EFEM and method of controlling supply amount of inert gas

1. An EFEM comprising:

a housing having a substantially closed substrate transfer space in the housing; and

a control part configured to perform a control of supplying an inert gas into at least the housing,

wherein the control part includes:

an inert gas total supply amount setting part configured to set a total supply amount of the inert gas to be supplied into the housing based on an oxygen concentration in the housing;

a door open/purge determination part configured to determine, for each load port adjacent to the housing, whether a container door of a substrate storage container mounted on a mounting table capable of mounting the substrate storage container is in an open state and whether a purge device, which is capable of replacing a gas atmosphere in the substrate storage container mounted on the mounting table with the inert gas, is performing a purge process; and

an in-housing inert gas supply amount calculation part configured to, when a determination result of the door open/purge determination part is “Yes,” calculate a supply amount of the inert gas to be supplied into the housing, based on a value obtained by subtracting an in-container inert gas supply amount, which is a supply amount of the inert gas into the substrate storage container by the purge device of the load port, from the total supply amount of the inert gas, which is set by the inert gas total supply amount setting part, and

wherein the control part is configured to control the supply amount of the inert gas to be supplied into the housing according to an inert gas supply amount command value which is determined based on a calculation result of the in-housing inert gas supply amount calculation part.

2. The EFEM of claim 1 , wherein, when changing the supply amount of the inert gas to be supplied into the housing to the inert gas supply amount command value determined based on the calculation result of the in-housing inert gas supply amount calculation part, the supply amount of the inert gas to be supplied into the housing is controlled to gradually change over a predetermined period of time.

3. The EFEM of claim 1 , further comprising:

an in-transfer robot inert gas supply device configured to supply an inert gas into a substrate transfer robot arranged in the substrate transfer space,

wherein, when the in-transfer robot inert gas supply device is supplying the inert gas, the in-housing inert gas supply amount calculation part is configured to calculate the supply amount of the inert gas into the housing, based on a value obtained by subtracting the supply amount of the inert gas by at least the in-transfer robot inert gas supply device and the in-container inert gas supply amount from the inert gas total supply amount set by the inert gas total supply amount setting part.

4. The EFEM of claim 2 , further comprising:

an in-transfer robot inert gas supply device configured to supply an inert gas into a substrate transfer robot arranged in the substrate transfer space,

wherein, when the in-transfer robot inert gas supply device is supplying the inert gas, the in-housing inert gas supply amount calculation part is configured to calculate the supply amount of the inert gas into the housing, based on a value obtained by subtracting the supply amount of the inert gas by at least the in-transfer robot inert gas supply device and the in-container inert gas supply amount from the inert gas total supply amount set by the inert gas total supply amount setting part.

5. The EFEM of claim 1 , further comprising:

an ionizer configured to remove static electricity from a substrate by locally supplying an inert gas to the substrate mounted at a predetermined location in the substrate transfer space,

wherein, when the ionizer is supplying the inert gas, the in-housing inert gas supply amount calculation part is configured to calculate the supply amount of the inert gas into the housing, based on a value obtained by subtracting the supply amount of the inert gas by at least the ionizer and the in-container inert gas supply amount from the inert gas total supply amount set by the inert gas total supply amount setting part.

6. The EFEM of claim 2 , further comprising:

an ionizer configured to remove static electricity from a substrate by locally supplying an inert gas to the substrate mounted at a predetermined location in the substrate transfer space,

wherein, when the ionizer is supplying the inert gas, the in-housing inert gas supply amount calculation part is configured to calculate the supply amount of the inert gas into the housing, based on a value obtained by subtracting the supply amount of the inert gas by at least the ionizer and the in-container inert gas supply amount from the inert gas total supply amount set by the inert gas total supply amount setting part.

7. The EFEM of claim 3 , further comprising:

an ionizer configured to remove static electricity from a substrate by locally supplying an inert gas to the substrate mounted at a predetermined location in the substrate transfer space,

wherein, when the ionizer is supplying the inert gas, the in-housing inert gas supply amount calculation part is configured to calculate the supply amount of the inert gas into the housing, based on a value obtained by subtracting the supply amount of the inert gas by at least the ionizer and the in-container inert gas supply amount from the inert gas total supply amount set by the inert gas total supply amount setting part.

8. A method of controlling a supply amount of an inert gas into a housing of an EFEM including the housing having a substantially closed substrate transfer space in the housing and a control part configured to perform a control of supplying the inert gas into the housing, the method comprising:

setting a total supply amount of the inert gas to be supplied into the housing based on an oxygen concentration in the housing;

determining, for each load port adjacent to the housing, whether a container door of a substrate storage container mounted on a mounting table capable of mounting the substrate storage container of the load port is in an open state and whether a purge device, which is capable of replacing a gas atmosphere in the substrate storage container mounted on the mounting table with the inert gas, is performing a purge process;

calculating, when a determination result in the determining is “Yes,” a supply amount of the inert gas to be supplied into the housing, based on a value obtained by subtracting a supply amount of an inert gas into a container, which is a supply amount of the inert gas into the substrate storage container by the purge device of the load port, from the total supply amount of the inert gas, which is set in the setting; and

controlling a supply amount of the inert gas into the housing based on a calculation result in the calculating.