Particle beam inspection apparatus
An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
1. A load lock system, comprising:
a supporting structure configured to support a wafer;
a first gas vent configured to provide a gas having a conditioned temperature to adjust a temperature of the wafer; and
a controller including a processor and a memory, the controller configured to assist with control of the gas to condition the wafer before the wafer is transferred from the load lock system to a main chamber for inspection,
wherein the controller is further configured to assist with the control of the gas based on a temperature of a wafer stage in the main chamber.
2. The load lock system of claim 1 , wherein the gas is thermally preconditioned to have the conditioned temperature before being provided via the first gas vent.
3. The load lock system of claim 1 , further comprising a sensor configured to measure a temperature of the wafer.
4. The load lock system of claim 1 , wherein the controller is further configured to set a target temperature of the wafer for conditioning based on the temperature of the wafer stage in the main chamber.
5. The load lock system of claim 1 , wherein the controller is further configured to receive temperature information of the wafer stage in the main chamber.
6. The load lock system of claim 5 , wherein the temperature information is acquired from a sensor configured to measure a temperature of the wafer stage.
7. The load lock system of claim 1 , wherein the controller is further configured to monitor the temperature of the wafer before the wafer is transferred from the load lock system to the main chamber.
8. The load lock system of claim 1 , wherein when transferred to the main chamber, a temperature of the conditioned wafer is substantially equal to a temperature of the wafer stage in the main chamber.
9. The load lock system of claim 1 , wherein the first gas vent is configured to flow gas towards the wafer.
10. The load lock system of claim 1 , further comprising a second gas vent configured to provide a portion of the gas to adjust the temperature of the wafer.
11. The load lock system of claim 10 , wherein the first gas vent and the second gas vent are positioned at different heights in the load lock system.
12. The load lock system of claim 1 , wherein the controller is further configured to control gas flow via the first gas vent.
13. The load lock system of claim 1 , wherein the load lock system is further configured to accommodate a plurality of wafers.
14. The load lock system of claim 1 , further comprising a gas supply from which the gas is fed to the first gas vent.
15. The load lock system of claim 14 , further comprising a gas tube configured to be fed with the gas from the gas supply and to provide the gas to the first gas vent.