wherein said forming a metal layer on the uppermost copper in the circuit region comprises:

forming a lower dielectric layer;

forming the tungsten via in the lower dielectric layer;

forming the aluminum shield layer on the lower dielectric layer; and

forming an upper dielectric layer on the aluminum shield layer and the lower dielectric layer.

15. The method according to claim 14 , wherein the upper dielectric layer is thicker than the lower dielectric layer.

16. The method according to claim 14 , wherein the upper dielectric layer and the lower dielectric layer comprise the same dielectric material.