Semiconductor device and method for fabricating the same
A method for fabricating a semiconductor device includes: forming a mold stack layer including a mold layer and a supporter layer over a substrate; forming opening by etching the mold stack layer; selectively forming a supporter reinforcement layer on an exposed surface of the supporter layer which is positioned in the opening; forming a bottom electrode in the opening in which the supporter reinforcement layer is formed; and forming a supporter opening by etching a portion of the supporter layer to form a supporter that supports an outer wall of the bottom electrode.
1. A semiconductor device, comprising:
a plurality of bottom electrodes over the substrate;
a supporter disposed between the bottom electrodes to support outer walls of the bottom electrodes in a direction parallel to the surface of the substrate; and
a supporter reinforcement layer between the outer walls of the bottom electrodes and the supporter,
wherein each of the plurality of bottom electrodes includes a first portion supported by the supporter reinforcement layer and a second portion not supported by the supporter reinforcement layer, the first portion narrower than the second portion.
2. The semiconductor device of claim 1 , wherein the supporter reinforcement layer fully covers a contact surface between the supporter and a bottom electrode.
3. The semiconductor device of claim 1 , wherein the supporter reinforcement layer has a closed loop shape that surrounds the outer wall of the bottom electrode.
4. The semiconductor device of claim 1 , wherein the supporter reinforcement layer has a broken loop shape that partially surrounds the outer wall of the bottom electrode.
5. The semiconductor device of claim 1 , wherein a side profile of the supporter reinforcement layer has one shape among a curved shape, a vertical shape, and a tapered shape.
6. The semiconductor device of claim 1 , wherein the supporter reinforcement layer includes a material that selectively grows from the supporter.
7. The semiconductor device of claim 1 , wherein the supporter layer and the supporter reinforcement layer include a nitrogen-containing material.
8. The semiconductor device of claim 1 , wherein the supporter layer and the supporter reinforcement layer include silicon nitride, silicon carbon nitride, silicon boron nitride, or a combination thereof.
9. The semiconductor device of claim 1 , wherein the bottom electrode has a shape among a pillar shape, a cylinder shape, and a pylinder shape.
10. The semiconductor device of claim 1 , wherein the supporter reinforcement layer extends to cover the upper surface of the supporter from the interface between the supporter and the bottom electrode.
11. The semiconductor device of claim 1 , further comprising:
an additional supporter reinforcement layer that selectively grows from at least one between the supporter and the supporter reinforcement layer.
12. The semiconductor device of claim 1 , wherein the supporter includes a multi-level supporter, and
the supporter reinforcement layer includes a multi-level supporter reinforcement layer which is positioned between the multi-level supporter and each of the bottom electrodes.
13. The semiconductor device of claim 12 , wherein an uppermost-level supporter reinforcement layer of the multi-level supporter reinforcement layer has a broken loop shape that partially surrounds the outer wall of the bottom electrode.
14. The semiconductor device of claim 12 , wherein supporter reinforcement layers positioned at a lower level than the uppermost-level supporter reinforcement layer in the multi-level supporter reinforcement layer has a closed loop shape that surrounds the outer wall of the bottom electrode.
15. The semiconductor device of claim 12 , wherein the uppermost-level supporter reinforcement layer of the multi-level supporter reinforcement layer extends to cover the upper surface of the supporter from an interface between an uppermost-level supporter of the multi-level supporter and the bottom electrode.
16. The semiconductor device of claim 12 , wherein the uppermost-level supporter reinforcement layer of the multi-level supporter reinforcement layer and the uppermost-level supporter of the multi-level supporter are disposed at higher level than a top surface of the bottom electrode.
17. The semiconductor device of claim 12 , wherein the uppermost-level supporter reinforcement layer of the multi-level supporter reinforcement layer and the uppermost-level supporter of the multi-level supporter are positioned at a lower level than a top surface of the bottom electrode.
18. The semiconductor device of claim 1 , further comprising:
a dielectric layer on the bottom electrode, the supporter, and the supporter reinforcement layer; and
a top electrode on the dielectric layer.
19. The semiconductor device of claim 1 , further comprising:
a buried word line formed in the substrate; and
a bit line formed over the substrate.
20. The semiconductor device of claim 1 , wherein the plurality of bottom electrodes comprises at least some bottom electrodes, which are adjacent to each other and supported by the supporter having a planar shape over the substrate, the planar shape determined based on a number of the at least some bottom electrodes.