Ceramic susceptor
There is provided a ceramic susceptor where a conduction failure due to defective connection of inner electrodes is unlikely to occur. The ceramic susceptor includes a ceramic susceptor main body including a first surface for a wafer to be placed thereon, and a second surface opposite the first surface; an inner electrode that is embedded in the ceramic susceptor main body; and a terminal having one end connected to the inner electrode and another end reaching the second surface of the ceramic susceptor main body. The inner electrode includes a horizontal portion provided in parallel with the first surface, and a non-horizontal portion extending from the horizontal portion toward the first surface or the second surface. The horizontal portion and the non-horizontal portion are integrally formed by bending one electrode such that a bent portion that forms a boundary between the horizontal portion and the non-horizontal portion is present.
1 . A ceramic susceptor comprising:
a ceramic susceptor main body including a first surface for a wafer to be placed thereon, and a second surface opposite the first surface;
an inner electrode that is embedded in the ceramic susceptor main body; and
a terminal having one end connected to the inner electrode and another end reaching the second surface of the ceramic susceptor main body,
wherein the inner electrode includes a horizontal portion provided in parallel with the first surface and a non-horizontal portion extending from the horizontal portion toward the first surface or the second surface, and the horizontal portion and the non-horizontal portion are integrally formed by bending one electrode such that a bent portion that forms a boundary between the horizontal portion and the non-horizontal portion is present, and
wherein the non-horizontal portion of the inner electrode reaches the first surface.
2 . The ceramic susceptor according to claim 1 , wherein the inner electrode is composed of one metal mesh.
3 . The ceramic susceptor according to claim 1 , wherein an angle formed by the horizontal portion and the non-horizontal portion at the bent portion is from 50° to 130°.
4 . The ceramic susceptor according to claim 1 , wherein the number of non-horizontal portion is from 1 to 100.
5 . The ceramic susceptor according to claim 1 , wherein the ceramic susceptor main body is made of aluminum nitride and/or aluminum oxide.
6 . The ceramic susceptor according to claim 1 , wherein the one electrode includes an electrode main part that has a circular disk shape, and an extending portion that extends from the electrode main part, the electrode main part forming the horizontal portion, the extending portion being bent to form the non-horizontal portion.
7 . The ceramic susceptor according to claim 1 ,
wherein the one electrode includes an electrode main part that has a circular disk shape, and an extending portion that extends from the electrode main part,
wherein a pair of slits are formed at a part, of the electrode main part, corresponding to a root of the extending portion, the pair of slits being for enabling bending inside an outer periphery of the electrode main part, and
wherein the one electrode is bent inside the electrode main part in a manner to include a root portion sectioned by the pair of slits such that the extending portion and the root portion form the non-horizontal portion and a remaining part of the electrode main part other than the root portion forms the horizontal portion.
8 . The ceramic susceptor according to claim 1 , wherein the inner electrode functions as a ground electrode.
9 . The ceramic susceptor according to claim 8 , wherein the ceramic susceptor is for being used in an ion implantation device or a physical vapor deposition (PVD) device.
10 . The ceramic susceptor according to claim 1 ,
wherein the ceramic susceptor main body includes a first layer that has a circular disk shape and that provides the first surface; and a second layer that has a circular disk shape, that has a larger diameter than a diameter of the first layer, and provides the second surface so that the second layer extends outward from an outer peripheral edge of the first layer along an outer periphery of the ceramic susceptor main body to form an outer peripheral step portion, and
wherein the ceramic susceptor further comprises a second inner electrode that is embedded in the outer peripheral step portion of the second layer and that is connected to the inner electrode.
11 . The ceramic susceptor according to claim 10 ,
wherein the inner electrode includes the horizontal portion that is embedded in the first layer, and the non-horizontal portion that is embedded in the first layer and the second layer, and
wherein the second inner electrode is embedded in an outer peripheral part including the outer peripheral step portion of the second layer, in parallel with the horizontal portion, and is connected to a lower end of the non-horizontal portion.
12 . The ceramic susceptor according to claim 10 , wherein the inner electrode and the second inner electrode are separate electrodes.
13 . The ceramic susceptor according to claim 10 , wherein the inner electrode and the second inner electrode are integrally formed by bending one electrode.
14 . The ceramic susceptor according to claim 10 , wherein the ceramic susceptor is for being used in a film deposition device or an etching device that uses plasma.