Positioning apparatus, processing system, and positioning method
A positioning apparatus includes a stage configured to hold a substrate, a first pin configured to hold an edge ring and a second pin separately provided from the first pin and configured to hold the edge ring. The positioning apparatus further includes a rotation mechanism configured to rotate the stage and the first pin, an elevating mechanism configured to raise and lower at least one of the first pin and the second pin and a detection mechanism configured to detect a position of an outer circumference of the substrate held by the stage and a position of an inner circumference of the edge ring held by the first pin.
1. An apparatus for positioning comprising:
a stage to hold a substrate;
a first pin to hold an edge ring;
a second pin separately provided from the first pin and to hold the edge ring;
a rotator to rotate the stage and the first pin; and
a detector to detect a position of an outer circumference of the substrate held by the stage and a position of an inner circumference of the edge ring held by the first pin,
wherein at least one of the first pin and the second pin is configured to be raised and lowered.
2. The apparatus of claim 1 , wherein the first pin rotates integrally with the stage.
3. The apparatus of claim 1 , further comprising:
a driving shaft to rotatably hold the stage and the first pin.
4. The apparatus of claim 1 , wherein the second pin is to be raised and lowered with respect to the first pin.
5. The apparatus of claim 4 , wherein an upper end of the second pin is raised and lowered within a range including a height position of an upper end of the first pin.
6. The apparatus of claim 1 , wherein an upper end of the first pin is located below an upper surface of the stage, and
the second pin is raised and lowered such that an upper end of the second pin is located below an upper surface of the stage.
7. The apparatus of claim 1 , wherein the stage and the first pin are integrally raised and lowered with respect to the second pin.
8. The apparatus of claim 7 , wherein an upper end of the first pin is raised and lowered within a range including a height position of an upper end of the second pin.
9. The apparatus of claim 1 , wherein a position specifying portion is disposed at the outer circumference of the substrate and the inner circumference of the edge ring.
10. The apparatus of claim 9 , wherein the position specifying portion disposed at the outer circumference of the substrate is a notch, and
the position specifying portion disposed at the inner circumference of the edge ring is a straight portion.
11. A processing system comprising:
a chamber and a positioning apparatus to position a substrate and an edge ring to be transferred to the chamber,
wherein the positioning apparatus includes:
a stage to hold the substrate;
a first pin to hold the edge ring;
a second pin separately provided from the first pin and to hold the edge ring;
a rotator to rotate the stage and the first pin; and
a detector to detect a position of an outer circumference of the substrate held by the stage and a position of an inner circumference of the edge ring held by the first pin,
wherein at least one of the first pin and the second pin is configured to be raised and lowered.
12. A positioning method using a positioning apparatus including a stage to hold a substrate, a pin to rotatably hold an edge ring, and a detector to detect a position of an outer circumference of the substrate and a position of an inner circumference of the edge ring,
the positioning method comprising:
detecting the position of the outer circumference of the substrate using the detector while rotating the substrate in a state where the substrate is held by the stage; and
detecting the position of the inner circumference of the edge ring using the detector while rotating the edge ring in a state where the edge ring is held by the pin.