Method for overlay metrology and apparatus thereof
A method includes receiving an image formed in a metrology apparatus wherein the image comprises at least the resulting effect of at least two diffraction orders, and processing the image wherein the processing comprises at least a filtering step, for example a Fourier filter. The process of applying a filter may be obtained also by placing an aperture in the detection branch of the metrology apparatus.
1. A method for filtering high diffraction orders from an image, the method comprising:
directing radiation onto a substrate having a target with a pitch dimension larger than a wavelength of the radiation, wherein the target is configured to diffract the radiation;
obtaining an image of the diffracted radiation in an image plane of a detection branch of a metrology apparatus, wherein the image of the diffracted radiation contains a complex interference pattern of multiple non-zero diffraction orders and does not contain an image of zero-order diffracted radiation,
wherein contributions of the multiple non-zero diffraction orders in the complex interference pattern are not distinguishable from each other; and
filtering the image to remove contributions due to complex interference patterns of multiple non-zero diffraction orders.
2. The method of claim 1 , wherein:
the filtering step comprises a digital filtering.
3. The method of claim 1 , wherein the obtaining the image comprises receiving the image in the image plane where a sensor is disposed.
4. The method of claim 2 , wherein the filtering comprises using a Fourier filter to obtain low frequency components of the image.
5. The method of claim 4 , wherein the Fourier filter is applied to a synthetic image obtained as a difference between images formed by positive and negative diffraction orders.
6. The method of claim 4 , wherein an alignment step is performed between images obtained from negative and positive diffraction orders, and before an asymmetry image is obtained as a difference between an image formed by the negative and positive diffraction orders.
7. The method of claim 1 , further comprising disposing an aperture in the detection branch of the metrology apparatus, thereby causing the filtering of at least two diffraction orders.
8. A metrology apparatus comprising:
a radiation source configured to direct radiation onto a substrate having a target with a pitch dimension larger than a wavelength of the radiation, wherein the target is configured to diffract the radiation; and
an aperture positioned in a detection branch of the metrology apparatus, wherein the aperture comprises an element with a radiation transmissive portion and wherein the radiation transmissive portion is configured to remove contributions of the diffracted radiation due to complex interference patterns of multiple non-zero diffraction orders and pass at least a single order of the diffracted radiation.
9. The metrology apparatus of claim 8 , further comprising a sensor disposed in an image plane and configured to capture an image of at least +1 and −1 orders of the diffracted radiation.
10. The metrology apparatus of claim 9 , further comprising a filter configured to obtain low frequency components of the image.
11. The metrology apparatus of claim 10 , wherein the filter is configured to use a Fourier filter configured to apply a synthetic image obtained as a difference between images formed by the at least +1 and −1 orders of the diffracted radiation.
12. A non-transitory computer readable medium program comprising processor readable instructions which, when run on a suitable processor controlled apparatus, cause the processor controlled apparatus to perform the method comprising:
receiving an image formed in a metrology apparatus, wherein the image comprises radiation diffracted off a substrate having a target with a pitch dimension larger than a wavelength of the radiation, wherein the image contains a complex interference pattern of multiple non-zero diffraction orders and does not contain an image of zero-order diffracted radiation,
wherein contributions of the multiple non-zero diffraction orders in the complex interference pattern are not distinguishable from each other; and
processing the image, wherein the processing comprises filtering the image to remove contributions due to complex interference patterns of multiple non-zero diffraction orders.
13. The non-transitory computer readable medium program of claim 12 , wherein the filtering step comprises digital filtering.
14. The non-transitory computer readable medium program of claim 12 , wherein obtaining the image comprises receiving the image in an image plane where a sensor is disposed.
15. The non-transitory computer readable medium program of claim 13 , wherein the filtering step comprises using a Fourier filter to obtain low frequency components of the image.
16. The non-transitory computer readable medium program of claim 15 , wherein the Fourier filter is applied to a synthetic image obtained as a difference between images formed by positive and negative diffraction orders.
17. The non-transitory computer readable medium program of claim 15 , wherein an alignment step is performed between images obtained from negative and positive diffraction orders, and before an asymmetry image is obtained as a difference between an image formed by the negative and positive diffraction orders.
18. The non-transitory computer readable medium program of claim 12 , further comprising disposing an aperture in a detection branch of the metrology apparatus, thereby causing filtering of high diffraction orders of at least two diffraction orders.