Methods of manufacturing three-dimensional memory devices with conductive spacers

1. A method comprising:

forming a word line between a pair of dielectric layers, the word line formed of a first metal;

recessing a first sidewall of the word line from first sidewalls of the dielectric layers to form a first sidewall recess between the dielectric layers;

forming a first conductive spacer in the first sidewall recess and on the first sidewall of the word line, the first conductive spacer physically contacting the first sidewall of the word line, the first conductive spacer formed of a second metal, the second metal different from the first metal;

forming a memory film on a sidewall of the first conductive spacer and the first sidewalls of the dielectric layers;

forming a semiconductor film on a sidewall of the memory film; and

forming a bit line on a sidewall of the semiconductor film.

2. The method of claim 1 , further comprising:

recessing a second sidewall of the word line from second sidewalls of the dielectric layers to form a second sidewall recess between the dielectric layers, the second sidewall of the word line opposite the first sidewall of the word line; and

forming a second conductive spacer in the second sidewall recess and on the second sidewall of the word line, the second conductive spacer formed of a third metal, the third metal different from the second metal and the first metal.

3. The method of claim 2 , wherein the first sidewall of the word line is recessed in a first patterning process, the second sidewall of the word line is recessed in a second patterning process, and the second patterning process is performed after the first patterning process.

4. The method of claim 1 , further comprising:

recessing a second sidewall of the word line from second sidewalls of the dielectric layers to form a second sidewall recess between the dielectric layers, the second sidewall of the word line opposite the first sidewall of the word line; and

forming a second conductive spacer in the second sidewall recess and on the second sidewall of the word line, the second conductive spacer formed of the second conductive-material metal.

5. The method of claim 4 , wherein the first sidewall of the word line and the second sidewall of the word line are recessed in a same patterning process.

6. The method of claim 1 , wherein forming the word line comprises:

etching a trench in a staircase structure, the staircase structure comprising the dielectric layers and a sacrificial layer between the dielectric layers;

removing a portion of the sacrificial layer to form a sidewall opening between the dielectric layers;

depositing the first metal in the sidewall opening and the trench; and

removing portions of the first metal in the trench, a portion of the first metal remaining in the sidewall opening forming the word line.

7. The method of claim 6 , wherein forming the first conductive spacer comprises:

depositing the second metal in the first sidewall recess and the trench; and

removing portions of the second metal in the trench, a portion of the second metal remaining in the first sidewall recess forming the first conductive spacer.

8. The method of claim 7 , wherein the second metal is deposited at a temperature of less than or equal to 500° C.

9. The method of claim 1 , wherein the first metal has a different work function than the second metal.

10. The method of claim 1 , wherein the first metal has a different resistivity than the second metal.

11. The method of claim 1 , wherein the memory film is formed to a greater thickness than the first conductive spacer.

12. The method of claim 1 , further comprising:

forming interconnects that are connected to the word line and to the bit line.

13. The method of claim 1 , further comprising:

after forming the first conductive spacer, recessing a second sidewall of the word line from second sidewalls of the dielectric layers to form a second sidewall recess between the dielectric layers, the second sidewall of the word line opposite the first sidewall of the word line; and

forming a second conductive spacer in the second sidewall recess and on the second sidewall of the word line.

14. A method comprising:

recessing a first sidewall of a word line to form a first sidewall recess, the word line formed of a first conductive material, the word line extending in a first direction;

forming a first conductive spacer in the first sidewall recess and on the first sidewall of the word line, the first conductive spacer formed of a second conductive material, the second conductive material having a different work function than the first conductive material, the first conductive material having a lower resistivity than the second conductive material;

recessing a second sidewall of the word line to form a second sidewall recess, the second sidewall of the word line opposite the first sidewall of the word line;

forming a second conductive spacer in the second sidewall recess and on the second sidewall of the word line, the second conductive spacer formed of a third conductive material, the third conductive material having a different work function than the second conductive material and the first conductive material, the first conductive material having a lower resistivity than the third conductive material;

forming a memory film on a sidewall of the first conductive spacer;

forming a semiconductor film on a sidewall of the memory film; and

forming a bit line on a sidewall of the semiconductor film, the bit line extending in a second direction, the second direction perpendicular to the first direction.

15. The method of claim 14 , wherein the memory film is formed to a greater thickness than the first conductive spacer.

16. The method of claim 14 , wherein the first conductive spacer contacts the first sidewall of the word line and the second conductive spacer contacts the second sidewall of the word line.

17. A method comprising:

forming a word line between a pair of dielectric layers, the word line formed of a first conductive material;

forming a first conductive spacer on a first sidewall of the word line, a first sidewall of the first conductive spacer being flush with first sidewalls of the dielectric layers, the first conductive spacer formed of a second conductive material, the second conductive material different from the first conductive material;

after forming the first conductive spacer, forming a second conductive spacer on a second sidewall of the word line, a second sidewall of the second conductive spacer being flush with second sidewalls of the dielectric layers, the second conductive spacer formed of a third conductive material, the third conductive material different from the second conductive material and the first conductive material;

depositing a memory layer on the first sidewall of the first conductive spacer and on the second sidewall of the second conductive spacer; and

depositing a semiconductor layer on the memory layer.

18. The method of claim 17 , further comprising:

forming an isolation material on the semiconductor layer; and

forming a conductive line through the isolation material.

19. The method of claim 18 , further comprising:

dividing the conductive line into a bit line and a source line; and

forming interconnects that are connected to the bit line, the source line, and the word line.

20. The method of claim 17 , wherein the first conductive spacer contacts the first sidewall of the word line and the second conductive spacer contacts the second sidewall of the word line.