Methods and apparatus for processing a substrate
Methods and apparatus for processing a first substrate and a second substrate are provided herein. For example, a method of processing a substrate using extended spectroscopic ellipsometry (ESE) includes directing a beam from an extended spectroscopic ellipsometer toward a first surface of a first substrate and a second surface of a second substrate, which is different than the first substrate, determining in-situ ESE data from each of the first surface and the second surface during processing of the first substrate and the second substrate, measuring a change of phase and amplitude in determined in-situ ESE data, and determining one or more parameters of the first surface of the first substrate and the second surface of the second substrate using simultaneously complex dielectric function, optical conductivity, and electronic correlations from the measured change of phase and amplitude in the in-situ ESE data.
1. A method of processing a first substrate and a second substrate using extended spectroscopic ellipsometry (ESE), comprising:
directing a beam from an extended spectroscopic ellipsometer toward a first surface of a first substrate and a second surface of a second substrate, which is different than the first substrate;
determining in-situ ESE data from each of the first surface and the second surface during processing of the first substrate and the second substrate;
measuring a change of phase and amplitude in determined in-situ ESE data; and
determining one or more parameters comprising at least one of a level of contamination or surface bonding states of the first surface of the first substrate and the second surface of the second substrate using simultaneously complex dielectric function, optical conductivity, and electronic correlations from the measured change of phase and amplitude in the in-situ ESE data.
2. The method of claim 1 , wherein the in-situ ESE data comprises a change of a phase and an amplitude of a reflected beam.
3. The method of claim 1 , wherein the one or more parameters of the first surface of the first substrate and second surface of the second substrate further comprises at least one of a contact angle or material composition.
4. The method of claim 1 , wherein directing the beam comprises directing the beam toward the first surface of the first substrate and the second surface of the second substrate at an incident angle of about 20° to about 80°.
5. The method of claim 1 , wherein directing the beam comprises directing the beam toward the first surface of the first substrate and the second surface of the second substrate at an incident angle of about 45° to about 50°.
6. The method of claim 1 , wherein the beam has a photon energy of about 0.6 eV to about 10 eV.
7. The method of claim 1 , wherein the beam has a photon energy of about 3.2 eV to about 6 eV.
8. The method of claim 1 , wherein the first substrate and the second substrate comprises Cu embedded in one of silicon carbon nitride (SiCN) or silicon oxide (SiO 2 ).
9. The method of claim 1 , wherein processing the first substrate and the second substrate comprises performing at least one of a plasma process or a cleaning process that are part of a hybrid bonding process.
10. The method of claim 9 , further comprising performing an ultraviolet process to cure the first substrate after performing the at least one of the plasma process or the cleaning process.
11. The method of claim 10 , further comprising performing a bonding process after performing the ultraviolet process, wherein the bonding process comprises picking up a die from the first surface of the first substrate and disposing the die on the second surface of the second substrate.
12. The method of claim 11 , further comprising performing an annealing process after performing the bonding process.
13. A non-transitory computer readable storage medium having stored thereon instructions that when executed by a processor perform a method for processing a first substrate and a second substrate using extended spectroscopic ellipsometry (ESE), the method comprising:
directing a beam from an extended spectroscopic ellipsometer toward a first surface of a first substrate and a second surface of a second substrate, which is different than the first substrate;
determining in-situ ESE data from each of the first surface and the second surface during processing of the first substrate and the second substrate;
measuring a change of phase and amplitude in determined in-situ ESE data; and
determining one or more parameters comprising at least one of a level of contamination or surface bonding states of the first surface of the first substrate and the second surface of the second substrate using simultaneously complex dielectric function, optical conductivity, and electronic correlations from the measured change of phase and amplitude in the in-situ ESE data.
14. The non-transitory computer readable storage medium of claim 13 , wherein the in-situ ESE data comprises a change of a phase and an amplitude of a reflected beam.
15. The non-transitory computer readable storage medium of claim 13 , wherein the one or more parameters of the first surface of the first substrate and second surface of the second substrate further comprises at least one of a contact angle or material composition.
16. The non-transitory computer readable storage medium of claim 13 , wherein directing the beam comprises directing the beam toward the first surface of the first substrate and the second surface of the second substrate at an incident angle of about 20° to about 80°.
17. The non-transitory computer readable storage medium of claim 13 , wherein directing the beam comprises directing the beam toward the first surface of the first substrate and the second surface of the second substrate at an incident angle of about 45° to about 50°.
18. The non-transitory computer readable storage medium of claim 13 , wherein the beam has a photon energy of about 0.6 eV to about 10 eV.
19. The non-transitory computer readable storage medium of claim 13 , wherein the beam has a photon energy of about 3.2 eV to about 6 eV.
20. An apparatus for processing a first substrate and a second substrate, comprising:
a processing platform for processing a plurality of substrates; and
an extended spectroscopic ellipsometer (ESE) operably coupled to the processing platform and configured to:
direct a beam from the extended spectroscopic ellipsometer toward a first surface of a first substrate and a second surface of a second substrate, which is different than the first substrate;
determine in-situ ESE data from each of the first surface and the second surface during processing of the first substrate and the second substrate;
measure a change of phase and amplitude in determined in-situ ESE data; and
determine one or more parameters comprising at least one of a level of contamination or surface bonding states of the first surface of the first substrate and the second surface of the second substrate using simultaneously complex dielectric function, optical conductivity, and electronic correlations from the measured change of phase and amplitude in the in-situ ESE data.