Metrology system and method for determining a characteristic of one or more structures on a substrate
Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
1. An apparatus for determining a characteristic of interest relating to at least one structure on a substrate, the apparatus comprising:
an illumination branch comprising a radiation source and configured to direct illumination radiation at the substrate;
a detection branch comprising a detector and configured to detect scattered radiation from the at least one structure on the substrate; and
a processor configured to:
computationally determine phase and amplitude information from an electric field of the scattered radiation in a measurement acquisition, and
computationally re-image the measurement acquisition of the at least one structure subsequent to a measurement to obtain at least one computationally re-imaged image,
wherein computationally re-imaging the measurement acquisition comprises digitally altering an apodization of the illumination radiation for the measurement acquisition, and
wherein digitally altering the apodization is based on the at least one structure.
2. The apparatus of claim 1 , wherein digitally altering the apodization is based on the substrate.
3. The apparatus of claim 1 , wherein digitally altering the apodization is based on a coherence of the illumination radiation.
4. The apparatus of claim 3 , wherein digitally altering the apodization is based on a fully incoherent illumination radiation.
5. The apparatus of claim 1 , wherein digitally altering the apodization comprises dynamically tuning the apodization.
6. The apparatus of claim 5 , wherein dynamically tuning the apodization reduces reflections and losses in a beam path of the illumination radiation.
7. The apparatus of claim 1 , wherein digitally altering the apodization comprises applying a digital apodization algorithm.
8. The apparatus of claim 1 , wherein digitally altering the apodization comprises applying a non-physical apodizer.
9. The apparatus of claim 7 , wherein the non-physical apodizer is digitally modeled in or near a pupil plane of the illumination branch.
10. The apparatus of claim 1 , wherein computationally re-imaging the measurement acquisition comprises digitally altering an apodization of the scattered radiation for the measurement acquisition.
11. A method of determining a characteristic of interest relating to at least one structure on a substrate, the method comprising:
computationally determining phase and amplitude information from an electric field of scattered radiation in a measurement acquisition; and
computationally re-imaging the measurement acquisition of the at least one structure subsequent to a measurement to obtain at least one computationally re-imaged image,
wherein computationally re-imaging the measurement acquisition comprises digitally altering an apodization of an illumination radiation for the measurement acquisition, and
wherein digitally altering the apodization is based on the at least one structure.
12. The method of claim 11 , wherein digitally altering the apodization is based on the substrate.
13. The method of claim 11 , wherein digitally altering the apodization is based on a coherence of the illumination radiation.
14. The method of claim 13 , wherein digitally altering the apodization is based on a fully incoherent illumination radiation.
15. The method of claim 11 , wherein digitally altering the apodization comprises dynamically tuning the apodization.
16. The method of claim 15 , wherein dynamically tuning the apodization reduces reflections and losses in a beam path of the illumination radiation.
17. The method of claim 16 , wherein digitally altering the apodization comprises applying a digital apodization algorithm.
18. The method of claim 11 , wherein digitally altering the apodization comprises applying a non-physical apodizer.
19. The method of claim 11 , wherein computationally re-imaging the measurement acquisition comprises digitally altering an apodization of the scattered radiation for the measurement acquisition.
20. A non-transitory computer program product comprising machine-readable instructions for causing a processor to cause performance of the method of claim 11 .