Transfer apparatus

1. A transfer apparatus, comprising:

a first vacuum transfer module;

a first transfer robot disposed in the first vacuum transfer module and configured to simultaneously or separately transfer a wafer and at least one ring, the at least one ring having an inner diameter larger than the diameter of the wafer;

a second vacuum transfer module;

a second transfer robot disposed in the second vacuum transfer module and configured to simultaneously or separately transfer the wafer and the ring,

a tubular connecting module disposed between the first vacuum transfer module and the second vacuum transfer module, the first vacuum transfer module, the second vacuum transfer module and the tubular connecting module being arranged along a first direction, the tubular connecting module having a first length in the first direction, the first length being smaller than the diameter of the wafer;

a wafer support rotatably attached to the tubular connecting module and configured to support the wafer; and

at least three ring supporting members outwardly extending from the wafer support and configured to support the at least one ring,

wherein the at least three ring supporting members comprise a first ring supporting member and a second ring supporting member, the first ring supporting member extends into the first vacuum transfer module, and the second ring supporting member extends into the second vacuum transfer module.

2. The transfer apparatus of claim 1 , wherein the wafer support includes a wafer stage having a wafer support surface, and the wafer support surface has a diameter smaller than the first length.

3. The transfer apparatus of claim 1 , wherein the at least three ring supporting members are rotatable.

4. The transfer apparatus of claim 2 , wherein the wafer support further includes a shaft member extending downward from the wafer stage, and

the ring supporting member includes a rod-shaped portion and a protruding portion, wherein one end of the rod-shaped portion is attached to the shaft member, and the protruding portion protrudes upward from the other end of the rod-shaped portion and has a ring support surface at an upper end thereof.

5. A transfer apparatus, comprising:

a first vacuum transfer module,

a first transfer robot disposed in the first vacuum transfer module and configured to simultaneously or separately transfer a wafer and at least one ring, the at least one ring having an inner diameter larger than the diameter of the wafer;

a second vacuum transfer module;

a second transfer robot disposed in the second vacuum transfer module and configured to simultaneously or separately transfer the wafer and the ring;

a tubular connecting module disposed between the first vacuum transfer module and the second vacuum transfer module, the first vacuum transfer module, the second vacuum transfer module and the tubular connecting module being arranged along a first direction, the tubular connecting module having a first length in the first direction, the first length being smaller than the diameter of the wafer;

a wafer support rotatably attached to the tubular connecting module and configured to support the wafer; and

at least three ring supporting members outwardly extending from the wafer support and configured to support the at least one ring,

wherein the wafer support includes a wafer stage having a wafer support surface, and the wafer support surface has a diameter smaller than the first length,

wherein the water support further includes a shaft member extending downward from the wafer stage,

wherein the ring supporting member includes a rod-shaped portion and a protruding portion, wherein one end of the rod-shaped portion is attached to the shaft member, and the protruding portion protrudes upward from the other end of the rod-shaped portion and has a ring support surface at an upper end thereof, and

wherein the ring support surface is located at the same height as the wafer support surface.

6. The transfer apparatus of claim 4 , wherein the ring support surface is located at a height different from the height of the wafer support surface.

7. The transfer apparatus of claim 1 , wherein the at least three ring supporting members comprise three ring supporting members arranged at intervals of 1200 around the shaft member.

8. The transfer apparatus of claim 3 , wherein the at least three ring supporting members comprise three ring supporting members arranged at intervals of 1200 around the shaft member.

9. The transfer apparatus of claim 4 , wherein the at least three ring supporting members comprise three ring supporting members arranged at intervals of 1200 around the shaft member.

10. The transfer apparatus of claim 1 , further comprising:

a controller configured to control the first transfer robot to place the wafer on the wafer support, control the wafer support to rotate the wafer on the wafer support by a predetermined angle, and control the second transfer robot to transfer the wafer on the wafer support into the second vacuum transfer module.

11. The transfer apparatus of claim 10 , wherein the controller is configured to control the first transfer robot to place the at least one ring on the at least three ring supporting members, and control the second transfer robot to transfer the at least one ring on the at least three ring supporting members into the second vacuum transfer module.