High-brightness laser produced plasma source and method of generation and collection radiation
A laser produced plasma light source comprises a vacuum chamber with a rotating target assembly supplying a target into an interaction zone with focused laser beam. The target is layer of a fluid and/or free-flowing target material on a surface of annular groove in the rotating target assembly. An output beam of short-wavelength radiation exits the interaction zone to an optical collector through the means for debris mitigation. A linear velocity of the target is not less than 100 m/s and a vector of the linear velocity of the target in the interaction zone is directed on one side of a plane passing through the interaction zone and the rotation axis while the focused laser beam and the output beam are located on another side of said plane. The optical collector comprises two ellipsoidal mirror units arranged in a tandem.
1. A method of generating and collecting a short-wavelength radiation, comprising: forming a target ( 3 ) under an action of a centrifugal force as a layer of a target material on a surface of an annular groove, implemented in a rotating target assembly ( 2 ) with a target surface facing a rotation axis ( 6 ); irradiating the target ( 3 ) at a high pulse repetition rate by a focused laser beam ( 5 ) passing through a means for debris mitigation; generating a laser produced plasma in an interaction zone ( 4 ) and exiting an output beam ( 7 ) of the short-wavelength radiation into an optical collector ( 8 ) through the means for debris mitigation ( 12 - 16 ), wherein
the target ( 3 ) is rotated at a high linear velocity, not less than 100 m/s, so that most of ejected debris particles and a vector ({right arrow over (V)} R ) of the linear velocity of the target in the interaction zone ( 4 ) to be directed on one side of a plane ( 18 ) passing through the interaction zone ( 4 ) and the rotation axis ( 6 ), while the irradiating of the target and collecting radiation from the laser produced plasma are provided so that the focused laser beam ( 5 ) and the output beam ( 7 ) are located on another side of said plane ( 18 ).
2. The method according to claim 1 , wherein a spatial distribution of a debris ejection rate from the interaction zone ( 4 ) is calculated and directions of a passage of both focused laser beam ( 5 ) and the short-wavelength radiation beam ( 7 ) are selected in spatial regions with minimal debris ejection rates.
3. The method according to claim 1 , wherein spatial regions of the passage of both the focused laser beam ( 5 ) and the short-wavelength radiation beam ( 7 ) are selected so that a debris ejection rates in said spatial regions are at least 10 4 times less than a maximum debris ejection rates.
4. The method according to claim 1 , wherein the short-wavelength radiation is collected by the optical collector ( 8 ) comprising two ellipsoidal mirror units ( 9 , 10 ) arranged in a tandem that transmits an image of the emitting plasma region without distortions, on a scale determined by a design of said units, into a second focal point ( 17 ) of a second ellipsoidal mirror unit ( 10 ) while a second focal point of a first ellipsoidal mirror unit ( 9 ) is located in a first focal point of the second ellipsoidal mirror unit ( 10 ).
5. The method according to claim 4 , wherein the debris mitigation is provided along an entire path of the short-wave radiation to the optical collector ( 8 ).
6. The method according to claim 1 , wherein the debris mitigation is provided by one or more debris mitigation techniques, including: protective gas flow, a magnetic mitigation, a foil trap, a debris shield ( 14 , 15 ), a membrane ( 16 ) mostly transparent for short-wavelength radiation, with a transparency of more than 60%.
7. The method according to claim 1 , wherein the target ( 3 ) is rotated with a centrifugal acceleration of not less than 3000 g, where g is a gravitational acceleration, the target material has fluidity under centrifugal force, and the target surface is parallel to the rotation axis ( 6 ).
8. A laser produced plasma light source, comprising: a vacuum chamber ( 1 ), a rotating target assembly ( 2 ) supplying a target ( 3 ) into an interaction zone ( 4 ) with a pulsed laser beam ( 5 ) focused onto the target which is a layer of a target material on a surface of an annular groove ( 19 ) implemented in the rotating target assembly ( 2 ) with a target surface facing a rotation axis ( 6 ), an output beam ( 7 ) of a short-wavelength radiation exiting the interaction zone to an optical collector ( 8 ), and means for debris mitigation ( 12 - 16 ), wherein
a linear velocity of the target ( 3 ) is not less than 100 m/s, a vector ({right arrow over (V)} R ) of the linear velocity of the target in the interaction zone ( 4 ) is directed on one side of a plane ( 18 ) passing through the interaction zone ( 4 ) and the rotation axis ( 6 ), while the focused laser beam ( 5 ) and the output beam ( 7 ) are located on another side of said plane ( 18 ).
9. A laser produced plasma light source, comprising: a vacuum chamber ( 1 ), a rotating target assembly ( 2 ) supplying a target ( 3 ) into an interaction zone ( 4 ) with a pulsed laser beam ( 5 ) focused onto the target which is a layer of a target material on a surface of an annular groove ( 19 ) implemented in the rotating target assembly ( 2 ) with a target surface facing a rotation axis ( 6 ), an output beam ( 7 ) of a short-wavelength radiation exiting the interaction zone to an optical collector ( 8 ), and means for debris mitigation ( 12 - 16 ), wherein
the target material has fluidity under centrifugal force and belongs to a group comprising: a liquid ( 21 ), including molten metal; a powder ( 20 ), including metal powder or mixtures thereof.
10. The source according to claim 9 , wherein the target ( 3 ) is formed at a centrifugal acceleration of at least 3000 g and the surface of the target ( 3 ) is parallel to the rotation axis ( 6 ).
11. The source according to claim 9 , wherein the target material comprises a centrifuged mixture of the powder ( 20 ), material of which is arranged for laser plasma producing and the liquid or a melt ( 21 ), a density of which is greater than a density of the powder material.
12. A laser produced plasma light source, comprising: a vacuum chamber ( 1 ), a rotating target assembly ( 2 ) supplying a target ( 3 ) into an interaction zone ( 4 ) with a pulsed laser beam ( 5 ) focused onto the target which is a layer of a target material on a surface of an annular groove implemented in the rotating target assembly ( 2 ) with a target surface facing a rotation axis ( 6 ), an output beam ( 7 ) of a short-wavelength radiation exiting the interaction zone to an optical collector ( 8 ), and means for debris mitigation ( 12 - 16 ), wherein
the optical collector ( 8 ) comprises two ellipsoidal mirror units ( 9 , 10 ) arranged in a tandem along a path of the output beam ( 7 ), while the means for debris mitigation ( 12 , 14 , 15 ) are located along an entire path of the short-wave radiation into the optical collector.
13. The source according to claim 12 , wherein the interaction zone ( 4 ) is located in a first focal point of the first ellipsoidal mirror unit ( 9 ) and a first focal point of the second ellipsoidal mirror unit ( 10 ) is located in a second focal point of the first ellipsoidal mirror unit ( 9 ).
14. The source according to claim 12 , wherein the second ellipsoid mirror unit ( 10 ) is several times, from 2 to 15 times, smaller than the first ellipsoid mirror unit ( 9 ) and the optical collector ( 8 ) has magnification close to 1, ranging from 0.8 to 1.2.
15. The source according to claim 12 , wherein a material of a surface of the collector mirrors is selected from a group comprising: Mo, Ru, Rh, Pd, U, Ni, W, Fe, Nb, Al, Si, Co and BN.
16. The source according to claim 12 , wherein the means for debris mitigation ( 12 , 13 ) include a protective gas flow between the ellipsoidal mirror units ( 9 , 10 ).
17. The source according to claim 12 , wherein the means for debris mitigation ( 12 , 13 ) include a debris shield ( 15 ) located on an axis ( 11 ) of the optical collector outside a collection angle.
18. The source according to claim 12 , wherein each of ellipsoidal mirror units ( 9 , 10 ) comprises a nested set of at least two ellipsoidal mirrors.
19. The source according to claim 12 , wherein the means for debris mitigation ( 12 - 16 ) are provided by one or more techniques comprising: protective gas flow, a magnetic mitigation, a foil trap, a membrane ( 16 ) made of a material belonging to a group comprising: carbon nanotubes, Ti, Al, Si, Zr, Si, BN, mostly transparent to the short-wavelength radiation.
20. The source according to claim 19 , wherein the membrane ( 16 ) is also a gas lock separating volumes with different pressures for providing a protective gas flow.