IP Library › Granted Patent US 11,908,725
Granted Patent B2
US 11,908,725 · App. 17/633,177 · Granted Feb 20, 2024

Electrostatic chuck heater and manufacturing method therefor

Inventors: Jin Young Choi (Anseong-si, KR); Jun Won Seo (Anseong-si, KR); Ju Sung Lee (Anseong-si, KR)
Assignee: MICO CERAMICS LTD.
H01L21/6833B28B11/243C23C14/50C23C16/4586H05B6/62H05B2203/017
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Quick Facts
Patent No.
US 11,908,725
App. No.
17/633,177
Granted
Feb 20, 2024
Kind
B2
Abstract

The present invention relates to an electrostatic chuck heater having a bipolar structure, the electrostatic chuck heater comprising: a heater body having an internal electrode and an external electrode for selectively performing any one of an RF grounding function and an electrostatic chuck function according to a semiconductor process mode; and a heater support mounted below the heater body so as to support the heater body.

Claims (18)

1. An electrostatic chuck heater comprising:

a heater body including an internal electrode and an external electrode configured to selectively perform any one of a radio-frequency (RF) grounding function and an electrostatic chuck function according to a semiconductor process mode; and

a heater support mounted below the heater body to support the heater body,

wherein the heater body further includes an external electrode connecting member disposed between an electrode layer and a heating element layer to electrically connect the external electrode and a rod installed in the heater support to each other, and

wherein the external electrode connecting member is spaced apart from lower surfaces of the internal electrode and the external electrode by a predetermined distance and disposed in parallel to the electrodes, and both ends of the external electrode connecting member are bent toward the lower surface of the external electrode.

2. The electrostatic chuck heater of claim 1 , wherein the external electrode is formed on a same plane as the internal electrode.

3. The electrostatic chuck heater of claim 1 , wherein the external electrode is disposed to be spaced apart from the internal electrode by a predetermined distance.

4. The electrostatic chuck heater of claim 1 , wherein the external electrode is disposed to surround the internal electrode.

5. The electrostatic chuck heater of claim 1 , wherein the internal electrode is embedded in an upper central portion of the heater body.

6. The electrostatic chuck heater of claim 1 , wherein the internal electrode, the external electrode, and the external electrode connecting member are formed in any one of a sheet type, a mesh type, and a paste type.

7. The electrostatic chuck heater of claim 1 , wherein the internal electrode, the external electrode, and the external electrode connecting member are made of molybdenum (Mo) having excellent electrical conductivity.

8. The electrostatic chuck heater of claim 1 , further comprising:

a bipolar function selector electrically connected to the internal electrode and the external electrode embedded in the heater body to select functions of the internal electrode and the external electrode.

9. The electrostatic chuck heater of claim 8 , wherein the bipolar function selector includes an internal electrode function selector configured to select a function of the internal electrode and an external electrode function selector configured to select a function of the external electrode.

10. The electrostatic chuck heater of claim 9 , wherein the internal electrode function selector includes a first capacitor C 1 , a first switch S 1 , and a first DC power supply configured to supply a positive DC voltage V 1 , and

the external electrode function selector includes a second capacitor C 2 , a second switch S 2 , and a second DC power supply configured to supply a negative DC voltage V 2 .

11. The electrostatic chuck heater of claim 8 , wherein the bipolar function selector is configured to select the functions of the electrodes such that at least one of the internal electrode and the external electrode performs the RF grounding function in a first semiconductor process mode.

12. The electrostatic chuck heater of claim 8 , wherein the bipolar function selector is configured to select the functions of the electrodes such that both the internal electrode and the external electrode perform the electrostatic chuck function in a second semiconductor process mode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 4, 2022
From: CHOI, JIN YOUNG; SEO, JUN WON; LEE, JU SUNG
To: MICO CERAMICS LTD.
Reel/Frame 058899/0147 →
Priority Claims (1)
KR 10-2019-0095376 · Aug 6, 2019 · national
Continuity (1)
Related Publication 20220301916A1 · Sep 22, 2022
Cited By (1)
US 12,660,569